Remote Hydrogen Plasma Chemical Vapor Deposition from (Dimethylsilyl)(trimethylsilyl)methane. 2. Property−Structure Relationships for Resulting Silicon−Carbon Films
2001 ◽
Vol 11
(PR3)
◽
pp. Pr3-691-Pr3-702
2002 ◽
Vol 86
(6)
◽
pp. 1445-1458
◽
2010 ◽
Vol 49
(7)
◽
pp. 075501
◽