Scalable High-Performance Ultraminiature Graphene Micro-Supercapacitors by a Hybrid Technique Combining Direct Writing and Controllable Microdroplet Transfer

2018 ◽  
Vol 10 (6) ◽  
pp. 5404-5412 ◽  
Author(s):  
Daozhi Shen ◽  
Guisheng Zou ◽  
Lei Liu ◽  
Wenzheng Zhao ◽  
Aiping Wu ◽  
...  
Keyword(s):  
High Performance ◽  
Hybrid Technique ◽  
Direct Writing

scholarly journals Reliable Fabrication of Graphene Nanostructure Based on e-Beam Irradiation of PMMA/Copper Composite Structure

Materials ◽  
2021 ◽  
Vol 14 (16) ◽  
pp. 4634
Author(s):  
Kaixi Bi ◽  
Jiliang Mu ◽  
Wenping Geng ◽  
Linyu Mei ◽  
Siyuan Zhou ◽  
...  
Keyword(s):  
High Performance ◽  
Local Heating ◽  
Copper Substrate ◽  
Direct Writing ◽  
Resonant Structures ◽  
In Situ Preparation ◽  
Copper Composite ◽  
Graphene Nanostructure ◽  
Graphene Nanostructures

Graphene nanostructures are widely perceived as a promising material for fundamental components; their high-performance electronic properties offer the potential for the construction of graphene nanoelectronics. Numerous researchers have paid attention to the fabrication of graphene nanostructures, based on both top-down and bottom-up approaches. However, there are still some unavoidable challenges, such as smooth edges, uniform films without folds, and accurate dimension and location control. In this work, a direct writing method was reported for the in-situ preparation of a high-resolution graphene nanostructure of controllable size (the minimum feature size is about 15 nm), which combines the advantages of e-beam lithography and copper-catalyzed growth. By using the Fourier infrared absorption test, we found that the hydrogen and oxygen elements were disappearing due to knock-on displacement and the radiolysis effect. The graphene crystal is also formed via diffusion and the local heating effect between the e-beam and copper substrate, based on the Raman spectra test. This simple process for the in-situ synthesis of graphene nanostructures has many promising potential applications, including offering a way to make nanoelectrodes, NEMS cantilever resonant structures, nanophotonic devices and so on.

scholarly journals High-performance all-solid-state flexible carbon/TiO2micro-supercapacitors with photo-rechargeable capability

RSC Advances ◽  
2017 ◽  
Vol 7 (1) ◽  
pp. 415-422 ◽  
Author(s):  
Jinguang Cai ◽  
Chao Lv ◽  
Akira Watanabe
Keyword(s):  
Solid State ◽  
Electrophoretic Deposition ◽  
High Performance ◽  
Direct Writing ◽  
Laser Direct Writing

A high-performance all-solid-state flexible carbon/TiO2micro-supercapacitor with photo-rechargeable capability was prepared by combining a laser direct writing technique with electrophoretic deposition.

scholarly journals Fluorescence enhanced lab-on-a-chip patterned using a hybrid technique of femtosecond laser direct writing and anodized aluminum oxide porous nanostructuring

2019 ◽  
Vol 1 (9) ◽  
pp. 3474-3484 ◽  
Author(s):  
Zhi Yu ◽  
Yuhao Lei ◽  
Weili Yu ◽  
Jinluo Cheng ◽  
Jun Xing ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Aluminum Oxide ◽  
Lab On A Chip ◽  
Hybrid Technique ◽  
Direct Writing ◽  
Laser Direct Writing ◽  
Anodized Aluminum ◽  
Anodized Aluminum Oxide ◽  
Structure Detection ◽  
Array Structure

A nanoporous array structure detection chip with strong spectral resolution, fabricated by femtosecond laser direct writing and anodized aluminum oxide.

Laser direct writing of heteroatom-doped porous carbon for high-performance micro-supercapacitors

2020 ◽  
Vol 25 ◽  
pp. 404-415 ◽  
Author(s):  
Jinguang Cai ◽  
Chao Lv ◽  
Cun Hu ◽  
Junhong Luo ◽  
Shuai Liu ◽  
...  
Keyword(s):  
Porous Carbon ◽  
High Performance ◽  
Direct Writing ◽  
Laser Direct Writing

A New High Performance CA Resist for E-beam Lithography

1999 ◽  
Vol 584 ◽  
Author(s):  
Ranee Kwong ◽  
Wu-Song Huang ◽  
Wayne Moreau ◽  
Robert Lang ◽  
Christopher Robinson ◽  
...  
Keyword(s):  
High Performance ◽  
Future Generation ◽  
Device Fabrication ◽  
High Dose ◽  
Direct Write ◽  
High Contrast ◽  
Direct Writing ◽  
Low Contrast ◽  
Mask Making ◽  
Airborne Contamination

AbstractThree major lithographic applications have emerged for electron beam exposure tools: optical mask fabrication, direct writing for device fabrication, and more recently projection e-beam printing. The traditional mask making process uses poly(butenesulfone) resist. A wet etch process was adopted to generate patterns on chrome. Recently, shrinking dimensions, optical proximity correction features, and the complexity of phase shift masks have forced the industry to a chrome dry etch process. ZEP, a poly(methyl α-chloroacrylate-co-α-methylstyrene) based resist, has been well accepted for most of the >180 nm device mask making. The acceptance of ZEP comes in spite of its low contrast, marginal etch resistance, organic solvent development, and concerns of resist heating associated with its high dose requirements. These issues have spawned interest in using chemically amplified resist (CAR) systems for direct write and mask making applications. We have developed a high contrast resist based on ketal protecting groups, KRS-XE, which is robust against airborne contamination and can be used for all forms of e-beam exposure in both chrome mask and silicon processing. This high contrast resist is processed with aqueous base developer and has a wide bake latitude. The development of KRS-XE has provided the capability of fabricating chrome masks for future generation (< 180 nm) devices and has potential for use with projection beam exposure systems.

scholarly journals Photonic skins based on flexible organic microlaser arrays

2021 ◽  
Vol 7 (31) ◽  
pp. eabh3530
Author(s):  
Chunhuan Zhang ◽  
Haiyun Dong ◽  
Chuang Zhang ◽  
Yuqing Fan ◽  
Jiannian Yao ◽  
...  
Keyword(s):  
High Performance ◽  
Large Scale ◽  
Low Cost ◽  
Single Mode ◽  
Direct Writing ◽  
Practical Applications ◽  
Single Mode Laser ◽  
Integrated Devices ◽  
Laser Sources ◽  
Mechanical Sensor

Flexible photonics is rapidly emerging as a promising platform for artificial smart skins to imitate or extend the capabilities of human skins. Organic material systems provide a promising avenue to directly fabricate large-scale flexible device units; however, the versatile fabrication of all-organic integrated devices with desired photonic functionalities remains a great challenge. Here, we develop an effective technique for the mass processing of organic microlaser arrays, which act as sensing units, on the chip of photonic skins. With a bilayer electron-beam direct writing method, we fabricated flexible mechanical sensor networks composed of coupled-cavity single-mode laser sources on pliable polymer substrates. These microlaser-based mechanical sensor chips were subsequently used to recognize hand gestures, showing great potential for artificial skin applications. This work represents a substantial advance toward scalable construction of high-performance and low-cost flexible photonic chips, thus paving the way for the implementation of smart photonic skins into practical applications.

Room-temperature fabrication of SiC microwire photodetectors on rigid and flexible substrates via femtosecond laser direct writing

Nanoscale ◽  
2020 ◽  
Vol 12 (45) ◽  
pp. 23200-23205
Author(s):  
Shuyu Liang ◽  
Yunzhi Dai ◽  
Gong Wang ◽  
Hong Xia ◽  
Jihong Zhao
Keyword(s):  
Femtosecond Laser ◽  
High Performance ◽  
Room Temperature ◽  
Flexible Substrates ◽  
Direct Writing ◽  
Laser Direct Writing ◽  
Liquid Environment ◽  
Sic Nanoparticles

Herein, a rapid and eco-friendly method for the fabrication of SiC microwires on rigid or flexible substrates is reported. Via the use of FsLDW, SiC nanoparticles dispersed in a liquid environment are assembled into a single microwire to prepare a high-performance PD.

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