Gold Nanoparticles Generated by Electron Beam Lithography of Gold(I)−Thiolate Thin Films

2005 ◽  
Vol 17 (23) ◽  
pp. 5774-5779 ◽  
Author(s):  
Muriel K. Corbierre ◽  
Jean Beerens ◽  
R. Bruce Lennox
Keyword(s):  
Thin Films ◽  
Gold Nanoparticles ◽  
Electron Beam ◽  
Electron Beam Lithography

Tunable Metallization by Assembly of Metal Nanoparticles in Polymer Thin Films by Photo- or Electron Beam Lithography

Langmuir ◽  
2005 ◽  
Vol 21 (20) ◽  
pp. 9352-9358 ◽  
Author(s):  
Dehui Yin ◽  
Shin Horiuchi ◽  
Masamichi Morita ◽  
Atsushi Takahara
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Metal Nanoparticles ◽  
Electron Beam Lithography ◽  
Polymer Thin Films

Utilization of As50Se50 thin films in electron beam lithography

2021 ◽  
Vol 259 ◽  
pp. 124052
Author(s):  
K. Palka ◽  
M. Kurka ◽  
S. Slang ◽  
M. Vlcek
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Electron Beam Lithography

Electron Beam Dose and PMMA Thickness Dependent Circularity and Diameter Analysis of Au Nanodots

2019 ◽  
Vol >15 (5) ◽  
pp. 486-491 ◽  
Author(s):  
Furkan Kuruoğlu ◽  
Özgür Yavuzçetin ◽  
Ayşe Erol
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Electron Beam ◽  
Electron Beam Lithography ◽  
Thermal Evaporation ◽  
Exposure Dose ◽  
Homogeneous Distribution ◽  
Electrical And Optical Properties ◽  
Beam Dose ◽  
Au Nanodots

Background: The electrical and optical properties of nanoparticle-based devices depend on the shape, dimension and uniformity of these particles. Methods: In this work, we fabricated ordered Au nanodots using electron beam lithography and thermal evaporation. Au nanodot diameter and circularity varied with a changed exposure dose and resist thickness. Electron beam dose ranged from 5 fC to 200 fC for single dot patterns. Commonly used PMMA thin films of thicknesses 60 nm and 100 nm coated samples were used for investigating the resist thickness dependency with varying dose exposure. Results: The analyses of patterns show that the diameter and circularity of the Au nanodots ranged from smaller to larger diameters and from lower to higher circularities with increasing dose and resist thickness. Conclusion: The distributions of the nanodot diameter began to show Gaussian behavior at larger electron doses. Besides, single circularity value became dominant up to the medium doses and then a homogeneous distribution was observed with the increasing dose.

scholarly journals Guided immobilisation of single gold nanoparticles by chemical electron beam lithography

2013 ◽  
Vol 4 ◽  
pp. 336-344 ◽  
Author(s):  
Patrick A Schaal ◽  
Ulrich Simon
Keyword(s):  
Gold Nanoparticles ◽  
Atomic Force Microscopy ◽  
Electron Beam ◽  
Self Assembly ◽  
Electron Beam Lithography ◽  
Current Interest ◽  
Force Microscopy ◽  
Periodic Arrays ◽  
Atomic Force ◽  
Step Procedure

The fabrication of periodic arrays of single metal nanoparticles is of great current interest. In this paper we present a straight-forward three-step procedure based on chemical electron beam lithography, which is capable of producing such arrays with gold nanoparticles (AuNPs). Preformed 6 nm AuNPs are immobilised on thiol patterns with a pitch of 100 nm by guided self-assembly. Afterwards, these arrays are characterised by using atomic force microscopy.

Patterning of permalloy thin films by means of electron-beam lithography and focused ion-beam milling

2008 ◽  
Vol 44 (4-5) ◽  
pp. 699-704 ◽  
Author(s):  
S. Getlawi ◽  
M.R. Koblischka ◽  
U. Hartmann ◽  
C. Richter ◽  
T. Sulzbach
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Electron Beam Lithography ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Permalloy Thin Films ◽  
Focused Ion Beam Milling

Electron-beam lithography assisted patterning of surfactant-templated mesoporous thin films

2004 ◽  
Vol 15 (12) ◽  
pp. 1886-1889 ◽  
Author(s):  
Chia-Wen Wu ◽  
Tsuyoshi Aoki ◽  
Makoto Kuwabara
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Electron Beam Lithography ◽  
Mesoporous Thin Films
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