scholarly journals In Situ Studies of the Electrochemical Reduction of a Supported Ultrathin Single-Crystalline RuO2(110) Layer in an Acidic Environment

2019 ◽  
Vol 123 (7) ◽  
pp. 3979-3987 ◽  
Author(s):  
Tim Weber ◽  
Marcel J. S. Abb ◽  
Omeir Khalid ◽  
Johannes Pfrommer ◽  
Francesco Carla ◽  
...  
Keyword(s):  
Electrochemical Reduction ◽  
Acidic Environment ◽  
Single Crystalline ◽  
In Situ Studies

scholarly journals In situ studies of the cathodic stability of single-crystalline IrO2(110) ultrathin films supported on RuO2(110)/Ru(0001) in an acidic environment

2020 ◽  
Vol 22 (40) ◽  
pp. 22956-22962
Author(s):  
Tim Weber ◽  
Marcel J. S. Abb ◽  
Jonas Evertsson ◽  
Martina Sandroni ◽  
Jakub Drnec ◽  
...  
Keyword(s):  
Ultrathin Films ◽  
Cathodic Polarization ◽  
Acidic Environment ◽  
Single Crystalline ◽  
In Situ Studies

Upon cathodic polarization of a sophisticated IrO2(110)–RuO2(110)/Ru(0001) model electrode a loss of adhesion of the IrO2(110) film to the RuO2(110)/Ru(0001) template is observed.

Preparation of integrated circuits for TEM electromigration in situ studies

1986 ◽  
Vol 44 ◽  
pp. 882-883
Author(s):  
J. V. Maskowitz ◽  
W. E. Rhoden ◽  
D. R. Kitchen ◽  
R. E. Omlor ◽  
P. F. Lloyd
Keyword(s):  
Integrated Circuits ◽  
Crystallographic Orientation ◽  
Silicon Wafers ◽  
Minimum Size ◽  
Test Vehicle ◽  
In Situ Studies ◽  
Boron Doped ◽  
Doped Silicon ◽  
Drill Holes

The fabrication of the aluminum bridge test vehicle for use in the crystallographic studies of electromigration involves several photolithographic processes, some common, while others quite unique. It is most important to start with a clean wafer of known orientation. The wafers used are 7 mil thick boron doped silicon. The diameter of the wafer is 1.5 inches with a resistivity of 10-20 ohm-cm. The crystallographic orientation is (111).Initial attempts were made to both drill and laser holes in the silicon wafers then back fill with photoresist or mounting wax. A diamond tipped dentist burr was used to successfully drill holes in the wafer. This proved unacceptable in that the perimeter of the hole was cracked and chipped. Additionally, the minimum size hole realizable was > 300 μm. The drilled holes could not be arrayed on the wafer to any extent because the wafer would not stand up to the stress of multiple drilling.

In Situ X-Ray Absorption Studies of the Electrochemical Reduction of Hydroxocobalamin

1997 ◽  
Vol 7 (C2) ◽  
pp. C2-619-C2-620 ◽  
Author(s):  
M. Giorgett ◽  
I. Ascone ◽  
M. Berrettoni ◽  
S. Zamponi ◽  
R. Marassi
Keyword(s):  
Electrochemical Reduction ◽  
X Ray ◽  
Absorption Studies ◽  
X Ray Absorption
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