Multivariable Predictive Control of Thin Film Deposition Using a Stochastic PDE Model

2005 ◽  
Vol 44 (8) ◽  
pp. 2416-2427 ◽  
Author(s):  
Dong Ni ◽  
Panagiotis D. Christofides
2010 ◽  
Vol 65 (16) ◽  
pp. 4720-4731 ◽  
Author(s):  
Xinyu Zhang ◽  
Gangshi Hu ◽  
Gerassimos Orkoulas ◽  
Panagiotis D. Christofides

2004 ◽  
Vol 128 (1) ◽  
pp. 315-325 ◽  
Author(s):  
Jionghua Jin ◽  
Huairui Guo ◽  
Shiyu Zhou

This paper presents a supervisory generalized predictive control (GPC) by combining GPC with statistical process control (SPC) for the control of the thin film deposition process. In the supervised GPC, the deposition process is described as an ARMAX model for each production run and GPC is applied to the in situ thickness-sensing data for thickness control. Supervisory strategies, developed from SPC techniques, are used to monitor process changes and estimate the disturbance magnitudes during production. Based on the SPC monitoring results, different supervisory strategies are used to revise the disturbance models and the control law in the GPC to achieve a satisfactory control performance. A case study is provided to demonstrate the developed methodology.


Author(s):  
M. Grant Norton ◽  
C. Barry Carter

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.


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