scholarly journals Deposition Kinetics and Compositional Control of Vacuum-Processed CH3NH3PbI3 Perovskite

2020 ◽  
Vol 11 (16) ◽  
pp. 6852-6859 ◽  
Author(s):  
Beom-Soo Kim ◽  
Lidón Gil-Escrig ◽  
Michele Sessolo ◽  
Henk J. Bolink
2018 ◽  
Vol 102 (7) ◽  
pp. 4314-4324 ◽  
Author(s):  
Mingyang Zhao ◽  
Yun Xu ◽  
Lindsay Shuller‐Nickles ◽  
Jake Amoroso ◽  
Anatoly I. Frenkel ◽  
...  

Processes ◽  
2021 ◽  
Vol 9 (1) ◽  
pp. 82
Author(s):  
Helmut Thissen ◽  
Richard A. Evans ◽  
Vincent Ball

In recent years major advances in surface chemistry and surface functionalization have been performed through the development, most often inspired by living organisms, of versatile methodologies. Among those, the contact of substrates with aminomalononitrile (AMN) containing solutions at pH = 8.5 allows a conformal coating to be deposited on the surface of all known classes of material. Since AMN is a molecule probably formed in the early atmosphere of our planet and since HCN-based compounds have been detected on many comets and Titan (Saturn’s largest moon) it is likely that such molecules will open a large avenue in surface functionalization mostly for bio-applications. This mini review describes the state of the art of AMN-based coatings from their deposition kinetics, composition, chemical reactivity, hypothetical structure to their first applications as biomaterials. Finally, the AMN-based versatile coatings are compared to other kinds of versatile coating based on catecholamines and polyphenols.


2015 ◽  
Vol 107 (8) ◽  
pp. 081606 ◽  
Author(s):  
Matthew J. Highland ◽  
Dillon D. Fong ◽  
Guangxu Ju ◽  
Carol Thompson ◽  
Peter M. Baldo ◽  
...  

2007 ◽  
Vol 992 ◽  
Author(s):  
Christos F. Karanikas ◽  
James J. Watkins

AbstractThe kinetics of the deposition of ruthenium thin films from the hydrogen assisted reduction of bis(2,2,6,6-tetramethyl-3,5-heptanedionato)(1,5-cyclooctadiene)ruthenium(II), [Ru(tmhd)2cod], in supercritical carbon dioxide was studied in order to develop a rate expression for the growth rate as well as to determine a mechanism for the process. The deposition temperature was varied from 240°C to 280°C and the apparent activation energy was 45.3 kJ/mol. Deposition rates up to 30 nm/min were attained. The deposition rate dependence on precursor concentrations between 0 and 0.2 wt. % was studied at 260°C with excess hydrogen and revealed first order deposition kinetics with respect to precursor at concentrations lower then 0.06 wt. % and zero order dependence at concentrations above 0.06 wt. %. The effect of reaction pressure on the growth rate was studied at a constant reaction temperature of 260°C and pressures between 159 bar to 200 bar and found to have no measurable effect on the growth rate.


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