scholarly journals Adjusting Interfacial Chemistry and Electronic Properties of Photovoltaics Based on a Highly Pure Sb2S3 Absorber by Atomic Layer Deposition

2019 ◽  
Vol 2 (12) ◽  
pp. 8747-8756 ◽  
Author(s):  
Pascal Büttner ◽  
Florian Scheler ◽  
Craig Pointer ◽  
Dirk Döhler ◽  
Maïssa K. S. Barr ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Electronic Properties ◽  
Atomic Layer ◽  
Interfacial Chemistry ◽  
Layer Deposition

scholarly journals Tuning electronic properties in LaNiO3 thin films by B-site Cu-substitution

2020 ◽  
Vol 8 (36) ◽  
pp. 12662-12668
Author(s):  
Henrik H. Sønsteby ◽  
Erik Skaar ◽  
Jon E. Bratvold ◽  
John W. Freeland ◽  
Angel Yanguas-Gil ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Electronic Properties ◽  
Room Temperature ◽  
Atomic Layer ◽  
Transition Temperatures ◽  
Metal Insulator Transition ◽  
Metal Insulator ◽  
Cu Substitution ◽  
Layer Deposition

Cu-Substitution in LaNiO3 by atomic layer deposition provides films spanning six orders of magnitude in resistivity, with metal insulator transition temperatures from 0 K to room temperature.

Controlling the electronic properties of SWCNT FETs via modification of the substrate surface prior to atomic layer deposition of 10 nm thick Al2O3film

2013 ◽  
Vol 24 (45) ◽  
pp. 455701
Author(s):  
Joonsung Kim ◽  
Jangyeol Yoon ◽  
Junhong Na ◽  
Seongmin Yee ◽  
Gyu Tae Kim ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Electronic Properties ◽  
Substrate Surface ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Electronic Properties of Thin HfO2Films Fabricated by Atomic Layer Deposition on 4H-SiC

2011 ◽  
Vol 119 (5) ◽  
pp. 696-698 ◽  
Author(s):  
A. Taube ◽  
S. Gierałtowska ◽  
T. Gutt ◽  
T. Małachowski ◽  
I. Pasternak ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Electronic Properties ◽  
Atomic Layer ◽  
Layer Deposition

A non-destructive n-doping method for graphene with precise control of electronic properties via atomic layer deposition

Nanoscale ◽  
2016 ◽  
Vol 8 (9) ◽  
pp. 5000-5005 ◽  
Author(s):  
Kyu Seok Han ◽  
Pranav Y. Kalode ◽  
Yong-Eun Koo Lee ◽  
Hongbum Kim ◽  
Lynn Lee ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Electronic Properties ◽  
Atomic Layer ◽  
Precise Control ◽  
Layer Deposition ◽  
N Doping ◽  
Non Destructive

scholarly journals Electronic Properties of Stacked ZrO2 Films Fabricated by Atomic Layer Deposition on 4H-SiC

2017 ◽  
Vol 132 (2) ◽  
pp. 329-331
Author(s):  
K. Król ◽  
N. Kwietniewski ◽  
S. Gierałtowska ◽  
Ł. Wachnicki ◽  
M. Sochacki
Keyword(s):  
Atomic Layer Deposition ◽  
Electronic Properties ◽  
Atomic Layer ◽  
Layer Deposition

Energy Levels, Electronic Properties, and Rectification in Ultrathin p-NiO Films Synthesized by Atomic Layer Deposition

2012 ◽  
Vol 116 (32) ◽  
pp. 16830-16840 ◽  
Author(s):  
Elijah Thimsen ◽  
Alex B. F. Martinson ◽  
Jeffrey W. Elam ◽  
Michael J. Pellin
Keyword(s):  
Atomic Layer Deposition ◽  
Electronic Properties ◽  
Energy Levels ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Nio Films

Structural and Electronic Properties of the 6H-SiC(0001)/Al2O3 Interface Prepared by Atomic Layer Deposition

2004 ◽  
Vol 457-460 ◽  
pp. 1369-1372 ◽  
Author(s):  
Thomas Seyller ◽  
Kun Yuan Gao ◽  
Lothar Ley ◽  
Gerhard Pensl ◽  
Florin Ciobanu ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Electronic Properties ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Structural And Electronic Properties

Use of Mixed CH3–/HC(O)CH2CH2–Si(111) Functionality to Control Interfacial Chemical and Electronic Properties During the Atomic-Layer Deposition of Ultrathin Oxides on Si(111)

2015 ◽  
Vol 6 (4) ◽  
pp. 722-726 ◽  
Author(s):  
Leslie E. O’Leary ◽  
Nicholas C. Strandwitz ◽  
Christopher W. Roske ◽  
Suyeon Pyo ◽  
Bruce S. Brunschwig ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Electronic Properties ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Ultrathin Oxides
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