Nucleation and Chemical Vapor Deposition Growth of Polycrystalline Diamond on Aluminum Nitride: Role of Surface Termination and Polarity

2013 ◽  
Vol 13 (8) ◽  
pp. 3490-3497 ◽  
Author(s):  
Jiri Cervenka ◽  
Desmond W. M. Lau ◽  
Nikolai Dontschuk ◽  
Olga Shimoni ◽  
Leonardo Silvestri ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Aluminum Nitride ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Chemical Vapor Deposition Growth ◽  
Surface Termination

Role of Hydrogen in Graphene Chemical Vapor Deposition Growth on a Copper Surface

2014 ◽  
Vol 136 (8) ◽  
pp. 3040-3047 ◽  
Author(s):  
Xiuyun Zhang ◽  
Lu Wang ◽  
John Xin ◽  
Boris I. Yakobson ◽  
Feng Ding
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Copper Surface ◽  
Chemical Vapor Deposition Growth

Role of Hydrogen in Chemical Vapor Deposition Growth of Large Single-Crystal Graphene

ACS Nano ◽  
2011 ◽  
Vol 5 (7) ◽  
pp. 6069-6076 ◽  
Author(s):  
Ivan Vlassiouk ◽  
Murari Regmi ◽  
Pasquale Fulvio ◽  
Sheng Dai ◽  
Panos Datskos ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Single Crystal ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Large Single Crystal ◽  
Chemical Vapor Deposition Growth

The role of hydrogen in oxygen-assisted chemical vapor deposition growth of millimeter-sized graphene single crystals

Nanoscale ◽  
2016 ◽  
Vol 8 (14) ◽  
pp. 7646-7653 ◽  
Author(s):  
Pei Zhao ◽  
Yu Cheng ◽  
Dongchen Zhao ◽  
Kun Yin ◽  
Xuewei Zhang ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Single Crystals ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Growth

scholarly journals Isotope Effect in Thermal Conductivity of Polycrystalline CVD-Diamond: Experiment and Theory

Crystals ◽  
2021 ◽  
Vol 11 (4) ◽  
pp. 322
Author(s):  
Alexander V. Inyushkin ◽  
Alexander N. Taldenkov ◽  
Victor G. Ralchenko ◽  
Andrey P. Bolshakov ◽  
Alexander V. Khomich
Keyword(s):  
Thermal Conductivity ◽  
Chemical Vapor Deposition ◽  
Isotopic Composition ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Cvd Diamond ◽  
Plasma Chemical Vapor Deposition

We measured the thermal conductivity κ(T) of polycrystalline diamond with natural (natC) and isotopically enriched (12C content up to 99.96 at.%) compositions over a broad temperature T range, from 5 to 410 K. The high quality polycrystalline diamond wafers were produced by microwave plasma chemical vapor deposition in CH4-H2 mixtures. The thermal conductivity of 12C diamond along the wafer, as precisely determined using a steady-state longitudinal heat flow method, exceeds much that of the natC sample at T>60 K. The enriched sample demonstrates the value of κ(298K)=25.1±0.5 W cm−1 K−1 that is higher than the ever reported conductivity of natural and synthetic single crystalline diamonds with natural isotopic composition. A phenomenological theoretical model based on the full version of Callaway theory of thermal conductivity is developed which provides a good approximation of the experimental data. The role of different resistive scattering processes, including due to minor isotope 13C atoms, defects, and grain boundaries, is estimated from the data analysis. The model predicts about a 37% increase of thermal conductivity for impurity and dislocation free polycrystalline chemical vapor deposition (CVD)-diamond with the 12C-enriched isotopic composition at room temperature.

Understanding the Role of Sulfur in Tuning the Diameter and Morphology in the Chemical Vapor Deposition Growth of Carbon Nanotubes

2011 ◽  
Vol 1 (2) ◽  
pp. 160-166 ◽  
Author(s):  
Rahul Rao ◽  
Neal Pierce ◽  
Xianfeng Zhang ◽  
Robert Wheeler ◽  
Benji Maruyama ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Growth

The role of Ga in the chemical vapor deposition growth of ternary AlxGa1−xN nanowires

2015 ◽  
Vol 620 ◽  
pp. 87-90 ◽  
Author(s):  
Fan Ye ◽  
Xing-Min Cai ◽  
Xue Zhong ◽  
Huan Wang ◽  
Xiao-Qing Tian ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Growth

Role of hydrogen in the chemical vapor deposition growth of MoS2 atomic layers

Nanoscale ◽  
2015 ◽  
Vol 7 (18) ◽  
pp. 8398-8404 ◽  
Author(s):  
Xiao Li ◽  
Xinming Li ◽  
Xiaobei Zang ◽  
Miao Zhu ◽  
Yijia He ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Growth ◽  
Etching Effect

In the two-step chemical vapor deposition growth of MoS2, hydrogen plays crucial roles as an inhibitor of the thermal-induced etching effect and as a promoter of desulfurization and oxidation of the obtained MoSx films.

Chemical vapor deposition growth and characterization of AlGaN nanowires

2015 ◽  
Vol 32 (6) ◽  
pp. 638
Author(s):  
Xingmin Cai ◽  
Xiaoqiang Su ◽  
Fan Ye ◽  
Huan Wang ◽  
Guangxing Liang ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Growth

Epitaxial mist chemical vapor deposition growth and characterization of Cu3N films on (0001)α-Al2O3 substrates

2020 ◽  
Vol 13 (7) ◽  
pp. 075505
Author(s):  
Tomohiro Yamaguchi ◽  
Hiroki Nagai ◽  
Takanori Kiguchi ◽  
Nao Wakabayashi ◽  
Takuto Igawa ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Growth ◽  
Α Al2o3
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