Direct Observation of Poly(3-hydroxybutyrate) Depolymerase Adsorbed on Polyester Thin Film by Atomic Force Microscopy

2004 ◽  
Vol 5 (5) ◽  
pp. 1642-1646 ◽  
Author(s):  
Yoshihiro Kikkawa ◽  
Masahiro Fujita ◽  
Tomohiro Hiraishi ◽  
Mamoru Yoshimoto ◽  
Yoshiharu Doi
Keyword(s):  
Thin Film ◽  
Atomic Force Microscopy ◽  
Direct Observation ◽  
Force Microscopy ◽  
Atomic Force

Direct Observation of SEI Formation and Lithiation in Thin-Film Silicon Electrodes via in Situ Electrochemical Atomic Force Microscopy

2019 ◽  
Vol 2 (9) ◽  
pp. 6761-6767 ◽  
Author(s):  
Svenja Benning ◽  
Chunguang Chen ◽  
Rüdiger-A. Eichel ◽  
Peter H. L. Notten ◽  
Florian Hausen
Keyword(s):  
Thin Film ◽  
Atomic Force Microscopy ◽  
Direct Observation ◽  
Force Microscopy ◽  
Atomic Force ◽  
Thin Film Silicon

DIRECT OBSERVATION BY ATOMIC FORCE MICROSCOPY OF SEVERAL BACTERIA SPECIES

1996 ◽  
Vol 86 (2-3) ◽  
pp. 193-193
Author(s):  
Denis ROBICHON ◽  
Jean-Franc¸ois CAVELLIER ◽  
Yves CENATIEMPO ◽  
Jean-Christophe GIRARD
Keyword(s):  
Atomic Force Microscopy ◽  
Direct Observation ◽  
Force Microscopy ◽  
Atomic Force

Direct observation of polyhydroxyalkanoate chains by atomic force microscopy

2002 ◽  
Vol 91 (1-4) ◽  
pp. 157-164 ◽  
Author(s):  
Kumar Sudesh ◽  
Zhihua Gan ◽  
Ken’ichiro Matsumoto ◽  
Yoshiharu Doi
Keyword(s):  
Atomic Force Microscopy ◽  
Direct Observation ◽  
Force Microscopy ◽  
Atomic Force

Direct observation of surfactant aggregate behavior on a mica surface using high-speed atomic force microscopy

2011 ◽  
Vol 47 (17) ◽  
pp. 4974 ◽  
Author(s):  
Shigeto Inoue ◽  
Takayuki Uchihashi ◽  
Daisuke Yamamoto ◽  
Toshio Ando
Keyword(s):  
Atomic Force Microscopy ◽  
Direct Observation ◽  
High Speed ◽  
Mica Surface ◽  
Force Microscopy ◽  
Atomic Force ◽  
Aggregate Behavior

A HfO2 Thin Film Resistive Switch Based on Conducting Atomic Force Microscopy

2011 ◽  
Vol 14 (8) ◽  
pp. H311 ◽  
Author(s):  
J. Y. Son ◽  
D.-Y. Kim ◽  
H. Kim ◽  
W. J. Maeng ◽  
Y.-S. Shin ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Force Microscopy ◽  
Resistive Switch ◽  
Force Microscopy ◽  
Atomic Force

Effect of ultra-thin Cu underlayer on the magnetic properties of Ni80Fe50 / Fe50Mn50 films

1999 ◽  
Vol 562 ◽  
Author(s):  
C. Liu ◽  
L. Shen ◽  
H. Jiang ◽  
D. Yang ◽  
G. Wu ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Force Microscopy ◽  
Exchange Bias ◽  
Film Material ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Maximum Value ◽  
Film Roughness

ABSTRACTThe Ni80Fe20/Fe50Mn50,thin film system exhibits exchange bias behavior. Here a systematic study of the effect of atomic-scale thin film roughness on coercivity and exchange bias is presented. Cu (t) / Ta (100 Å) / Ni80Fe20 (100 Å) / Fe50Mno50 (200 Å) / Ta (200 Å) with variable thickness, t, of the Cu underlayer were DC sputtered on Si (100) substrates. The Cu underlayer defines the initial roughness that is transferred to the film material since the film grows conformal to the initial morphology. Atomic Force Microscopy and X-ray diffraction were used to study the morphology and texture of the films. Morphological characterization is then correlated with magnetometer measurements. Atomic Force Microscopy shows that the root mean square value of the film roughness exhibits a maximum of 2.5 Å at t = 2.4 Å. X-ray diffraction spectra show the films are polycrystalline with fcc (111) texture and the Fe50Mn50 (111) peak intensity decreases monotonically with increasing Cu thickness, t. Without a Cu underlayer, the values of the coercivity and loop shift are, Hc = 12 Oe and Hp = 56 Oe, respectively. Both the coercivity and loop shift change with Cu underlayer thickness. The coercivity reaches a maximum value of Hc= 36 Oe at t = 4 Å. The loop shift exhibits an initial increase with t, reaches a maximum value of HP = 107 Oe at t = 2.4 Å, followed by a decrease with greater Cu thickness. These results show that a tiny increase in the film roughness has a huge effect on the exchange bias magnitude.

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