HF Etchant Solutions in Supercritical Carbon Dioxide for “Dry” Etch Processing of Microelectronic Devices

2003 ◽  
Vol 15 (15) ◽  
pp. 2867-2869 ◽  
Author(s):  
Charles A. Jones ◽  
Dongxing Yang ◽  
Eugene A. Irene ◽  
Stephen M. Gross ◽  
Mark Wagner ◽  
...  
2009 ◽  
Vol 86 (2) ◽  
pp. 128-131 ◽  
Author(s):  
Jae Hyun Bae ◽  
Md. Zahangir Alam ◽  
Jae Mok Jung ◽  
Yeong-Soon Gal ◽  
Hyosan Lee ◽  
...  

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