Atomic Layer Deposition of Nickel on ZnO Nanowire Arrays for High-Performance Supercapacitors

2017 ◽  
Vol 10 (1) ◽  
pp. 468-476 ◽  
Author(s):  
Qing-Hua Ren ◽  
Yan Zhang ◽  
Hong-Liang Lu ◽  
Yong-Ping Wang ◽  
Wen-Jun Liu ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
High Performance ◽  
Atomic Layer ◽  
Nanowire Arrays ◽  
Zno Nanowire ◽  
Zno Nanowire Arrays ◽  
Layer Deposition

Photoluminescence enhancement of ZnO nanowire arrays by atomic layer deposition of ZrO2 layers and thermal annealing

2016 ◽  
Vol 18 (24) ◽  
pp. 16377-16385 ◽  
Author(s):  
Yuan Zhang ◽  
Hong-Liang Lu ◽  
Tao Wang ◽  
Qing-Hua Ren ◽  
Hong-Yan Chen ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Thermal Annealing ◽  
Atomic Layer ◽  
Zno Nanowires ◽  
Nanowire Arrays ◽  
Zno Nanowire ◽  
Ultraviolet Emission ◽  
Zno Nanowire Arrays ◽  
Layer Deposition ◽  
Photoluminescence Enhancement

The ultraviolet emission of ZnO nanowires was enhanced significantly after coating with thin ZrO2 layers and thermal annealing.

An advanced fabrication method of highly ordered ZnO nanowire arrays on silicon substrates by atomic layer deposition

2012 ◽  
Vol 23 (23) ◽  
pp. 235607 ◽  
Author(s):  
Kittitat Subannajui ◽  
Firat Güder ◽  
Julia Danhof ◽  
Andreas Menzel ◽  
Yang Yang ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Nanowire Arrays ◽  
Silicon Substrates ◽  
Fabrication Method ◽  
Zno Nanowire ◽  
Zno Nanowire Arrays ◽  
Layer Deposition

Depositing High-Performance Conductive Thin Films by Using Atomic Layer Deposition

2015 ◽  
Vol 764-765 ◽  
pp. 138-142 ◽  
Author(s):  
Fa Ta Tsai ◽  
Hsi Ting Hou ◽  
Ching Kong Chao ◽  
Rwei Ching Chang
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
High Performance ◽  
Atomic Layer ◽  
Electric Properties ◽  
X Ray Diffraction ◽  
Layer Deposition ◽  
Azo Thin Film ◽  
Aluminum Doped Zinc Oxide ◽  
Conductive Thin Films

This work characterizes the mechanical and opto-electric properties of Aluminum-doped zinc oxide (AZO) thin films deposited by atomic layer deposition (ALD), where various depositing temperature, 100, 125, 150, 175, and 200 °C are considered. The transmittance, microstructure, electric resistivity, adhesion, hardness, and Young’s modulus of the deposited thin films are tested by using spectrophotometer, X-ray diffraction, Hall effect analyzer, micro scratch, and nanoindentation, respectively. The results show that the AZO thin film deposited at 200 °C behaves the best electric properties, where its resistance, Carrier Concentration and mobility reach 4.3×10-4 Ωcm, 2.4×1020 cm-3, and 60.4 cm2V-1s-1, respectively. Furthermore, microstructure of the AZO films deposited by ALD is much better than those deposited by sputtering.

Ozone-Based Atomic Layer Deposition of Crystalline V2O5 Films for High Performance Electrochemical Energy Storage

2012 ◽  
Vol 24 (7) ◽  
pp. 1255-1261 ◽  
Author(s):  
Xinyi Chen ◽  
Ekaterina Pomerantseva ◽  
Parag Banerjee ◽  
Keith Gregorczyk ◽  
Reza Ghodssi ◽  
...  
Keyword(s):  
Energy Storage ◽  
Atomic Layer Deposition ◽  
High Performance ◽  
Atomic Layer ◽  
Electrochemical Energy Storage ◽  
Layer Deposition ◽  
Electrochemical Energy
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