Phase Stability of Nanolaminated Epitaxial (Cr1–xFex)2AlC MAX Phase Thin Films on MgO(111) and Al2O3(0001) for Use as Conductive Coatings

2021 ◽  
Author(s):  
Hanna Pazniak ◽  
Marc Stevens ◽  
Martin Dahlqvist ◽  
Benjamin Zingsem ◽  
Lidia Kibkalo ◽  
...  
Keyword(s):  
Thin Films ◽  
Phase Stability ◽  
Max Phase ◽  
Conductive Coatings

scholarly journals Improving phase stability, hardness, and oxidation resistance of reactively magnetron sputtered (Al,Cr,Nb,ta,Ti)N thin films by Si-alloying

2021 ◽  
pp. 127162
Author(s):  
Andreas Kretschmer ◽  
Alexander Kirnbauer ◽  
Vincent Moraes ◽  
Daniel Primetzhofer ◽  
Kumar Yalamanchili ◽  
...  
Keyword(s):  
Thin Films ◽  
Oxidation Resistance ◽  
Phase Stability

CONDUCTIVE COPPER SULFIDE THIN FILMS ON POLYIMIDE FOILS FOR OPTICAL AND OPTOELECTRONIC APPLICATIONS

2001 ◽  
Vol 15 (17n19) ◽  
pp. 774-777 ◽  
Author(s):  
J. CARDOSO ◽  
O. GOMEZ-DAZA ◽  
L. IXTLILCO ◽  
M. T. S. NAIR ◽  
P. K. NAIR
Keyword(s):  
Thin Films ◽  
Sheet Resistance ◽  
Copper Sulfide ◽  
Optoelectronic Device ◽  
Infrared Reflectance ◽  
Thermally Stable ◽  
Conductive Coatings ◽  
Device Structures ◽  
Conductive Substrates ◽  
Optoelectronic Applications

Copper sulfide thin films of 75 nm and 100 nm thickness were coated on Kapton foils (PI) of 25 nm thickness by floating them on a chemical bath. The foils were annealed at 150°C-400°C in N 2 converting the coating from CuS to Cu 1.8 S . The sheet resistance of the annealed coatings (100 nm) is 10-50 ohms/square which is almost unaltered after immersion in dilute HCl for 30-120 min. The infrared reflectance predicted for the coatings is 67%-77% at a wavelength 2.5 μm, which is nearly what is experimentally observed. The coated PI has a transmittance (25-35%) peak located around 550-600 nm. These thermally stable conductive coatings on PI foils might be used as conductive substrates for optoelectronic device structures.

MAX-Phase Films Overcome Scaling Limitations to the Resistivity of Metal Thin Films

2021 ◽  
Author(s):  
Joung Eun Yoo ◽  
Ju Young Sung ◽  
Jin Ha Hwang ◽  
Inhee Maeng ◽  
Seung-Jae Oh ◽  
...  
Keyword(s):  
Thin Films ◽  
Max Phase ◽  
Metal Thin Films

Phase stability and decomposition products of Ti–Al–Ta–N thin films

2010 ◽  
Vol 97 (15) ◽  
pp. 151901 ◽  
Author(s):  
R. Rachbauer ◽  
D. Holec ◽  
P. H. Mayrhofer
Keyword(s):  
Thin Films ◽  
Phase Stability ◽  
Decomposition Products

scholarly journals Compositional dependence of epitaxial Tin+1SiCn MAX-phase thin films grown from a Ti3SiC2 compound target

2019 ◽  
Vol 37 (2) ◽  
pp. 021506 ◽  
Author(s):  
Martin Magnuson ◽  
Lina Tengdelius ◽  
Grzegorz Greczynski ◽  
Fredrik Eriksson ◽  
Jens Jensen ◽  
...  
Keyword(s):  
Thin Films ◽  
Max Phase ◽  
Compositional Dependence ◽  
Compound Target

scholarly journals Phase stability in Ag-Cu-In-Ga metal precursors for (Ag,Cu)(In,Ga)Se2 thin films

2017 ◽  
Vol 172 ◽  
pp. 347-352 ◽  
Author(s):  
Sina Soltanmohammad ◽  
Lei Chen ◽  
Brian E. McCandless ◽  
William N. Shafarman
Keyword(s):  
Thin Films ◽  
Phase Stability ◽  
Metal Precursors

scholarly journals Low-temperature growth of epitaxial Ti2AlC MAX phase thin films by low-rate layer-by-layer PVD

2019 ◽  
Vol 7 (6) ◽  
pp. 244-250 ◽  
Author(s):  
A. V. Pshyk ◽  
E. Coy ◽  
M. Kempiński ◽  
B. Scheibe ◽  
S. Jurga
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Max Phase ◽  
Layer By Layer ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Low Rate
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