Amine-Containing Block Copolymers for the Bottom-Up Preparation of Functional Porous Membranes

2019 ◽  
Vol 52 (7) ◽  
pp. 2631-2641 ◽  
Author(s):  
Sebastian Schöttner ◽  
Martin Brodrecht ◽  
Erik Uhlein ◽  
Christian Dietz ◽  
Hergen Breitzke ◽  
...  
Keyword(s):  
Block Copolymers ◽  
Porous Membranes ◽  
Bottom Up

Square patterns formed from the directed self-assembly of block copolymers

2021 ◽  
Author(s):  
Weihua Li ◽  
Xueying Gu
Keyword(s):  
Block Copolymers ◽  
Self Assembly ◽  
Bottom Up ◽  
Tremendous Progress

Since tremendous progress has been made, directed self-assembly (DSA) of block copolymers has been regarded as one of the most promising bottom-up lithography techniques. In particular, DSA has been successfully...

Nano-structured magneto-responsive membranes from block copolymers and iron oxide nanoparticles

2017 ◽  
Vol 8 (3) ◽  
pp. 605-614 ◽  
Author(s):  
Lakshmeesha Upadhyaya ◽  
Mona Semsarilar ◽  
Rodrigo Fernández-Pacheco ◽  
Gema Martinez ◽  
Reyes Mallada ◽  
...  
Keyword(s):  
Iron Oxide ◽  
Block Copolymers ◽  
Magnetic Fields ◽  
Iron Oxide Nanoparticles ◽  
Porous Membranes ◽  
Oxide Nanoparticles ◽  
Magnetic Iron Oxide Nanoparticles ◽  
Magnetic Iron Oxide ◽  
Responsive Membranes

Preparation of porous membranes from PMAA-b-PMMA copolymers and magnetic iron oxide nanoparticles and their performance under magnetic fields.

scholarly journals Top-down Meets Bottom up: Block Copolymers with Photoreactive Segments

2012 ◽  
Vol 25 (1) ◽  
pp. 17-20 ◽  
Author(s):  
Rina Maeda ◽  
Michelle Chavis ◽  
Nam-Ho You ◽  
Christopher K. Ober
Keyword(s):  
Block Copolymers ◽  
Top Down ◽  
Bottom Up

scholarly journals Supramolecular block copolymers incorporating chiral and achiral chromophores for the bottom-up assembly of nanomaterials

2021 ◽  
pp. 901-914
Author(s):  
Marta Riba-Moliner ◽  
Cristina Oliveras-González ◽  
David B. Amabilino ◽  
Arántzazu González-Campo
Keyword(s):  
Block Copolymers ◽  
Bottom Up

Polystyrene-Polymethylmethacrylate Block Copolymers for Lithographically Assisted Bottom-Up Assembly of Nanostructures

2007 ◽  
Vol 555 ◽  
pp. 29-34 ◽  
Author(s):  
F. Borsetto ◽  
B. Kosmala ◽  
T.G. Fitzgerald ◽  
Matthew T. Shaw ◽  
J. Patterson ◽  
...  
Keyword(s):  
Block Copolymers ◽  
Periodic Structures ◽  
Microphase Separation ◽  
Polymer System ◽  
Silicon Substrates ◽  
Bottom Up ◽  
Island Formation ◽  
Regular Structures ◽  
Rectangular Channels ◽  
Side Walls

Polystyrene-polymethylmethacrylate (PS-PMMA) block copolymers are well known to exhibit microphase separation to form a series of regular structures with local periodic arrangements of the blocks. By developing films of PS-PMMA within topographically patterned silicon (100) substrates (with photolithographically defined rectangular channels of depth 60 nm and widths 166 – 433 nm) these irregular arrangements form highly periodic structures where the features are parallel to the side walls of the channels. However, the use of silicon substrates leads to problems in processing of these films. PS-PMMA does not wet the surface, and this results in island formation on flat substrates. On channel etched substrates this phenomena ensures that the thickness of the films is irregular and poorly defined alignment is seen. Detailed considerations of this polymer system suggest that feature sizes below 25 nm are not realisable. The results suggest other copolymer systems should be studied.

Dual Mode Patterning of Fluorine-Containing Block Copolymers through Combined Top-down and Bottom-up Lithography

2012 ◽  
Vol 24 (8) ◽  
pp. 1454-1461 ◽  
Author(s):  
Rina Maeda ◽  
Teruaki Hayakawa ◽  
Christopher K. Ober
Keyword(s):  
Block Copolymers ◽  
Top Down ◽  
Dual Mode ◽  
Bottom Up
Sign in / Sign up

Export Citation Format

Share Document