Double Open-Circuit Voltage of Three-Dimensional ZnO/CdTe Solar Cells by a Balancing Depletion Layer

2014 ◽  
Vol 6 (16) ◽  
pp. 14718-14723 ◽  
Author(s):  
Jing-Jing Wang ◽  
Tao Ling ◽  
Shi-Zhang Qiao ◽  
Xi-Wen Du
2018 ◽  
Vol 9 ◽  
pp. 1802-1808 ◽  
Author(s):  
Katherine Atamanuk ◽  
Justin Luria ◽  
Bryan D Huey

The nanoscale optoelectronic properties of materials can be especially important for polycrystalline photovoltaics including many sensor and solar cell designs. For thin film solar cells such as CdTe, the open-circuit voltage and short-circuit current are especially critical performance indicators, often varying between and even within individual grains. A new method for directly mapping the open-circuit voltage leverages photo-conducting AFM, along with an additional proportional-integral-derivative feedback loop configured to maintain open-circuit conditions while scanning. Alternating with short-circuit current mapping efficiently provides complementary insight into the highly microstructurally sensitive local and ensemble photovoltaic performance. Furthermore, direct open-circuit voltage mapping is compatible with tomographic AFM, which additionally leverages gradual nanoscale milling by the AFM probe essentially for serial sectioning. The two-dimensional and three-dimensional results for CdTe solar cells during in situ illumination reveal local to mesoscale contributions to PV performance based on the order of magnitude variations in photovoltaic properties with distinct grains, at grain boundaries, and for sub-granular planar defects.


Nature Energy ◽  
2016 ◽  
Vol 1 (6) ◽  
Author(s):  
Yuan Zhao ◽  
Mathieu Boccard ◽  
Shi Liu ◽  
Jacob Becker ◽  
Xin-Hao Zhao ◽  
...  

Solar Energy ◽  
2019 ◽  
Vol 189 ◽  
pp. 389-397 ◽  
Author(s):  
Craig H. Swartz ◽  
Sadia R. Rab ◽  
Sanjoy Paul ◽  
Maikel F.A.M. van Hest ◽  
Benjia Dou ◽  
...  

2009 ◽  
Vol 1210 ◽  
Author(s):  
Kuo-Jui Hsiao ◽  
James R. Sites

AbstractIncorporation of an electron reflector is a proposed strategy to improve the open-circuit voltage of CdTe thin-film solar cells. An electron reflector is basically a conduction-band barrier at the back surface, which can reduce the recombination resulting from the electron flow to the back surface. It should be particularly beneficial for cells with thicknesses below two microns when the CdTe absorber layer is fully depleted at its typical carrier density, because back-surface recombination is a primary limitation to the performance of fully depleted cells. Cells with thickness below two microns can also benefit from optical reflection at the back interface. One-dimension numerical simulation is used to investigate the electron reflector strategy and optical back reflection for thin CdTe cells. Theoretically, about a 200-mV increase in voltage and 3% in efficiency are achievable for a thin CdTe solar cell with 2×1014-cm-3 hole density, 1-ns lifetime, and a 0.2-eV electron reflector barrier. Furthermore, with the electron reflector, good CdTe cell performance at thicknesses as thin as 0.4 μm should be possible.


Nature Energy ◽  
2016 ◽  
Vol 1 (3) ◽  
Author(s):  
J. M. Burst ◽  
J. N. Duenow ◽  
D. S. Albin ◽  
E. Colegrove ◽  
M. O. Reese ◽  
...  

Nature Energy ◽  
2016 ◽  
Vol 1 (5) ◽  
Author(s):  
J. M. Burst ◽  
J. N. Duenow ◽  
D. S. Albin ◽  
E. Colegrove ◽  
M. O. Reese ◽  
...  

2003 ◽  
Vol 762 ◽  
Author(s):  
Jianhua Zhu ◽  
Vikram L. Dalal

AbstractWe report on the growth and properties of microcrystalline Si:H and (Si,Ge):H solar cells on stainless steel substrates. The solar cells were grown using a remote, low pressure ECR plasma system. In order to crystallize (Si,Ge), much higher hydrogen dilution (∼40:1) had to be used compared to the case for mc-Si:H, where a dilution of 10:1 was adequate for crystallization. The solar cell structure was of the p+nn+ type, with light entering the p+ layer. It was found that it was advantageous to use a thin a-Si:H buffer layer at the back of the cells in order to reduce shunt density and improve the performance of the cells. A graded gap buffer layer was used at the p+n interface so as to improve the open-circuit voltage and fill factor. The open circuit voltage and fill factor decreased as the Ge content increased. Quantum efficiency measurements indicated that the device was indeed microcrystalline and followed the absorption characteristics of crystalline ( Si,Ge). As the Ge content increased, quantum efficiency in the infrared increased. X-ray measurements of films indicated grain sizes of ∼ 10nm. EDAX measurements were used to measure the Ge content in the films and devices. Capacitance measurements at low frequencies ( ~100 Hz and 1 kHz) indicated that the base layer was indeed behaving as a crystalline material, with classical C(V) curves. The defect density varied between 1x1016 to 2x1017/cm3, with higher defects indicated as the Ge concentration increased.


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