Maskless and Resist-Free Rapid Prototyping of Three-Dimensional Structures Through Electron Beam Induced Deposition (EBID) of Carbon in Combination with Metal-Assisted Chemical Etching (MaCE) of Silicon

2010 ◽  
Vol 2 (4) ◽  
pp. 969-973 ◽  
Author(s):  
Konrad Rykaczewski ◽  
Owen J. Hildreth ◽  
Dhaval Kulkarni ◽  
Matthew R. Henry ◽  
Song-Kil Kim ◽  
...  
Keyword(s):  
Electron Beam ◽  
Rapid Prototyping ◽  
Chemical Etching ◽  
Three Dimensional ◽  
Metal Assisted Chemical Etching ◽  
Electron Beam Induced Deposition

Creation of Patterned Gold Nanostructures via Electron-Beam-Induced Deposition

2013 ◽  
Vol 1546 ◽  
Author(s):  
Anastasia V. Riazanova ◽  
Johannes J. L. Mulders ◽  
Lyubov M. Belova
Keyword(s):  
Electron Beam ◽  
Three Dimensional ◽  
Area Ratio ◽  
Ex Situ ◽  
Geometrical Shape ◽  
Local Electron ◽  
Post Annealing ◽  
Treatment Conditions ◽  
Heat Treated ◽  
Electron Beam Induced Deposition

ABSTRACTOne of the methods to grow nanoscale three-dimensional (3D) Au patterns is to perform local electron-beam-induced deposition (EBID) using the Me2Au(acac) precursor inside the chamber of a scanning electron microscope (SEM). However, due to the organometallic nature of the chemical, the concentration of the metallic constituent in the as-deposited structure is dramatically low, at around 10 at. % of Au. Ex-situ post-annealing of Me2Au(acac) EBIDs is a very promising purification approach, resulting in an Au content of > 92 at. % after annealing at 600 °C. However, in most of the cases it also distorts the geometrical shape of the heat-treated structure, preserving of which is essential for the application. In this paper we present a systematic study of the dependence between the annealing parameters and resulting purity in combination with the shape of the Au structure. Optimized heat treatment conditions for the creation of well-purified high aspect ratio Au pillar array are presented; and for planar continuous structures, the importance of the parameter height to area ratio is identified.

scholarly journals Pattern generation for direct-write three-dimensional nanoscale structures via focused electron beam induced deposition

2018 ◽  
Vol 9 ◽  
pp. 2581-2598 ◽  
Author(s):  
Lukas Keller ◽  
Michael Huth
Keyword(s):  
Electron Beam ◽  
3D Structure ◽  
Three Dimensional ◽  
Pattern Generation ◽  
Proximity Effects ◽  
Writing Strategies ◽  
Direct Write ◽  
Nanoscale Structures ◽  
Geometrical Description ◽  
Electron Beam Induced Deposition

Fabrication of three-dimensional (3D) nanoarchitectures by focused electron beam induced deposition (FEBID) has matured to a level that highly complex and functional deposits are becoming available for nanomagnetics and plasmonics. However, the generation of suitable pattern files that control the electron beam’s movement, and thereby reliably map the desired target 3D structure from a purely geometrical description to a shape-conforming 3D deposit, is nontrivial. To address this issue we developed several writing strategies and associated algorithms implemented in C++. Our pattern file generator handles different proximity effects and corrects for height-dependent precursor coverage. Several examples of successful 3D nanoarchitectures using different precursors are presented that validate the effectiveness of the implementation.

Focused-electron-beam-induced deposition of freestanding three-dimensional nanostructures of pure coalesced copper crystals

2002 ◽  
Vol 81 (17) ◽  
pp. 3245-3247 ◽  
Author(s):  
I. Utke ◽  
A. Luisier ◽  
P. Hoffmann ◽  
D. Laub ◽  
P. A. Buffat
Keyword(s):  
Electron Beam ◽  
Three Dimensional ◽  
Electron Beam Induced Deposition ◽  
Copper Crystals

Guided Three-Dimensional Catalyst Folding during Metal-Assisted Chemical Etching of Silicon

Nano Letters ◽  
2011 ◽  
Vol 11 (6) ◽  
pp. 2369-2374 ◽  
Author(s):  
Konrad Rykaczewski ◽  
Owen J. Hildreth ◽  
Ching P. Wong ◽  
Andrei G. Fedorov ◽  
John Henry J. Scott
Keyword(s):  
Chemical Etching ◽  
Three Dimensional ◽  
Metal Assisted Chemical Etching
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