Direct Observation of SEI Formation and Lithiation in Thin-Film Silicon Electrodes via in Situ Electrochemical Atomic Force Microscopy

2019 ◽  
Vol 2 (9) ◽  
pp. 6761-6767 ◽  
Author(s):  
Svenja Benning ◽  
Chunguang Chen ◽  
Rüdiger-A. Eichel ◽  
Peter H. L. Notten ◽  
Florian Hausen
2003 ◽  
Vol 204 (15) ◽  
pp. 1822-1831 ◽  
Author(s):  
Yoshihiro Kikkawa ◽  
Hideki Abe ◽  
Masahiro Fujita ◽  
Tadahisa Iwata ◽  
Yoshio Inoue ◽  
...  

2002 ◽  
Vol 8 (5) ◽  
pp. 422-428 ◽  
Author(s):  
L.Y. Beaulieu ◽  
A.D. Rutenberg ◽  
J.R. Dahn

Measuring the changing thickness of a thin film, without a reference, using an atomic force microscope (AFM) is problematic. Here, we report a method for measuring film thickness based on in situ monitoring of surface roughness of films as their thickness changes. For example, in situ AFM roughness measurements have been performed on alloy film electrodes on rigid substrates as they react with lithium electrochemically. The addition (or removal) of lithium to (or from) the alloy causes the latter to expand (or contract) reversibly in the direction perpendicular to the substrate and, in principle, the change in the overall height of these materials is directly proportional to the change in roughness. If the substrate on which the film is deposited is not perfectly smooth, a correction to the direct proportionality is needed and this is also discussed.


2013 ◽  
Vol 222 ◽  
pp. 417-425 ◽  
Author(s):  
Jonghyun Park ◽  
Sergiy Kalnaus ◽  
Sangwoo Han ◽  
Yoon Koo Lee ◽  
Gregory B. Less ◽  
...  

2004 ◽  
Vol 5 (5) ◽  
pp. 1642-1646 ◽  
Author(s):  
Yoshihiro Kikkawa ◽  
Masahiro Fujita ◽  
Tomohiro Hiraishi ◽  
Mamoru Yoshimoto ◽  
Yoshiharu Doi

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