Defect Agglomeration and Electron-Beam-Induced Local-Phase Transformations in Single-Layer MoTe2

2021 ◽  
Author(s):  
Janis Köster ◽  
Mahdi Ghorbani-Asl ◽  
Hannu-Pekka Komsa ◽  
Tibor Lehnert ◽  
Silvan Kretschmer ◽  
...  
Keyword(s):  
Electron Beam ◽  
Phase Transformations ◽  
Single Layer ◽  
Local Phase

Characterization of Glass-Ceramics by TEM

2013 ◽  
Vol 562-565 ◽  
pp. 809-812 ◽  
Author(s):  
Xiao Qing Liu ◽  
Jun Lin Xie ◽  
Feng He ◽  
Hu Yang
Keyword(s):  
Electron Beam ◽  
Carbon Film ◽  
Glass Ceramics ◽  
Single Layer ◽  
Double Layers ◽  
Characterization Technique

The characterization technique of glass-ceramics by TEM was discussed by comparing the effects of single layer carbon film technique and double layers carbon film technique on the microstructure of Li-Al-Si glass-ceramics. The results show that double layers carbon film technique can improve glass-ceramics sample’s conductivity, reduce the induction of elctron beam on glass-ceramics, and avoid the temperature increasing of glass-ceramics particles caused by the charges aggregation on the particles’ surface when TEM electron beam hit down, prevent glass-ceramics from crystallization and the transformation of microstructurec. So, compared with single layer carbon film technique, double layers carbon film technique is more suitable for the research of microsture of glass-ceramics by TEM.

Temperature hysteresis of the elastic modulus and low-temperature local phase transformations of the order-disorder type in the superconductor YBa2Cu3Ox

1988 ◽  
Vol 131 (9) ◽  
pp. 538-540 ◽  
Author(s):  
L.G. Mamsurova ◽  
K.S. Pigalskiy ◽  
V.P. Sakun ◽  
L.G. Scherbakova ◽  
I.E. Graboy ◽  
...  
Keyword(s):  
Elastic Modulus ◽  
Low Temperature ◽  
Phase Transformations ◽  
Temperature Hysteresis ◽  
Local Phase ◽  
Disorder Type

Development of single-layer positive resist process for electron beam direct writing technology

1995 ◽  
Vol 78 (8) ◽  
pp. 81-91 ◽  
Author(s):  
Hidenori Yamaguchi ◽  
Toshio Sakamizu ◽  
Fumio Murai ◽  
Hiroshi Shiraishi ◽  
Hajime Hayakawa ◽  
...  
Keyword(s):  
Electron Beam ◽  
Single Layer ◽  
Direct Writing ◽  
Writing Technology ◽  
Positive Resist

scholarly journals SiO2Antireflection Coatings Fabricated by Electron-Beam Evaporation for Black Monocrystalline Silicon Solar Cells

2014 ◽  
Vol 2014 ◽  
pp. 1-5 ◽  
Author(s):  
Minghua Li ◽  
Hui Shen ◽  
Lin Zhuang ◽  
Daming Chen ◽  
Xinghua Liang
Keyword(s):  
Electron Beam ◽  
Solar Cells ◽  
Conversion Efficiency ◽  
Single Layer ◽  
Bottom Layer ◽  
Energy Conversion Efficiency ◽  
Electron Beam Evaporation ◽  
Silicon Solar Cells ◽  
Antireflection Coatings ◽  
Efficiency Increase

In this work we prepared double-layer antireflection coatings (DARC) by using the SiO2/SiNx:H heterostructure design. SiO2thin films were deposited by electron-beam evaporation on the conventional solar cell with SiNx:H single-layer antireflection coatings (SARC), while to avoid the coverage of SiO2on the front side busbars, a steel mask was utilized as the shelter. The thickness of the SiNx:H as bottom layer was fixed at 80 nm, and the varied thicknesses of the SiO2as top layer were 105 nm and 122 nm. The results show that the SiO2/SiNx:H DARC have a much lower reflectance and higher external quantum efficiency (EQE) in short wavelengths compared with the SiNx:H SARC. A higher energy conversion efficiency of 17.80% was obtained for solar cells with SiO2(105 nm)/SiNx:H (80 nm) DARC, an absolute conversion efficiency increase of 0.32% compared with the conventional single SiNx:H-coated cells.

Electron-Beam-Driven Structure Evolution of Single-Layer MoTe2 for Quantum Devices

2019 ◽  
Vol 2 (5) ◽  
pp. 3262-3270 ◽  
Author(s):  
Tibor Lehnert ◽  
Mahdi Ghorbani-Asl ◽  
Janis Köster ◽  
Zhongbo Lee ◽  
Arkady V. Krasheninnikov ◽  
...  
Keyword(s):  
Electron Beam ◽  
Single Layer ◽  
Structure Evolution ◽  
Quantum Devices

Y shape gate formation in single layer of ZEP520A using 3D electron beam lithography

2015 ◽  
Vol 143 ◽  
pp. 37-40 ◽  
Author(s):  
Jinhai Shao ◽  
Sichao Zhang ◽  
Jianpeng Liu ◽  
Bing-Rui Lu ◽  
Nit Taksatorn ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Single Layer ◽  
3D Electron
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