Low-Voltage Control of (Co/Pt)x Perpendicular Magnetic Anisotropy Heterostructure for Flexible Spintronics

ACS Nano ◽  
2018 ◽  
Vol 12 (7) ◽  
pp. 7167-7173 ◽  
Author(s):  
Shishun Zhao ◽  
Ziyao Zhou ◽  
Chunlei Li ◽  
Bin Peng ◽  
Zhongqiang Hu ◽  
...  
2021 ◽  
Author(s):  
Tatsuya Yamamoto ◽  
Takayuki Nozaki ◽  
Kay Yakushiji ◽  
Shingo Tamaru ◽  
Hitoshi Kubota ◽  
...  

2017 ◽  
Vol 9 (12) ◽  
pp. e451-e451 ◽  
Author(s):  
Takayuki Nozaki ◽  
Anna Kozioł-Rachwał ◽  
Masahito Tsujikawa ◽  
Yoichi Shiota ◽  
Xiandong Xu ◽  
...  

2021 ◽  
pp. 117097
Author(s):  
Tatsuya Yamamoto ◽  
Takayuki Nozaki ◽  
Kay Yakushiji ◽  
Shingo Tamaru ◽  
Hitoshi Kubota ◽  
...  

Author(s):  
A.E.M. De Veirman ◽  
F.J.G. Hakkens ◽  
W.M.J. Coene ◽  
F.J.A. den Broeder

There is currently great interest in magnetic multilayer (ML) thin films (see e.g.), because they display some interesting magnetic properties. Co/Pd and Co/Au ML systems exhibit perpendicular magnetic anisotropy below certain Co layer thicknesses, which makes them candidates for applications in the field of magneto-optical recording. It has been found that the magnetic anisotropy of a particular system strongly depends on the preparation method (vapour deposition, sputtering, ion beam sputtering) as well as on the substrate, underlayer and deposition temperature. In order to get a better understanding of the correlation between microstructure and properties a thorough cross-sectional transmission electron microscopy (XTEM) study of vapour deposited Co/Pd and Co/Au (111) MLs was undertaken (for more detailed results see ref.).The Co/Pd films (with fixed Pd thickness of 2.2 nm) were deposited on mica substrates at substrate temperatures Ts of 20°C and 200°C, after prior deposition of a 100 nm Pd underlayer at 450°C.


2002 ◽  
Vol 81 (21) ◽  
pp. 4017-4019 ◽  
Author(s):  
T. G. Kim ◽  
Y. H. Shin ◽  
J. H. Song ◽  
M. C. Sung ◽  
I. S. Kim ◽  
...  

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