Dynamics of metastable dissociation and photodissociation of the gas-phase cluster ion (OCS:C2H2)+

1991 ◽  
Vol 95 (21) ◽  
pp. 8328-8337 ◽  
Author(s):  
Susan T. Graul ◽  
Michael T. Bowers
Keyword(s):  
1996 ◽  
Vol 100 (38) ◽  
pp. 15305-15308 ◽  
Author(s):  
Corey J. Weinheimer ◽  
James M. Lisy

1991 ◽  
Vol 11 (3-4) ◽  
pp. 205-208 ◽  
Author(s):  
Anna Giardini-Guidoni ◽  
Aldo Mele

A brief review of the experimental methods to obtain gas phase cluster ions is reported. Supersonic expansion and ionization, high pressure ion production and clusterization, ablation from solids are techniques used to study cluster chemistry. Studies of cluster ion formation from metal, metal oxides and metal carbides are illustrated together with considerations on their structure and stability.


2003 ◽  
Vol 227 (3) ◽  
pp. 391-399 ◽  
Author(s):  
Kenzo Hiraoka ◽  
Kiyotoshi Takao ◽  
Fumiyuki Nakagawa ◽  
Tomoyuki Iino ◽  
Masayumi Ishida ◽  
...  
Keyword(s):  

1992 ◽  
Vol 282 ◽  
Author(s):  
Seong-Don Hwang ◽  
S. S. Kher ◽  
J. T. Spencer ◽  
P. A. Dowben

ABSTRACTIt has been demonstrated that copper can be selectively deposited on a variety of substrates including Teflon (polytetrafluroethylene or PTFE), Kapton (polyimide resin), silicon and gallium arsnide from solution by photo-assisted initiated deposition. A copper containing solution was prepared from a mixture of copper(I) chloride (Cu2Ci2) and decaborane (B10H14) in diethyl ether and/or THF (tetrahydrofuran). The copper films were fabricated by ultraviolet photolytic decomposition of copper chloride and polyhedral borane clusters. This liquid phase deposition has a gas-phase cluster analog that also results in copper deposition via pyrolysis. The approach of depositing metal thin films selectively by pholysis from solution is a novel and an underutilized approach to selective area deposition.


Nanoscale ◽  
2014 ◽  
Vol 6 (14) ◽  
pp. 8177-8184 ◽  
Author(s):  
Peng Mao ◽  
Fangfang Sun ◽  
Hanchao Yao ◽  
Jing Chen ◽  
Bo Zhao ◽  
...  

Porous TiO2nanoparticle layers are fabricated by gas phase cluster beam deposition at glancing incidence.


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