Characterization of Materials, Two Volume Set Edited by Elton Kaufmann (Argonne National Laboratory). J. Wiley & Sons, Inc.:  Hoboken. 2003. 1392 pp. $400.00. ISBN 0-471-26882-8.

2003 ◽  
Vol 125 (22) ◽  
pp. 6839-6839
Keyword(s):  
National Laboratory ◽  
Argonne National Laboratory ◽  
Characterization Of Materials

Fabrication of MEMS Components Based on Ultrananocrystalline Diamond Thin Films and Characterization of Mechanical Properties

2000 ◽  
Vol 657 ◽  
Author(s):  
A. V. Sumant ◽  
O. Auciello ◽  
A. R. Krauss ◽  
D. M. Gruen ◽  
D. Ersoy ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Single Crystal ◽  
Microwave Plasma ◽  
National Laboratory ◽  
Argonne National Laboratory ◽  
Coarse Grained ◽  
Mems Devices ◽  
Ultrananocrystalline Diamond ◽  
Single Crystal Diamond

ABSTRACTThe mechanical, thermal, chemical, and tribological properties of diamond make it an ideal material for the fabrication of MEMS components. However, conventional CVD diamond deposition methods result in either a coarse-grained pure diamond structure that prevents high- resolution patterning, or in a fine-grained diamond film with a significant amount of intergranular non-diamond carbon. At Argonne National Laboratory, we are able to produce phase-pure ultrananocrystalline diamond (UNCD) films for the fabrication of MEMS components. UNCD is grown by microwave plasma CVD using C60-Ar or CH4-Ar plasmas, resulting in films that have 3-5 nm grain size, are 10-20 times smoother than conventionally grown diamond films, and can have mechanical properties similar to that of single crystal diamond. We used lithographic patterning, lift-off, and etching, in conjunction with the capability for growing UNCD on SiO2 to fabricate 2-D and 3-D UNCD-MEMS structures. We have performed initial characterization of mechanical properties by using nanoindentation and in-situ TEM indentor techniques. The values of Hardness (∼88 GPa) and Young's modulus (∼ 864 GPa) measured are very close to those of single crystal diamond (100 GPa and 1000 GPa respectively). The results show that UNCD is a promising material for future high performance MEMS devices.

Characterization of Collision Cascade Damage in Ca2La8(SiO4)6O2 by Hrtem

1994 ◽  
Vol 373 ◽  
Author(s):  
L.M. Wang ◽  
W.J. Webert
Keyword(s):  
Elevated Temperatures ◽  
Ion Beam ◽  
National Laboratory ◽  
Argonne National Laboratory ◽  
Sample Surface ◽  
Thermal Recovery ◽  
Collision Cascade ◽  
Cascade Damage

AbstractCa2La8(SiO4)6O2 thin crystals become amorphous under ion beam irradiation. The ion dose required for complete amorphization of the thin crystal (critical amorphization dose, Dc) increased with the increasing irradiation temperature and decreased with ion mass at elevated temperatures. Samples irradiated with 1-1.5 MeV Ar+, Kr+ and Xe+ ions to doses much lower than Dc, in the temperature range from 20 to 498 K were used for a detailed HRTEM investigation to study the amorphization process. The residual collision cascade damage after irradiation appeared as nanometer scale amorphous domains. The images of these domains are extremely sensitive to the sample thickness. Small domains of cascade size were found only at the very thin edge of the sample. In thicker regions, amorphous domains appear after higher doses as the result of cascade overlap in projection. At higher temperatures, the observed amorphous domains are smaller indicating thermal recovery at the amorphous/crystalline interface. The amorphous domains are also larger in size after irradiation with ions of higher mass at a fixed ion dose. These results are consistent with the Dc-temperature curves determined by in situ TEM with the HVEM-Tandem Facility at Argonne National Laboratory. The width of the amorphous rim along the edge of the specimen grew with increasing ion dose suggesting that amorphization also proceeds from the sample surface. Images of the collision cascade damage were compared to the cascade sizes calculated with the TRIM code. Some digitally acquired HRTEM images of the cascade damage were processed to reveal more detailed information.

Characterization of a Plutonium-Bearing Zirconolite-Rich Synroc

1996 ◽  
Vol 465 ◽  
Author(s):  
E. C. Buck ◽  
B. Ebbinghaus ◽  
A. J. Bakel ◽  
J. K. Bates
Keyword(s):  
Oxidation State ◽  
Nuclear Weapons ◽  
Lawrence Livermore National Laboratory ◽  
National Laboratory ◽  
Argonne National Laboratory ◽  
Waste Form ◽  
Ceramic Waste

ABSTRACTA titanate-based ceramic waste form, rich in phases structurally related to zirconolite (CaZrTi2O7), is being developed as a possible method for immobilizing excess plutonium from dismantled nuclear weapons. As part of this program, Lawrence Livermore National Laboratory (LLNL) produced several ceramics that were then characterized at Argonne National Laboratory (ANL). The plutonium-loaded ceramic was found to contain a Pu-Gd zirconolite phase but also contained plutonium titanates, Gd-polymignyte, and a series of other phases. In addition, much of the Pu was remained as PuO2-x. The Pu oxidation state in the zirconolite was determined to be mainly Pu4+, although some Pu3+ was believed to be present.

Some applications of electron beam microanalysis techniques in VLSI process evaluation

1983 ◽  
Vol 41 ◽  
pp. 160-161
Author(s):  
Simon Thomas
Keyword(s):  
Integrated Circuits ◽  
Process Evaluation ◽  
Large Scale ◽  
Technology Development ◽  
Analytical Techniques ◽  
Successful Implementation ◽  
Analysis Of Failures ◽  
Characterization Of Materials ◽  
Circuits Vlsi

Trends in the technology development of very large scale integrated circuits (VLSI) have been in the direction of higher density of components with smaller dimensions. The scaling down of device dimensions has been not only laterally but also in depth. Such efforts in miniaturization bring with them new developments in materials and processing. Successful implementation of these efforts is, to a large extent, dependent on the proper understanding of the material properties, process technologies and reliability issues, through adequate analytical studies. The analytical instrumentation technology has, fortunately, kept pace with the basic requirements of devices with lateral dimensions in the micron/ submicron range and depths of the order of nonometers. Often, newer analytical techniques have emerged or the more conventional techniques have been adapted to meet the more stringent requirements. As such, a variety of analytical techniques are available today to aid an analyst in the efforts of VLSI process evaluation. Generally such analytical efforts are divided into the characterization of materials, evaluation of processing steps and the analysis of failures.

Applications of ultramicrotomy for materials characterization

1993 ◽  
Vol 51 ◽  
pp. 232-233
Author(s):  
R.T. Blackham ◽  
J.J. Haugh ◽  
C.W. Hughes ◽  
M.G. Burke
Keyword(s):  
Materials Science ◽  
Microstructural Analysis ◽  
Analytical Electron Microscopy ◽  
Austenitic Stainless Steels ◽  
Specimen Preparation ◽  
Preparation Technique ◽  
Thermally Induced ◽  
Radiation Induced ◽  
Characterization Of Materials

Essential to the characterization of materials using analytical electron microscopy (AEM) techniques is the specimen itself. Without suitable samples, detailed microstructural analysis is not possible. Ultramicrotomy, or diamond knife sectioning, is a well-known mechanical specimen preparation technique which has been gaining attention in the materials science area. Malis and co-workers and Glanvill have demonstrated the usefulness and applicability of this technique to the study of a wide variety of materials including Al alloys, composites, and semiconductors. Ultramicrotomed specimens have uniform thickness with relatively large electron-transparent areas which are suitable for AEM anaysis.Interface Analysis in Type 316 Austenitic Stainless Steel: STEM-EDS microanalysis of grain boundaries in austenitic stainless steels provides important information concerning the development of Cr-depleted zones which accompany M23C6 precipitation, and documentation of radiation induced segregation (RIS). Conventional methods of TEM sample preparation are suitable for the evaluation of thermally induced segregation, but neutron irradiated samples present a variety of problems in both the preparation and in the AEM analysis, in addition to the handling hazard.

Electron and ion irradiation-induced dissolution of mechanical twins in the intermetalic U3Si: An in situ HVEM study

1989 ◽  
Vol 47 ◽  
pp. 652-653
Author(s):  
Charles W. Allen ◽  
Robert C. Birtcher
Keyword(s):  
Elevated Temperatures ◽  
Ion Irradiation ◽  
Ion Beam ◽  
National Laboratory ◽  
Argonne National Laboratory ◽  
Heavy Ion ◽  
High Energy ◽  
Mechanical Twinning ◽  
In Situ Experiments

The uranium silicides, including U3Si, are under study as candidate low enrichment nuclear fuels. Ion beam simulations of the in-reactor behavior of such materials are performed because a similar damage structure can be produced in hours by energetic heavy ions which requires years in actual reactor tests. This contribution treats one aspect of the microstructural behavior of U3Si under high energy electron irradiation and low dose energetic heavy ion irradiation and is based on in situ experiments, performed at the HVEM-Tandem User Facility at Argonne National Laboratory. This Facility interfaces a 2 MV Tandem ion accelerator and a 0.6 MV ion implanter to a 1.2 MeV AEI high voltage electron microscope, which allows a wide variety of in situ ion beam experiments to be performed with simultaneous irradiation and electron microscopy or diffraction.At elevated temperatures, U3Si exhibits the ordered AuCu3 structure. On cooling below 1058 K, the intermetallic transforms, evidently martensitically, to a body-centered tetragonal structure (alternatively, the structure may be described as face-centered tetragonal, which would be fcc except for a 1 pet tetragonal distortion). Mechanical twinning accompanies the transformation; however, diferences between electron diffraction patterns from twinned and non-twinned martensite plates could not be distinguished.

Environmental cell studies of deformation and fracture

1990 ◽  
Vol 48 (4) ◽  
pp. 516-517
Author(s):  
H. K. Birnbaum ◽  
I. M. Robertson
Keyword(s):  
National Laboratory ◽  
Argonne National Laboratory ◽  
Damage Threshold ◽  
Chromatic Aberration ◽  
Good Choice ◽  
Point Of View ◽  
Deformation And Fracture ◽  
Environmental Cell ◽  
Gas Molecules ◽  
The University

Studies of the effects of hydrogen environments on the deformation and fracture of fcc, bcc and hep metals and alloys have been carried out in a TEM environmental cell. The initial experiments were performed in the environmental cell of the HVEM facility at Argonne National Laboratory. More recently, a dedicated environmental cell facility has been constructed at the University of Illinois using a JEOL 4000EX and has been used for these studies. In the present paper we will describe the general design features of the JEOL environmental cell and some of the observations we have made on hydrogen effects on deformation and fracture.The JEOL environmental cell is designed to operate at 400 keV and below; in part because of the available accelerating voltage of the microscope and in part because the damage threshold of most materials is below 400 keV. The gas pressure at which chromatic aberration due to electron scattering from the gas molecules becomes excessive does not increase rapidly with with accelerating voltage making 400 keV a good choice from that point of view as well. A series of apertures were placed above and below the cell to control the pressures in various parts of the column.

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