Negative-Ion Photoelectron Spectroscopy, Gas-Phase Acidity, and Thermochemistry of the Peroxyl Radicals CH3OO and CH3CH2OO

2001 ◽  
Vol 123 (39) ◽  
pp. 9585-9596 ◽  
Author(s):  
Stephen J. Blanksby ◽  
Tanya M. Ramond ◽  
Gustavo E. Davico ◽  
Mark R. Nimlos ◽  
Shuji Kato ◽  
...  
Keyword(s):  
Gas Phase ◽  
Photoelectron Spectroscopy ◽  
Peroxyl Radicals ◽  
Negative Ion ◽  
Gas Phase Acidity

Photoelectron spectroscopy, gas phase acidity, and thermochemistry of tert-butyl hydroperoxide: Mechanisms for the rearrangement of peroxyl radicals

1998 ◽  
Vol 109 (23) ◽  
pp. 10293-10310 ◽  
Author(s):  
Eileen P. Clifford ◽  
Paul G. Wenthold ◽  
Roustam Gareyev ◽  
W. Carl Lineberger ◽  
Charles H. DePuy ◽  
...  
Keyword(s):  
Gas Phase ◽  
Photoelectron Spectroscopy ◽  
Peroxyl Radicals ◽  
Butyl Hydroperoxide ◽  
Tert Butyl ◽  
Gas Phase Acidity ◽  
Tert Butyl Hydroperoxide

scholarly journals Negative ion photoelectron spectroscopy confirms the prediction that D3h carbon trioxide (CO3) has a singlet ground state

2016 ◽  
Vol 7 (2) ◽  
pp. 1142-1150 ◽  
Author(s):  
David A. Hrovat ◽  
Gao-Lei Hou ◽  
Bo Chen ◽  
Xue-Bin Wang ◽  
Weston Thatcher Borden
Keyword(s):  
Gas Phase ◽  
Ground State ◽  
Photoelectron Spectroscopy ◽  
Radical Anion ◽  
Negative Ion ◽  
Singlet Ground State

The CO3 radical anion (CO3˙−) has been formed by electrospraying carbonate dianion (CO32−) into the gas phase.

Negative Ion Photoelectron Spectroscopy of NH2-(NH3)1 and NH2-(NH3)2: Gas Phase Basicities of Partially Solvated Anions

1995 ◽  
Vol 99 (24) ◽  
pp. 9675-9680 ◽  
Author(s):  
Joseph T. Snodgrass ◽  
James V. Coe ◽  
Carl B. Freidhoff ◽  
Kevin M. McHugh ◽  
Susan T. Arnold ◽  
...  
Keyword(s):  
Gas Phase ◽  
Photoelectron Spectroscopy ◽  
Negative Ion ◽  
Gas Phase Basicities

Electron Affinity, Gas-Phase Acidity, Bond Dissociation Energy, and Negative Ion States of Nitromethane

1999 ◽  
Vol 103 (45) ◽  
pp. 9072-9079 ◽  
Author(s):  
Edward C. M. Chen ◽  
Natalie Welk ◽  
Edward S. Chen ◽  
W. E. Wentworth
Keyword(s):  
Gas Phase ◽  
Bond Dissociation Energy ◽  
Dissociation Energy ◽  
Electron Affinity ◽  
Negative Ion ◽  
Bond Dissociation ◽  
Gas Phase Acidity

Gas-phase study of the group VI transition metal tricarbonyl complexes by negative-ion photoelectron spectroscopy

1992 ◽  
Author(s):  
Ashfaq A. Bengali ◽  
Sean M. Casey ◽  
Chun-Lin Cheng ◽  
Jonathan P. Dick ◽  
P. T. Fenn ◽  
...  
Keyword(s):  
Transition Metal ◽  
Gas Phase ◽  
Photoelectron Spectroscopy ◽  
Negative Ion ◽  
Group Vi ◽  
Phase Study

Photoelectron Spectroscopy and Theoretical Study of AlnC5-/0 (n = 1-5) clusters: Structural Evolution, Relative Stability of Star-Like Cluster, and Planar Tetracoordinate Carbon Structure

2021 ◽  
Author(s):  
Chao-Jiang Zhang ◽  
Peng Wang ◽  
Xi-Ling Xu ◽  
Hong-Guang Xu ◽  
Weijun Zheng
Keyword(s):  
Gas Phase ◽  
Photoelectron Spectroscopy ◽  
Relative Stability ◽  
Theoretical Study ◽  
Structural Evolution ◽  
Carbon Structure ◽  
Anion Photoelectron Spectroscopy

The AlnC5- (n = 1-5) clusters were detected in the gas-phase and were investigated by mass-selected anion photoelectron spectroscopy. The structures of AlnC5-/0 (n = 1-5) were explored by theoretical...

scholarly journals Experimental and Computational Studies on the Gas-Phase Acidity of 5,5-Dialkyl Barbituric Acids

2021 ◽  
Author(s):  
Juan Z. Dávalos-Prado ◽  
Javier González ◽  
Josep M. Oliva-Enrich ◽  
Emma J. Urrunaga ◽  
Alexsandre F. Lago
Keyword(s):  
Gas Phase ◽  
Computational Studies ◽  
Gas Phase Acidity

scholarly journals Dry Etching Performance and Gas-Phase Parameters of C6F12O + Ar Plasma in Comparison with CF4 + Ar

Materials ◽  
2021 ◽  
Vol 14 (7) ◽  
pp. 1595
Author(s):  
Nomin Lim ◽  
Yeon Sik Choi ◽  
Alexander Efremov ◽  
Kwang-Ho Kwon
Keyword(s):  
Gas Phase ◽  
Photoelectron Spectroscopy ◽  
Reactive Ion Etching ◽  
Research Work ◽  
Optical Emission ◽  
Plasma Parameters ◽  
Ion Etching ◽  
Ar Plasma ◽  
Ar Gas ◽  
Etching Selectivity

This research work deals with the comparative study of C6F12O + Ar and CF4 + Ar gas chemistries in respect to Si and SiO2 reactive-ion etching processes in a low power regime. Despite uncertain applicability of C6F12O as the fluorine-containing etchant gas, it is interesting because of the liquid (at room temperature) nature and weaker environmental impact (lower global warming potential). The combination of several experimental techniques (double Langmuir probe, optical emission spectroscopy, X-ray photoelectron spectroscopy) allowed one (a) to compare performances of given gas systems in respect to the reactive-ion etching of Si and SiO2; and (b) to associate the features of corresponding etching kinetics with those for gas-phase plasma parameters. It was found that both gas systems exhibit (a) similar changes in ion energy flux and F atom flux with variations on input RF power and gas pressure; (b) quite close polymerization abilities; and (c) identical behaviors of Si and SiO2 etching rates, as determined by the neutral-flux-limited regime of ion-assisted chemical reaction. Principal features of C6F12O + Ar plasma are only lower absolute etching rates (mainly due to the lower density and flux of F atoms) as well as some limitations in SiO2/Si etching selectivity.

Nitrosyl Isocyanate (ONNCO):  Gas-Phase Generation and a HeI Photoelectron Spectroscopy Study

2005 ◽  
Vol 44 (25) ◽  
pp. 9283-9287 ◽  
Author(s):  
Xiaoqing Zeng ◽  
Maofa Ge ◽  
Zheng Sun ◽  
Dianxun Wang
Keyword(s):  
Gas Phase ◽  
Photoelectron Spectroscopy ◽  
Spectroscopy Study
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