Solid-state linear sweep voltammetry: a probe of diffusion in thin films of polymer ion conductors on microdisk electrodes

1987 ◽  
Vol 91 (11) ◽  
pp. 2908-2914 ◽  
Author(s):  
L. Geng ◽  
R. A. Reed ◽  
M. Longmire ◽  
Royce W. Murray
Keyword(s):  
Thin Films ◽  
Solid State ◽  
Linear Sweep Voltammetry ◽  
Linear Sweep ◽  
Ion Conductors

scholarly journals InGaN as a Substrate for AC Photoelectrochemical Imaging

Sensors ◽  
2019 ◽  
Vol 19 (20) ◽  
pp. 4386 ◽  
Author(s):  
Bo Zhou ◽  
Anirban Das ◽  
Menno J. Kappers ◽  
Rachel A. Oliver ◽  
Colin J. Humphreys ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Impedance ◽  
Linear Sweep Voltammetry ◽  
Model System ◽  
Linear Sweep ◽  
High Frequencies ◽  
Ion Concentrations ◽  
Spatially Resolved ◽  
Semiconductor Interfaces ◽  
Dark Currents

AC photoelectrochemical imaging at electrolyte–semiconductor interfaces provides spatially resolved information such as surface potentials, ion concentrations and electrical impedance. In this work, thin films of InGaN/GaN were used successfully for AC photoelectrochemical imaging, and experimentally shown to generate a considerable photocurrent under illumination with a 405 nm modulated diode laser at comparatively high frequencies and low applied DC potentials, making this a promising substrate for bioimaging applications. Linear sweep voltammetry showed negligible dark currents. The imaging capabilities of the sensor substrate were demonstrated with a model system and showed a lateral resolution of 7 microns.

The Linear Sweep Voltammetric Study and Two-Step Electrodeposition of CuIn 0.95 Se2.1Thin Film in a Citric Acid Electrolyte

2012 ◽  
Vol 472-475 ◽  
pp. 2744-2747
Author(s):  
Wei Xiong ◽  
Fei Hu ◽  
Hua Bing Fang ◽  
Yue Hui Hu
Keyword(s):  
Thin Films ◽  
Citric Acid ◽  
Linear Sweep Voltammetry ◽  
Stoichiometric Ratio ◽  
Acid Electrolyte ◽  
Linear Sweep ◽  
Voltammetric Study ◽  
Reduction Current ◽  
One Step ◽  
The Ideal

Electrodeposition of CuInSe2 (CIS) thin films has been investigated by linear sweep voltammetry on F-doped tin oxide (FTO) glass in electrolytes containing citric acid. It is found that one-step electrodeposited CIS thin films have great deviation from the ideal stoichiometric ratio. After deposited a film at -900 mV (vs.SCE) for 20s on the FTO, the linear sweep voltammetry has showed that only one reduction current peak at -550 mV is remained, and the two-step electrodeposited CIS film showed a near- toichiometric ratio of 1:0.9:2.1.

scholarly journals Effect of Spin Coating Parameters on the Electrochemical Properties of Ruthenium Oxide Thin Films

Electrochem ◽  
2021 ◽  
Vol 2 (1) ◽  
pp. 83-94
Author(s):  
Elisabetta Petrucci ◽  
Monica Orsini ◽  
Francesco Porcelli ◽  
Serena De Santis ◽  
Giovanni Sotgiu
Keyword(s):  
Thin Films ◽  
Spin Coating ◽  
Rotation Speed ◽  
Ruthenium Oxide ◽  
Linear Sweep Voltammetry ◽  
Linear Sweep ◽  
X Ray ◽  
Cast Films ◽  
Spinning Speed ◽  
Titanium Foils

Ruthenium oxide (RuOx) thin films were spin coated by thermal decomposition of alcoholic solutions of RuCl3 on titanium foils and subsequently annealed at 400 °C. The effect of spin coating parameters, such as spinning speed, volume, and molar concentration of the precursor as well as the number of deposits, on the morphology and electrochemical performance of the electrodes was investigated. The films were characterized by scanning electron microscopy (SEM) equipped with energy-dispersive X-ray spectroscopy (EDX), cyclic voltammetry (CV) with and without chloride, and linear sweep voltammetry (LSV). The prepared materials were also compared to drop cast films and spin-coated films obtained by adopting low-temperature intermediate treatments. The results indicate that even dispersion of the oxide layer was always achieved. By tuning the spin coating parameters, it was possible to obtain different electrochemical responses. The most influential parameter is the number of deposits, while the concentration of the precursor salt and the rotation speed were less relevant, under the adopted conditions.

Characterization of Ta-Ti Thin Films by using a Scanning Droplet Cell in Combination with AC Linear Sweep Voltammetry

2014 ◽  
Vol 1 (5) ◽  
pp. 903-908 ◽  
Author(s):  
Mu Fan ◽  
Kirill Sliozberg ◽  
Fabio La Mantia ◽  
Naoko Miyashita ◽  
Marcel Hagymási ◽  
...  
Keyword(s):  
Thin Films ◽  
Linear Sweep Voltammetry ◽  
Linear Sweep ◽  
Scanning Droplet Cell

Characterization of ZnO thin films grown by linear sweep voltammetry

2014 ◽  
Author(s):  
Lahoucine Atourki ◽  
El Hassane Ihalane ◽  
Hassan Kirou ◽  
Ahmed Ihlal ◽  
Khalid Bouabid ◽  
...  
Keyword(s):  
Thin Films ◽  
Linear Sweep Voltammetry ◽  
Zno Thin Films ◽  
Linear Sweep

scholarly journals Dealloying Behavior of NiCo and NiCoCu Thin Films

2016 ◽  
Vol 2016 ◽  
pp. 1-10 ◽  
Author(s):  
Benjamin E. Peecher ◽  
Jennifer R. Hampton
Keyword(s):  
Thin Films ◽  
High Surface ◽  
High Surface Area ◽  
Linear Sweep Voltammetry ◽  
Porous Metals ◽  
Linear Sweep ◽  
Energy Applications ◽  
Before And After ◽  
Insight Into ◽  
Electrochemical Dealloying

Porous metals and alloys, such as those fabricated via electrochemical dealloying, are of interest for a variety of energy applications, ranging from their potential for enhanced catalytic behavior to their use as high surface area supports for pseudocapacitor materials. Here, the electrochemical dealloying process was explored for electrodeposited binary NiCo and ternary NiCoCu thin films. For each of the four different metal ratios, films were dealloyed using linear sweep voltammetry to various potentials in order to gain insight into the evolution of the film over the course of the linear sweep. Electrochemical capacitance, scanning electron microscopy, and energy dispersive X-ray spectroscopy were used to examine the structure and composition of each sample before and after linear sweep voltammetry was performed. For NiCo films, dealloying resulted in almost no change in composition but did result in an increased capacitance, with greater increases occurring at higher linear sweep potentials, indicating the removal of material from the films. Dealloying also resulted in the appearance of large pores on the surface of the high nickel percentage NiCo films, while low nickel percentage NiCo films had little observable change in morphology. For NiCoCu films, Cu was almost completely removed at linear sweep potentials greater than 0.5 V versus Ag/AgCl. The linear sweep removed large Cu-rich dendrites from the films, while also causing increases in measured capacitance.

scholarly journals Electrodeposition of Cu2O thin Film Onto Copper Substrate by Linear Sweep Voltammetry at Low Duration: Effect of Bath pH

2021 ◽  
Vol 12 (6) ◽  
pp. 7715-7724
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Raman Spectroscopy ◽  
Copper Substrate ◽  
Linear Sweep Voltammetry ◽  
Complexing Agent ◽  
X Ray Diffraction ◽  
Linear Sweep ◽  
X Ray ◽  
Cu2o Thin Films

Copper (II) oxide (Cu2O) has attracted much interest as a semiconductor material for solar cell applications. Here we report the synthesis of Cu2O, thin films through an economical and simple electrodeposition method at low duration (10 min) by linear sweep voltammetry (LSV) method at 50 °C bath temperature, with the use of citric acid as a complexing agent. The influence of pH value (pH = 9.5, 10.5, 11.5, and 12.5) on structural, morphological, and optical properties of the synthesized Cu2O thin films onto copper substrate was investigated. The synthesized Cu2O thin films have been characterized using various techniques like X-ray diffraction (XRD), Raman spectroscopy, Scanning Electron Microscopy (SEM-EDX), UV-vis spectrophotometry. The X-ray diffraction showed that the deposited thin films at pH= 9.5, 10.5, 11.5 matched well with the cubic (Pn-3m) structure and showed an improvement of the crystallinity near the value pH=10.5. Raman spectroscopy confirms the cubic structure of the synthesized thin film. Thin films show a high absorption coefficient in the visible spectra, and the calculated band gap energy value is near 1.8 eV.

scholarly journals Theory of linear sweep voltammetry with diffuse charge: Unsupported electrolytes, thin films, and leaky membranes

2017 ◽  
Vol 95 (3) ◽  
Author(s):  
David Yan ◽  
Martin Z. Bazant ◽  
P. M. Biesheuvel ◽  
Mary C. Pugh ◽  
Francis P. Dawson
Keyword(s):  
Thin Films ◽  
Linear Sweep Voltammetry ◽  
Linear Sweep

TEM studies of solid-state reactions in sputter-deposited Nb/Al multilayer thin films

1996 ◽  
Vol 54 ◽  
pp. 1020-1021
Author(s):  
F. Ma ◽  
S. Vivekanand ◽  
K. Barmak ◽  
C. Michaelsen
Keyword(s):  
Thin Films ◽  
Solid State ◽  
Stoichiometric Composition ◽  
Analytical Electron Microscopy ◽  
Grain Structure ◽  
Solid State Reactions ◽  
Multilayer Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Sputter Deposited

Solid state reactions in sputter-deposited Nb/Al multilayer thin films have been studied by transmission and analytical electron microscopy (TEM/AEM), differential scanning calorimetry (DSC) and X-ray diffraction (XRD). The Nb/Al multilayer thin films for TEM studies were sputter-deposited on (1102)sapphire substrates. The periodicity of the films is in the range 10-500 nm. The overall composition of the films are 1/3, 2/1, and 3/1 Nb/Al, corresponding to the stoichiometric composition of the three intermetallic phases in this system.Figure 1 is a TEM micrograph of an as-deposited film with periodicity A = dA1 + dNb = 72 nm, where d's are layer thicknesses. The polycrystalline nature of the Al and Nb layers with their columnar grain structure is evident in the figure. Both Nb and Al layers exhibit crystallographic texture, with the electron diffraction pattern for this film showing stronger diffraction spots in the direction normal to the multilayer. The X-ray diffraction patterns of all films are dominated by the Al(l 11) and Nb(l 10) peaks and show a merging of these two peaks with decreasing periodicity.

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