Indium Oxide Thin-Film Transistors Processed at Low Temperature via Ultrasonic Spray Pyrolysis

2014 ◽  
Vol 7 (1) ◽  
pp. 782-790 ◽  
Author(s):  
Hendrik Faber ◽  
Yen-Hung Lin ◽  
Stuart R. Thomas ◽  
Kui Zhao ◽  
Nikos Pliatsikas ◽  
...  
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Spray Pyrolysis ◽  
Indium Oxide ◽  
Thin Film Transistors ◽  
Ultrasonic Spray Pyrolysis ◽  
Oxide Thin Film ◽  
Ultrasonic Spray ◽  
Indium Oxide Thin Film

Low-Temperature Aqueous Route Processed Indium Oxide Thin-Film Transistors by NH3 Plasma-Assisted Treatment

2019 ◽  
Vol 66 (3) ◽  
pp. 1302-1307 ◽  
Author(s):  
Xuyang Li ◽  
Jin Cheng ◽  
Yonghua Chen ◽  
Yunfei He ◽  
Yan Li ◽  
...  
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Indium Oxide ◽  
Thin Film Transistors ◽  
Oxide Thin Film ◽  
Indium Oxide Thin Film

Facile patterning of amorphous indium oxide thin films based on a gel-like aqueous precursor for low-temperature, high performance thin-film transistors

2016 ◽  
Vol 4 (10) ◽  
pp. 2072-2078 ◽  
Author(s):  
Yuzhi Li ◽  
Linfeng Lan ◽  
Peng Xiao ◽  
Zhenguo Lin ◽  
Sheng Sun ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Low Temperature ◽  
Indium Oxide ◽  
Thin Film Transistors ◽  
High Performance ◽  
Oxide Thin Film ◽  
Oxide Thin Films ◽  
Indium Oxide Thin Film

Facile patterning of chloride-based precursor films for low-temperature, high performance indium oxide thin-film transistors.

Fabrication of high-performance, low-temperature solution processed amorphous indium oxide thin-film transistors using a volatile nitrate precursor

2015 ◽  
Vol 3 (4) ◽  
pp. 854-860 ◽  
Author(s):  
Chang-Ho Choi ◽  
Seung-Yeol Han ◽  
Yu-Wei Su ◽  
Zhen Fang ◽  
Liang-Yu Lin ◽  
...  
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Indium Oxide ◽  
Thin Film Transistors ◽  
High Performance ◽  
Oxide Thin Film ◽  
Annealing Temperatures ◽  
Nitrate Precursor ◽  
Temperature Solution ◽  
Indium Oxide Thin Film

In this study, we fabricate amorphous indium oxide thin film transistors (TFTs) on a display glass substrate at various annealing temperatures from 200 °C to 300 °C.

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