Thermal History-Dependent Current Relaxation in hBN/MoS2 van der Waals Dimers

ACS Nano ◽  
2020 ◽  
Vol 14 (5) ◽  
pp. 5909-5916 ◽  
Author(s):  
Tanweer Ahmed ◽  
Pavithra Bellare ◽  
Rahul Debnath ◽  
Ahin Roy ◽  
Narayanan Ravishankar ◽  
...  
Keyword(s):  
Thermal History ◽  
Van Der Waals ◽  
Current Relaxation

Analytical electron microscopy of grain boundaries in Al-Cu metallizations

1992 ◽  
Vol 50 (2) ◽  
pp. 1684-1685
Author(s):  
J. R. Michael ◽  
A. D. Romig ◽  
D. R. Frear
Keyword(s):  
Electron Microscopy ◽  
Integrated Circuits ◽  
Failure Mode ◽  
Current Density ◽  
Thermal History ◽  
Analytical Electron Microscopy ◽  
Cu Metallization ◽  
Analytical Electron ◽  
Interconnect Lines

Al with additions of Cu is commonly used as the conductor metallizations for integrated circuits, the Cu being added since it improves resistance to electromigration failure. As linewidths decrease to submicrometer dimensions, the current density carried by the interconnect increases dramatically and the probability of electromigration failure increases. To increase the robustness of the interconnect lines to this failure mode, an understanding of the mechanism by which Cu improves resistance to electromigration is needed. A number of theories have been proposed to account for role of Cu on electromigration behavior and many of the theories are dependent of the elemental Cu distribution in the interconnect line. However, there is an incomplete understanding of the distribution of Cu within the Al interconnect as a function of thermal history. In order to understand the role of Cu in reducing electromigration failures better, it is important to characterize the Cu distribution within the microstructure of the Al-Cu metallization.

Infrared diode laser jet spectroscopy of the van der Waals complex (N2O)2

1997 ◽  
Vol 91 (4) ◽  
pp. 689-696 ◽  
Author(s):  
HAI-BO QIAN ◽  
WOUTER HERREBOUT ◽  
BRIAN HOWARD
Keyword(s):  
Diode Laser ◽  
Van Der Waals ◽  
Van Der Waals Complex

Applications of the augmented van der waals theory of fluids

1978 ◽  
Vol 75 ◽  
pp. 347-352 ◽  
Author(s):  
Aleksander Kreglewski ◽  
Stephen S. Chen
Keyword(s):  
Van Der Waals ◽  
Van Der Waals Theory

Molecular motion in the van der Waals solid C6H6:C6F6

1992 ◽  
Vol 89 ◽  
pp. 1755-1766 ◽  
Author(s):  
JH Williams ◽  
RP White
Keyword(s):  
Molecular Motion ◽  
Van Der Waals

Une image électrique résonnante qui rend répulsive l'interaction van der Waals de surface

2000 ◽  
Vol 10 (PR8) ◽  
pp. Pr8-141
Author(s):  
H. Failache ◽  
S. Saltiel ◽  
M. Fichet ◽  
M.-P. Gorza ◽  
D. Bloch ◽  
...  
Keyword(s):  
Van Der Waals

STACKING FAULTS, TWINS, AND THE STRUCTURAL STABILITY OF VAN DER WAALS SOLIDS

1974 ◽  
Vol 35 (C7) ◽  
pp. C7-113-C7-119 ◽  
Author(s):  
J. A. VENABLES ◽  
C. A. ENGLISH ◽  
K. F. NIEBEL ◽  
G. J. TATLOCK
Keyword(s):  
Structural Stability ◽  
Van Der Waals ◽  
Stacking Faults
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