Spatial and temporal emission spectroscopy of a radio-frequency capacitively coupled low pressure oxygen discharge

1978 ◽  
Vol 82 (17) ◽  
pp. 1869-1875 ◽  
Author(s):  
Ramon M. Barnes ◽  
Richard J. Winslow
Keyword(s):  
Radio Frequency ◽  
Emission Spectroscopy ◽  
Low Pressure ◽  
Capacitively Coupled ◽  
Pressure Oxygen ◽  
Oxygen Discharge

scholarly journals Uses of radio emission spectroscopy for non-contact and in situ diagnostics of low pressure radio frequency plasma processing

2021 ◽  
Author(s):  
Rajani K. Vijayaraghavan ◽  
Sean Kelly ◽  
David Coates ◽  
Cezar Gaman ◽  
Niall MacGearailt ◽  
...  
Keyword(s):  
Radio Emission ◽  
Radio Frequency ◽  
Emission Spectroscopy ◽  
Near Field ◽  
Plasma Processing ◽  
Diagnostic Technique ◽  
Primary Source ◽  
Low Pressure ◽  
Chamber Pressure ◽  
Rf Plasma

Abstract We demonstrate that a passive non-contact diagnostic technique, radio emission spectroscopy (RES), provides a sensitive monitor of currents in a low pressure radio frequency (RF) plasma. A near field magnetic loop antenna was used to capture RF emissions from the plasma without perturbing it. The analysis was implemented for a capacitively coupled RF plasma with an RF supply at a frequency of 13.56 MHz. Real-time measurements are captured in scenarios relevant to contemporary challenges faced during semiconductor fabrication (e.g. window coating and wall disturbance). Exploration of the technique for key equipment parameters including applied RF power, chamber pressure, RF bias frequencies and chamber wall cleanliness shows sensitive and repeatable function. In particular, the induced RES signal was found to vary sensitively to pressure changes and we were able to detect pressure and power variations as low as ~2.5 %/mtorr and ~3.5 %/watt, respectively, during the plasma processing during a trial generic plasma process. Finally, we explored the ability of RES to monitor the operation of a multiple frequency low-pressure RF plasma system (f1 = 2 MHz, f2 = 162 MHz) and intermixing products which suggests strongly that the plasma sheaths are the primary source of this non-linear diode mixing effect.

scholarly journals Electron power absorption in low pressure capacitively coupled electronegative oxygen radio frequency plasmas

2020 ◽  
Vol 29 (2) ◽  
pp. 025019 ◽  
Author(s):  
Máté Vass ◽  
Sebastian Wilczek ◽  
Trevor Lafleur ◽  
Ralf Peter Brinkmann ◽  
Zoltán Donkó ◽  
...  
Keyword(s):  
Radio Frequency ◽  
Low Pressure ◽  
Power Absorption ◽  
Capacitively Coupled

Fast modeling of the low‐pressure capacitively coupled radio‐frequency discharge based on the nonlocal approach

1996 ◽  
Vol 69 (16) ◽  
pp. 2341-2343 ◽  
Author(s):  
S. V. Berezhnoi ◽  
I. D. Kaganovich ◽  
L. D. Tsendin ◽  
V. A. Schweigert
Keyword(s):  
Radio Frequency ◽  
Low Pressure ◽  
Capacitively Coupled ◽  
Nonlocal Approach ◽  
Radio Frequency Discharge

scholarly journals N2–H2 capacitively coupled radio-frequency discharges at low pressure: II. Modeling results: the relevance of plasma-surface interaction

2020 ◽  
Vol 29 (8) ◽  
pp. 085023 ◽  
Author(s):  
Miguel Jiménez-Redondo ◽  
Audrey Chatain ◽  
Olivier Guaitella ◽  
Guy Cernogora ◽  
Nathalie Carrasco ◽  
...  
Keyword(s):  
Radio Frequency ◽  
Low Pressure ◽  
Surface Interaction ◽  
Capacitively Coupled ◽  
Plasma Surface ◽  
Radio Frequency Discharges
Sign in / Sign up

Export Citation Format

Share Document