Atomic Layer Deposition of Titania in Ordered Mesoporous Cerium Zirconium Oxide Thin Films: A Case Study

2019 ◽  
Author(s):  
P. Cop ◽  
M. Göttlicher ◽  
J. Schörmann ◽  
C. Boissiere ◽  
A. Beyer ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Zirconium Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Layer Deposition ◽  
Ordered Mesoporous

Atomic Layer Deposition and Characterization of Erbium Oxide-Doped Zirconium Oxide Thin Films

2010 ◽  
Vol 157 (10) ◽  
pp. G193 ◽  
Author(s):  
Aile Tamm ◽  
Marianna Kemell ◽  
Jekaterina Kozlova ◽  
Timo Sajavaara ◽  
Massimo Tallarida ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Zirconium Oxide ◽  
Atomic Layer ◽  
Erbium Oxide ◽  
Oxide Thin Films ◽  
Layer Deposition

scholarly journals Atomic layer deposition of zirconium oxide thin films

2019 ◽  
Vol 35 (7) ◽  
pp. 804-812
Author(s):  
Xin Wang ◽  
Sujan Kumar Ghosh ◽  
Mahyar Afshar-Mohajer ◽  
Hua Zhou ◽  
Yongqiang Liu ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Zirconium Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Layer Deposition ◽  
Image Position

Abstract

Atomic Layer Deposition and Characterization of Dysprosium-Doped Zirconium Oxide Thin Films

2015 ◽  
Vol 21 (7-8-9) ◽  
pp. 181-187 ◽  
Author(s):  
Aile Tamm ◽  
Jekaterina Kozlova ◽  
Tõnis Arroval ◽  
Lauri Aarik ◽  
Peeter Ritslaid ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Zirconium Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Layer Deposition

Superior and Stable Ferroelectric Properties of Hafnium-Zirconium-Oxide Thin Films Deposited via Atomic Layer Deposition using Cyclopentadienyl-Based Precursors without Annealing

Nanoscale ◽  
2021 ◽  
Author(s):  
Hyo-Bae Kim ◽  
Moonyoung Jung ◽  
Youkyoung Oh ◽  
Seung Won Lee ◽  
Dongseok Suh ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Zirconium Oxide ◽  
Ferroelectric Properties ◽  
Atomic Layer ◽  
Ferroelectric Thin Films ◽  
Next Generation ◽  
Oxide Thin Films ◽  
Layer Deposition

HfO2-based ferroelectric thin films deposited via atomic layer deposition have been extensively studied as promising candidates for next-generation ferroelectric devices. The conversion of an amorphous Hf1-xZrxO2 film to the ferroelectric...

scholarly journals Fabrication of GdxFeyOz films using an atomic layer deposition-type approach

CrystEngComm ◽  
2021 ◽  
Author(s):  
Pengmei Yu ◽  
Sebastian M. J. Beer ◽  
Anjana Devi ◽  
Mariona Coll
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Complex Oxide ◽  
Oxide Thin Films ◽  
Layer Deposition ◽  
Atomic Precision

The growth of complex oxide thin films with atomic precision offers bright prospects to study improved properties and novel functionalities.

Cyclopentadienyl Precursors for the Atomic Layer Deposition of Erbium Oxide Thin Films

2014 ◽  
Vol 20 (7-8-9) ◽  
pp. 217-223 ◽  
Author(s):  
Timothee Blanquart ◽  
Mikko Kaipio ◽  
Jaakko Niinistö ◽  
Marco Gavagnin ◽  
Valentino Longo ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Erbium Oxide ◽  
Oxide Thin Films ◽  
Layer Deposition

scholarly journals Preparation of Hafnium Oxide Thin Films grown by Atomic Layer Deposition

2005 ◽  
Vol 15 (4) ◽  
pp. 275-280
Author(s):  
Hie-Chul Kim ◽  
Min-Wan Kim ◽  
Hyung-Su Kim ◽  
Hyug-Jong Kim ◽  
Woo-Keun Sohn ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Hafnium Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Layer Deposition
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