Kinetics of Block Copolymer Phase Segregation during Sub-millisecond Transient Thermal Annealing

2016 ◽  
Vol 49 (17) ◽  
pp. 6462-6470 ◽  
Author(s):  
Alan G. Jacobs ◽  
Clemens Liedel ◽  
Hui Peng ◽  
Linxi Wang ◽  
Detlef-M. Smilgies ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Thermal Annealing ◽  
Phase Segregation ◽  
Transient Thermal ◽  
Kinetics Of

Chain Exchange Kinetics of Bottlebrush Block Copolymer Micelles

2021 ◽  
Author(s):  
Seyoung Kim ◽  
Sangho Lee ◽  
Soo-Hyung Choi ◽  
Kookheon Char
Keyword(s):  
Block Copolymer ◽  
Block Copolymer Micelles ◽  
Exchange Kinetics ◽  
Copolymer Micelles ◽  
Kinetics Of

Topologically Distinct Lamellar Block Copolymer Morphologies Formed by Solvent and Thermal Annealing

2013 ◽  
Vol 2 (10) ◽  
pp. 918-923 ◽  
Author(s):  
Ian P. Campbell ◽  
Chunlin He ◽  
Mark P. Stoykovich
Keyword(s):  
Block Copolymer ◽  
Thermal Annealing

omparisons of Silicide Formation by Rapid Thermal Annealing and Conventional Furnace Annealing

1987 ◽  
Vol 92 ◽  
Author(s):  
E. Ma ◽  
M. Natan ◽  
B.S. Lim ◽  
M-A. Nicolet
Keyword(s):  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Silicide Formation ◽  
X Ray Diffraction ◽  
Furnace Annealing ◽  
Cross Sectional ◽  
Conventional Furnace ◽  
Diffusion Controlled ◽  
Conventional Furnace Annealing ◽  
Kinetics Of

ABSTRACTSilicide formation induced by rapid thermal annealing (RTA) and conventional furnace annealing (CFA) in bilayers of sequentially deposited films of amorphous silicon and polycrystalline Co or Ni is studied with RBS, X-ray diffraction and TEM. Particular attention is paid to the reliability of the RTA temperature measurements in the study of the growth kinetics of the first interfacial compound, Co2Si and Ni2Si, for both RTA and CFA. It is found that the same diffusion-controlled kinetics applies for the silicide formation by RTA in argon and CFA in vacuum with a common activation energy of 2.1+0.2eV for Co2Si and 1.3+0.2eV for Ni Si. Co and Ni atoms are the dominant diffusing species; during silicide formation by both RTA and CFA. The microstructures of the Ni-silicide formed by the two annealing techniques, however, differs considerably from each other, as revealed by cross-sectional TEM studies.

Coarse-grained molecular dynamics modeling of the kinetics of lamellar block copolymer defect annealing

2016 ◽  
Vol 15 (1) ◽  
pp. 013508 ◽  
Author(s):  
Andrew J. Peters ◽  
Richard A. Lawson ◽  
Benjamin D. Nation ◽  
Peter J. Ludovice ◽  
Clifford L. Henderson
Keyword(s):  
Molecular Dynamics ◽  
Block Copolymer ◽  
Coarse Grained ◽  
Dynamics Modeling ◽  
Defect Annealing ◽  
Molecular Dynamics Modeling ◽  
Kinetics Of ◽  
Coarse Grained Molecular Dynamics

scholarly journals Temperature-Controlled Solvent Vapor Annealing of Thin Block Copolymer Films

Polymers ◽  
2019 ◽  
Vol 11 (8) ◽  
pp. 1312 ◽  
Author(s):  
Xiao Cheng ◽  
Alexander Böker ◽  
Larisa Tsarkova
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Thermal Annealing ◽  
Saturated Vapor ◽  
Polymer Chains ◽  
Special Focus ◽  
Solvent Vapor ◽  
Copolymer Films ◽  
Vapor Annealing ◽  
Solvent Vapor Annealing

Solvent vapor annealing is as an effective and versatile alternative to thermal annealing to equilibrate and control the assembly of polymer chains in thin films. Here, we present scientific and practical aspects of the solvent vapor annealing method, including the discussion of such factors as non-equilibrium conformational states and chain dynamics in thin films in the presence of solvent. Homopolymer and block copolymer films have been used in model studies to evaluate the robustness and the reproducibility of the solvent vapor processing, as well as to assess polymer-solvent interactions under confinement. Advantages of utilizing a well-controlled solvent vapor environment, including practically interesting regimes of weakly saturated vapor leading to poorly swollen states, are discussed. Special focus is given to dual temperature control over the set-up instrumentation and to the potential of solvo-thermal annealing. The evaluated insights into annealing dynamics derived from the studies on block copolymer films can be applied to improve the processing of thin films of crystalline and conjugated polymers as well as polymer composite in confined geometries.

Study of block copolymer micelles. 6. Exit and reentry kinetics of bromoacetonaphthone in aqueous polystyrene-poly(ethylene oxide) block copolymer micelles

1993 ◽  
Vol 26 (8) ◽  
pp. 1825-1828 ◽  
Author(s):  
Zdenek Hruska ◽  
Mark Piton ◽  
Ahmad Yekta ◽  
Jean Duhamel ◽  
Mitchell A. Winnik ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Ethylene Oxide ◽  
Poly Ethylene Oxide ◽  
Block Copolymer Micelles ◽  
Copolymer Micelles ◽  
Poly Ethylene ◽  
Kinetics Of
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