A Method for Combinatorial Fabrication and Characterization of Organic/Inorganic Thin Film Devices in UHV

2006 ◽  
Vol 8 (3) ◽  
pp. 275-279 ◽  
Author(s):  
Stefan Egger ◽  
Seiji Higuchi ◽  
Tomonobu Nakayama
Keyword(s):  
Thin Film ◽  
Fabrication And Characterization ◽  
Thin Film Devices

scholarly journals CISSY: A station for preparation and surface/interface analysis of thin film materials and devices

2016 ◽  
Vol 2 ◽  
Author(s):  
Iver Lauermann ◽  
Alexander Steigert
Keyword(s):  
Thin Film ◽  
Molecular Beam ◽  
Ambient Pressure ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
X Ray ◽  
Fabrication And Characterization ◽  
X Ray Absorption ◽  
Thin Film Devices

The CISSY end station combines thin film deposition (sputtering, molecular beam epitaxy ambient-pressure methods) with surface and bulk-sensitive analysis (photo emission, x-ray emission, x-ray absorption) in the same UHV system, allowing fast and contamination–free transfer between deposition and analysis. It is mainly used for the fabrication and characterization of thin film devices and their components like thin film photovoltaic cells, water-splitting devices and other functional thin film materials.

scholarly journals Fabrication and characterization of CaS and SrS multi-color electroluminescent thin film devices.

1986 ◽  
Vol 40 (10) ◽  
pp. 991-997
Author(s):  
Hiroshi Kobayashi ◽  
Shosaku Tanaka ◽  
Hiroshi Deguchi ◽  
Yoshiro Mikami ◽  
Shozo Ohshio ◽  
...  
Keyword(s):  
Thin Film ◽  
Fabrication And Characterization ◽  
Thin Film Devices

scholarly journals Fabrication and characterization of copper-tin-sulfide thin film

2018 ◽  
Author(s):  
F. Welatta ◽  
A. El Kissani ◽  
M. Aggour ◽  
A. Outzourhit
Keyword(s):  
Thin Film ◽  
Tin Sulfide ◽  
Fabrication And Characterization
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