Templated Homoepitaxial Growth with Atomic Layer Deposition of Single-Crystal Anatase (101) and Rutile (110) TiO2

2014 ◽  
Vol 6 (13) ◽  
pp. 9946-9949 ◽  
Author(s):  
Theodore J. Kraus ◽  
Alexander B. Nepomnyashchii ◽  
B. A. Parkinson
Keyword(s):  
Atomic Layer Deposition ◽  
Single Crystal ◽  
Atomic Layer ◽  
Homoepitaxial Growth ◽  
Layer Deposition

Epitaxy of High-Quality Single-Crystal Hexagonal Perovskite YAlO3 on GaAs(111)A Using Laminated Atomic Layer Deposition

2019 ◽  
Vol 19 (4) ◽  
pp. 2030-2036 ◽  
Author(s):  
Lawrence Boyu Young ◽  
Chao-Kai Cheng ◽  
Keng-Yung Lin ◽  
Yen-Hsun Lin ◽  
Hsien-Wen Wan ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Single Crystal ◽  
Atomic Layer ◽  
High Quality ◽  
High Quality Single Crystal ◽  
Layer Deposition

Heteroepitaxy of single-crystal LaLuO3 on GaAs(111)A by atomic layer deposition

2010 ◽  
Vol 97 (16) ◽  
pp. 162910 ◽  
Author(s):  
Yiqun Liu ◽  
Min Xu ◽  
Jaeyeong Heo ◽  
Peide D. Ye ◽  
Roy G. Gordon
Keyword(s):  
Atomic Layer Deposition ◽  
Single Crystal ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Single-Crystal Y2O3 Epitaxially on GaAs(001) and (111) Using Atomic Layer Deposition

Materials ◽  
2015 ◽  
Vol 8 (10) ◽  
pp. 7084-7093 ◽  
Author(s):  
Y. Lin ◽  
C. Cheng ◽  
K. Chen ◽  
C. Fu ◽  
T. Chang ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Single Crystal ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Reduction of Surface Residual Lithium Compounds for Single-Crystal LiNi0.6Mn0.2Co0.2O2 via Al2O3 Atomic Layer Deposition and Post-Annealing

Coatings ◽  
2022 ◽  
Vol 12 (1) ◽  
pp. 84
Author(s):  
Jiawei Li ◽  
Junren Xiang ◽  
Ge Yi ◽  
Yuanting Tang ◽  
Huachen Shao ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Single Crystal ◽  
Surface Composition ◽  
Annealing Treatment ◽  
Atomic Layer ◽  
Cycling Stability ◽  
Al2o3 Coating ◽  
Lithium Compounds ◽  
Post Annealing ◽  
Layer Deposition

Surface residual lithium compounds of Ni-rich cathodes are tremendous obstacles to electrochemical performance due to blocking ion/electron transfer and arousing surface instability. Herein, ultrathin and uniform Al2O3 coating via atomic layer deposition (ALD) coupled with the post-annealing process is reported to reduce residual lithium compounds on single-crystal LiNi0.6Mn0.2Co0.2O2 (NCM622). Surface composition characterizations indicate that LiOH is obviously reduced after Al2O3 growth on NCM622. Subsequent post-annealing treatment causes the consumption of Li2CO3 along with the diffusion of Al atoms into the surface layer of NCM622. The NCM622 modified by Al2O3 coating and post-annealing exhibits excellent cycling stability, the capacity retention of which reaches 92.2% after 300 cycles at 1 C, much higher than that of pristine NCM622 (34.8%). Reduced residual lithium compounds on NCM622 can greatly decrease the formation of LiF and the degree of Li+/Ni2+ cation mixing after discharge–charge cycling, which is the key to the improvement of cycling stability.

Atomic layer deposition of epitaxial CeO2 thin layers for faster surface hydrogen oxidation and faster bulk ceria reduction/reoxidation

2015 ◽  
Vol 3 (19) ◽  
pp. 10498-10503 ◽  
Author(s):  
Adrien Marizy ◽  
Pascal Roussel ◽  
Armelle Ringuedé ◽  
Michel Cassir
Keyword(s):  
Atomic Layer Deposition ◽  
Single Crystal ◽  
Hydrogen Oxidation ◽  
Atomic Layer ◽  
Thin Layers ◽  
Surface Hydrogen ◽  
Layer Deposition ◽  
Ceria Reduction

Thin ceria layers of 120 nm were processed by atomic layer deposition on both YSZ(100) single crystal substrates and polycrystalline YSZ ones.

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