HYDROGEN PEROXIDE. VII. THE DIELECTRIC CONSTANTS, REFRACTIVE INDICES AND IONIZING POWER OF HYDROGEN PEROXIDE AND ITS AQUEOUS SOLUTIONS

1930 ◽  
Vol 52 (2) ◽  
pp. 489-499 ◽  
Author(s):  
A. C. Cuthbertson ◽  
O. Maass
Keyword(s):  
Hydrogen Peroxide ◽  
Aqueous Solutions ◽  
Dielectric Constants ◽  
Refractive Indices

THE REFRACTIVE INDICES OF HYDROGEN PEROXIDE AND ITS AQUEOUS SOLUTIONS

1943 ◽  
Vol 21b (8) ◽  
pp. 156-162 ◽  
Author(s):  
Paul A. Giguère
Keyword(s):  
Hydrogen Peroxide ◽  
Refractive Index ◽  
Aqueous Solutions ◽  
Accurate Method ◽  
Refractive Indices ◽  
Pure Hydrogen ◽  
A Value ◽  
Concentration Of Solutions ◽  
Hydrogen Lines ◽  
Good Agreement

The refractive indices of aqueous solutions of hydrogen peroxide for the C-, F-, and G-lines of hydrogen and the sodium D-line have been measured over the whole range of concentration at four temperatures: 16°, 20°, 24°, and 28 °C. The results obtained with the hydrogen lines are somewhat different from those of Cuthbertson and Maass. A possible explanation of this discrepancy is given. By extrapolation it was found that for pure hydrogen peroxide nD = 1.4087 at 20°, a value in good agreement with previous determinations. The refractive index affords a rapid and fairly accurate method for determining the concentration of solutions of hydrogen peroxide.

Refractive indices, electronic polarizabilities and dielectric constants of alkali halides

1992 ◽  
Vol 33 (5) ◽  
pp. 389-393 ◽  
Author(s):  
R.R. Reddy ◽  
S. Anjaneyulu ◽  
T.V.R. Rao
Keyword(s):  
Alkali Halides ◽  
Dielectric Constants ◽  
Refractive Indices

Radiation-induced oxidation of 2-propanol by hydrogen peroxide in aqueous solutions

1970 ◽  
Vol 48 (18) ◽  
pp. 2948-2948
Author(s):  
C. E. Burchill ◽  
I. S. Ginns
Keyword(s):  
Hydrogen Peroxide ◽  
Aqueous Solutions ◽  
Radiation Induced

not available

Oxidation-reduction chemistry of hydrogen peroxide in aprotic and aqueous solutions

1979 ◽  
Vol 18 (7) ◽  
pp. 1971-1973 ◽  
Author(s):  
Mark M. Morrison ◽  
Julian L Roberts ◽  
Donald T. Sawyer
Keyword(s):  
Hydrogen Peroxide ◽  
Aqueous Solutions ◽  
Oxidation Reduction

Hydrogen Peroxide Yields in X-Irradiated Aqueous Solutions A Sensitive Method Based on Hydrazide Chemiluminescence

1955 ◽  
Vol 3 (4) ◽  
pp. 379 ◽  
Author(s):  
W. V. Mayneord ◽  
W. Anderson ◽  
H. D. Evans ◽  
D. Rosen
Keyword(s):  
Hydrogen Peroxide ◽  
Aqueous Solutions ◽  
Sensitive Method

Gamma radiolysis of alachlor aqueous solutions in the presence of hydrogen peroxide

2010 ◽  
Vol 184 (1-3) ◽  
pp. 308-312 ◽  
Author(s):  
Dongkyu Choi ◽  
O-Mi Lee ◽  
Seungho Yu ◽  
Seung-Woo Jeong
Keyword(s):  
Hydrogen Peroxide ◽  
Aqueous Solutions ◽  
Gamma Radiolysis

Etching Volume Effect on the Morphology of Silicon Etched by Metal-Assisted Chemical Method

2012 ◽  
Vol 217-219 ◽  
pp. 1141-1145 ◽  
Author(s):  
Wei Wang ◽  
Li Juan Zhao ◽  
Ping Xin Song ◽  
Ying Jiu Zhang
Keyword(s):  
Hydrogen Peroxide ◽  
Aqueous Solutions ◽  
Formation Mechanism ◽  
Ag Nanoparticles ◽  
Hydrofluoric Acid ◽  
Chemical Method ◽  
Volume Effect ◽  
Etching Solution ◽  
Si Substrates ◽  
Si Nanostructures

Assisted by Ag nanoparticles, Si substrates were etched in aqueous solutions containing hydrofluoric acid (HF) and hydrogen peroxide (H2O2) with different volumes of etching solution. The etching morphology of Si wafers was found to be affected by the volumes. In etching solutions with smaller volume, the pores were created; in etching solutions with larger volume, the nanostructure composed of nanowires and nanopores (pores+wires nanostructure) were generated. In addition, the lengths of these Si nanostructures increased with the increase of the etching volume. Possible formation mechanism for this phenomenon was discussed.

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