scholarly journals Boron Nitride Nanoporous Membranes with High Surface Charge by Atomic Layer Deposition

2017 ◽  
Vol 9 (19) ◽  
pp. 16669-16678 ◽  
Author(s):  
Matthieu Weber ◽  
Boonprakrong Koonkaew ◽  
Sebastien Balme ◽  
Ivo Utke ◽  
Fabien Picaud ◽  
...  
Keyword(s):  
Boron Nitride ◽  
Atomic Layer Deposition ◽  
Surface Charge ◽  
High Surface ◽  
Atomic Layer ◽  
Nanoporous Membranes ◽  
Layer Deposition

scholarly journals Boron Nitride as a Novel Support for Highly Stable Palladium Nanocatalysts by Atomic Layer Deposition

Nanomaterials ◽  
2018 ◽  
Vol 8 (10) ◽  
pp. 849 ◽  
Author(s):  
Matthieu Weber ◽  
Cassandre Lamboux ◽  
Bruno Navarra ◽  
Philippe Miele ◽  
Sandrine Zanna ◽  
...  
Keyword(s):  
Boron Nitride ◽  
Atomic Layer Deposition ◽  
Photoelectron Spectroscopy ◽  
High Surface ◽  
High Surface Area ◽  
Atomic Layer ◽  
Average Diameter ◽  
Transmission Electron Microscopy Analysis ◽  
Layer Deposition ◽  
Palladium Nanocatalysts

The ability to prepare controllable nanocatalysts is of great interest for many chemical industries. Atomic layer deposition (ALD) is a vapor phase technique enabling the synthesis of conformal thin films and nanoparticles (NPs) on high surface area supports and has become an attractive new route to tailor supported metallic NPs. Virtually all the studies reported, focused on Pd NPs deposited on carbon and oxide surfaces. It is, however, important to focus on emerging catalyst supports such as boron nitride materials, which apart from possessing high thermal and chemical stability, also hold great promises for nanocatalysis applications. Herein, the synthesis of Pd NPs on boron nitride (BN) film substrates is demonstrated entirely by ALD for the first time. X-ray photoelectron spectroscopy indicated that stoichiometric BN formed as the main phase, with a small amount of BNxOy, and that the Pd particles synthesized were metallic. Using extensive transmission electron microscopy analysis, we study the evolution of the highly dispersed NPs as a function of the number of ALD cycles, and the thermal stability of the ALD-prepared Pd/BN catalysts up to 750 °C. The growth and coalescence mechanisms observed are discussed and compared with Pd NPs grown on other surfaces. The results show that the nanostructures of the BN/Pd NPs were relatively stable up to 500 °C. Consequent merging has been observed when annealing the samples at 750 °C, as the NPs’ average diameter increased from 8.3 ± 1.2 nm to 31 ± 4 nm. The results presented open up exciting new opportunities in the field of catalysis.

High-Surface Area Ceria-Zirconia Films Prepared by Atomic Layer Deposition

2017 ◽  
Vol 147 (6) ◽  
pp. 1464-1470 ◽  
Author(s):  
Tzia Ming Onn ◽  
Sheng Dai ◽  
Jiayao Chen ◽  
Xiaoqing Pan ◽  
George W. Graham ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Surface Area ◽  
High Surface ◽  
High Surface Area ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Zirconia Films

scholarly journals Atomic Layer Deposition of GdCoO3 and Gd0.9Ca0.1CoO3

Materials ◽  
2019 ◽  
Vol 13 (1) ◽  
pp. 24
Author(s):  
Marion Duparc ◽  
Henrik Hovde Sønsteby ◽  
Ola Nilsen ◽  
Anja Olafsen Sjåstad ◽  
Helmer Fjellvåg
Keyword(s):  
Thin Films ◽  
Aspect Ratio ◽  
Atomic Layer Deposition ◽  
High Aspect Ratio ◽  
High Surface ◽  
High Surface Area ◽  
Atomic Layer ◽  
Oxidation Catalysis ◽  
Post Annealing ◽  
Layer Deposition

Thin films of the catalytically interesting ternary and quaternary perovskites GdCoO3 and Gd0.9Ca0.1CoO3 are fabricated by atomic layer deposition using metal β-diketonates and ozone as precursors. The resulting thin films are amorphous as deposited and become single-oriented crystalline on LaAlO3(100) and YAlO3(100/010) after post-annealing at 650 °C in air. The crystal orientations of the films are tunable by choice and the orientation of the substrate, mitigated through the interface via solid face epitaxy upon annealing. The films exhibit no sign of Co2+. Additionally, high-aspect-ratio Si(100) substrates were used to document the suitability of the developed process for the preparation of coatings on more complex, high-surface-area structures. We believe that coatings of GdCoO3 and Gd1−xCaxCoO3 may find applications within oxidation catalysis.

Laser-Assisted Atomic Layer Deposition of Boron Nitride Thin Films

2005 ◽  
Vol 11 (6-7) ◽  
pp. 330-337 ◽  
Author(s):  
J. Olander ◽  
L. M. Ottosson ◽  
P. Heszler ◽  
J.-O. Carlsson ◽  
K. M. E. Larsson
Keyword(s):  
Thin Films ◽  
Boron Nitride ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition

Smart Pd Catalyst with Improved Thermal Stability Supported on High-Surface-Area LaFeO3Prepared by Atomic Layer Deposition

2018 ◽  
Vol 140 (14) ◽  
pp. 4841-4848 ◽  
Author(s):  
Tzia Ming Onn ◽  
Matteo Monai ◽  
Sheng Dai ◽  
Emiliano Fonda ◽  
Tiziano Montini ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Atomic Layer Deposition ◽  
Surface Area ◽  
High Surface ◽  
High Surface Area ◽  
Atomic Layer ◽  
Pd Catalyst ◽  
Layer Deposition

scholarly journals High Surface Area VOx/TiO2/SBA-15 Model Catalysts for Ammonia SCR Prepared by Atomic Layer Deposition

Catalysts ◽  
2020 ◽  
Vol 10 (12) ◽  
pp. 1386
Author(s):  
Jun Shen ◽  
Christian Hess
Keyword(s):  
Atomic Layer Deposition ◽  
Lewis Acid ◽  
High Surface ◽  
High Surface Area ◽  
Atomic Layer ◽  
Acid Sites ◽  
Lewis Acid Sites ◽  
X Ray ◽  
Nox Conversion ◽  
Layer Deposition

The mode of operation of titania-supported vanadia (VOx) catalysts for NOx abatement using ammonia selective catalytic reduction (NH3-SCR) is still vigorously debated. We introduce a new high surface area VOx/TiO2/SBA-15 model catalyst system based on mesoporous silica SBA-15 making use of atomic layer deposition (ALD) for controlled synthesis of titania and vanadia multilayers. The bulk and surface structure is characterized by X-ray diffraction (XRD), UV-vis and Raman spectroscopy, as well as X-ray photoelectron spectroscopy (XPS), revealing the presence of dispersed surface VOx species on amorphous TiO2 domains on SBA-15, forming hybrid Si–O–V and Ti–O–V linkages. Temperature-dependent analysis of the ammonia SCR catalytic activity reveals NOx conversion levels of up to ~60%. In situ and operando diffuse reflection IR Fourier transform (DRIFT) spectroscopy shows N–Hstretching modes, representing adsorbed ammonia and -NH2 and -NH intermediate structures on Bronsted and Lewis acid sites. Partial Lewis acid sites with adjacent redox sites are proposed as the active sites and desorption of product molecules as the rate-determining step at low temperature. The high NOx conversion is attributed to the presence of highly dispersed VOx species and the moderate acidity of VOx supported on TiO2/SBA-15.

Atomic Layer Deposition of Layered Boron Nitride for Large-Area 2D Electronics

2020 ◽  
Vol 12 (32) ◽  
pp. 36688-36694
Author(s):  
Jaebeom Lee ◽  
Arul V. Ravichandran ◽  
Jaidah Mohan ◽  
Lanxia Cheng ◽  
Antonio T. Lucero ◽  
...  
Keyword(s):  
Boron Nitride ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Large Area ◽  
Layer Deposition
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