A New Approach to the Combustion Calorimetry of Silicon and Organosilicon Compounds. Heats of Formation of Quartz, Fluorosilicic Acid, and Hexamethyldisiloxane1

1964 ◽  
Vol 68 (3) ◽  
pp. 579-586 ◽  
Author(s):  
W. D. Good ◽  
J. L. Lacina ◽  
B. L. DePrater ◽  
J. P. McCullough
1975 ◽  
Vol 30 (3) ◽  
pp. 347-355 ◽  
Author(s):  
P. Potzinger ◽  
A. Ritter ◽  
J. Krause

The appearance potentials for a large number of organosilicon ions have been measured. Combination of these values with thermochemical heats of combustion allow the determination of bond energy terms which may be used to calculate heats of formation for all silicon compounds containing hydrogen, alkyl and chlorine ligands. The bond dissoziation energies D(Si - H)= 89 ± 4, D(Si - C) = 85 ± 4 and D (Si - Si) =75 ± 8 kcal/Mol were found to be independent of the number of methylgroups attached to silicon. In addition the Si - Cl bond energy was found to be 116 and 104 kcal/Mol in (CH3)3SiCl and Cl3SiCl respectively.


1962 ◽  
Vol 35 (3) ◽  
pp. 661-664
Author(s):  
W. D. Good ◽  
J. L. Lacina ◽  
J. P. McCullough

Abstract The heats of combustion and formation were determined for tetramethylthiuram monosulfide [bis-(dimethylthiocarbamoyl) sulfide] and tetramethylthiuram disulfide [bis-(dimethylthiocarbamoyl) disulfide]. The S—S thermochemical bond energy in tetramethylthiuram disulfide was shown to be about the same as in normal alkane disulfides and in S8. Rotating-bomb combustion calorimetry was found satisfactory for compounds that contain both sulfur and nitrogen.


2021 ◽  
Author(s):  
Anton Anisimov ◽  
Maxim Temnikov ◽  
Ilya Krizhanovskiy ◽  
Ekaterina Timoshina ◽  
Sergey Milenin ◽  
...  

This work presents an approach to the preparation of functional hydridesilanes. The essence of the method is thiol-ene click reaction on vinyl or allylsilanes. In this case, the Si-H bond...


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