Heteroepitaxy of LaAlO3(100) on SrTiO3(100):  In Situ Growth of LaAlO3Thin Films by Metal−Organic Chemical Vapor Deposition from a Liquid Single Source

Graziella Malandrino; Ignazio L. Fragalà; Paolo Scardi

doi:10.1021/cm9804970

Heteroepitaxy of LaAlO3(100) on SrTiO3(100): In Situ Growth of LaAlO3Thin Films by Metal−Organic Chemical Vapor Deposition from a Liquid Single Source

Chemistry of Materials ◽

10.1021/cm9804970 ◽

1998 ◽

Vol 10 (12) ◽

pp. 3765-3768 ◽

Cited By ~ 25

Author(s):

Graziella Malandrino ◽

Ignazio L. Fragalà ◽

Paolo Scardi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

In Situ Growth ◽

Single Source ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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ChemInform Abstract: Heteroepitaxy of LaAlO3 (100) on SrTiO3 (100): In situ Growth of LaAlO3 Thin Films by Metal-Organic Chemical Vapor Deposition from a Liquid Single Source.

ChemInform ◽

10.1002/chin.199909021 ◽

2010 ◽

Vol 30 (9) ◽

pp. no-no

Author(s):

Graziella Malandrino ◽

Ignazio L. Fragala ◽

Paolo Scardi

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

In Situ Growth ◽

Single Source ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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New Precursors for Barium Metal-Organic Chemical Vapor Deposition. In situ Growth of Epitaxial Barium Titanate Films Using a Liquid Barium Precursor

Chemistry of Materials ◽

10.1021/cm00043a002 ◽

1994 ◽

Vol 6 (7) ◽

pp. 878-880 ◽

Cited By ~ 31

Author(s):

Deborah A. Neumayer ◽

Daniel B. Studebaker ◽

Bruce J. Hinds ◽

Charlotte L. Stern ◽

Tobin J. Marks

Keyword(s):

Chemical Vapor Deposition ◽

Barium Titanate ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

In Situ Growth ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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In situ growth of highly oriented Pb(Zr0.5Ti0.5)O3 thin films by low-temperature metal–organic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.121118 ◽

1998 ◽

Vol 72 (13) ◽

pp. 1572-1574 ◽

Cited By ~ 25

Author(s):

G.-R. Bai ◽

I-Fei Tsu ◽

A. Wang ◽

C. M. Foster ◽

C. E. Murray ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

In Situ Growth ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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ChemInform Abstract: In situ Growth of Epitaxial YAlO3 Thin Films by Metal-Organic Chemical Vapor Deposition.

ChemInform ◽

10.1002/chin.199315004 ◽

2010 ◽

Vol 24 (15) ◽

pp. no-no

Author(s):

B. HAN ◽

D. A. NEUMAYER ◽

D. L. SCHULZ ◽

B. J. HINDS ◽

T. J. MARKS ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

In Situ Growth ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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In-situ growth of Pb(Zr0.5Ti0.5)O3/RuO2heterostructures on Si(001) using low-temperature metal-organic chemical vapor deposition

Integrated Ferroelectrics ◽

10.1080/10584589708019973 ◽

1997 ◽

Vol 14 (1-4) ◽

pp. 23-31 ◽

Cited By ~ 6

Author(s):

C. M. Foster ◽

G.-R. Bai ◽

A. Wang ◽

J. Vetrone ◽

Y. Huang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

In Situ Growth ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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In situ oxidation for stabilization of Fe/MCM-41 catalyst prepared by metal organic chemical vapor deposition

Catalysis Communications ◽

10.1016/j.catcom.2007.02.009 ◽

2007 ◽

Vol 8 (11) ◽

pp. 1719-1723 ◽

Cited By ~ 13

Author(s):

Frank L.Y. Lam ◽

Xijun Hu

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

In Situ Oxidation ◽

Metal Organic ◽

Organic Chemical Vapor Deposition ◽

Mcm 41

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Fourier analysis applied on in situ laser reflectometry during III-nitride metal organic chemical vapor deposition growth

Journal of Applied Physics ◽

10.1063/1.2722247 ◽

2007 ◽

Vol 101 (9) ◽

pp. 093501 ◽

Cited By ~ 3

Author(s):

C. Simbrunner ◽

H. Sitter ◽

A. Bonanni

Keyword(s):

Chemical Vapor Deposition ◽

Fourier Analysis ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Chemical Vapor Deposition Growth ◽

Metal Organic ◽

Organic Chemical Vapor Deposition ◽

Laser Reflectometry

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Deposition of Thin Films of Gallium Sulfide from a Novel Single-Source Precursor, Ga(S2CNMeHex)3, by Low-Pressure Metal−Organic Chemical Vapor Deposition

Chemistry of Materials ◽

10.1021/cm9905040 ◽

1999 ◽

Vol 11 (12) ◽

pp. 3430-3432 ◽

Cited By ~ 37

Author(s):

Mike R. Lazell ◽

Paul O'Brien ◽

David J. Otway ◽

Jin-Ho Park

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Gallium Sulfide ◽

Single Source Precursor ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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In situ optical characterization of structures grown by metal-organic chemical vapor deposition

Solar Cells ◽

10.1016/0379-6787(87)90160-8 ◽

1987 ◽

Vol 21 (1-4) ◽

pp. 456-457

Author(s):

J.M. Olson ◽

A. Kibbler

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Optical Characterization ◽

Organic Chemical ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Deposition of Bismuth Chalcogenide Thin Films Using Novel Single-Source Precursors by Metal-Organic Chemical Vapor Deposition.

ChemInform ◽

10.1002/chin.200443025 ◽

2004 ◽

Vol 35 (43) ◽

Author(s):

John Waters ◽

David Crouch ◽

James Raftery ◽

Paul O'Brien

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Single Source Precursors ◽

Metal Organic ◽

Chalcogenide Thin Films ◽

Organic Chemical Vapor Deposition

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