Effects of Postdeposition Annealing on the Luminescence of Mixed-Phase CsPb2Br5/CsPbBr3 Thin Films

2020 ◽  
Vol 124 (36) ◽  
pp. 19514-19521
Author(s):  
Sebastián Caicedo-Dávila ◽  
René Gunder ◽  
José A. Márquez ◽  
Sergiu Levcenko ◽  
Klaus Schwarzburg ◽  
...  
Keyword(s):  
Thin Films ◽  
Mixed Phase

Internal structure of mixed phase hydrogenated silicon thin films made at 39°C

2006 ◽  
Vol 89 (5) ◽  
pp. 051922 ◽  
Author(s):  
P. C. P. Bronsveld ◽  
J. K. Rath ◽  
R. E. I. Schropp ◽  
T. Mates ◽  
A. Fejfar ◽  
...  
Keyword(s):  
Thin Films ◽  
Internal Structure ◽  
Mixed Phase ◽  
Hydrogenated Silicon ◽  
Silicon Thin Films

Nanoscale structure of Ti1−xNbyO2 mixed-phase thin films: Distribution of crystal phase and dopants

2012 ◽  
Vol 27 (6) ◽  
pp. 944-950
Author(s):  
Paul A. DeSario ◽  
Jinsong Wu ◽  
Michael E. Grahm ◽  
Kimberly A. Gray
Keyword(s):  
Thin Films ◽  
Mixed Phase ◽  
Crystal Phase ◽  
Nanoscale Structure ◽  
Image Position

Abstract

Relation of nanoscale and macroscopic properties of mixed-phase silicon thin films

2010 ◽  
Vol 207 (3) ◽  
pp. 582-586 ◽  
Author(s):  
A. Fejfar ◽  
A. Vetushka ◽  
V. Kalusová ◽  
O. Čertík ◽  
M. Ledinský ◽  
...  
Keyword(s):  
Thin Films ◽  
Mixed Phase ◽  
Silicon Thin Films ◽  
Macroscopic Properties

Enhancing the Efficiency of Dye Sensitized Solar Cells by Using Anatase and Brookite Mixed Phases of TiO2

2019 ◽  
Vol 14 (11) ◽  
pp. 1582-1588 ◽  
Author(s):  
M. I. Khan ◽  
Shahnawaz ◽  
Shahid Imran ◽  
Muhammad Waqas Yousaf ◽  
A. Wahab ◽  
...  
Keyword(s):  
Thin Films ◽  
Solar Cells ◽  
Anatase Phase ◽  
Sol Gel ◽  
Dye Sensitized Solar Cells ◽  
Visible Region ◽  
Mixed Phase ◽  
Solar Simulator ◽  
Dye Sensitized ◽  
Sensitized Solar Cells

The phases of TiO2 have an important role in the efficiency of dye sensitized solar cells (DSSCs). In this research, the effects of anatase and mixed phases (brookite and anatase) of TiO2 on the efficiency of DSSCs have been reported. 2% Cu doped TiO2 (Cu:TiO2) thin films are prepared by sol–gel dip coating technique. These films are annealed at the temperatures of "350 °C, 450 °C, 550 °C and 650 °C." XRD showed that at 550 °C and 650 °C, films have mixed phases of TiO2. Also, it showed that grain size is increased by increasing temperature. No extra phases of Cu like CuO etc. were observed in XRD graphs, which confirmed that Cu is completely dissolved into TiO2. UV-Vis results showed that all the films have more than 80% transmittance in the visible region. The optical band gap energy (Eg) of films at "350 °C, 450 °C, 550 °C and 650 °C" is 3.96, 3.81, 3.75 and 3.64 eV, respectively. The electrical resistivity of these thin films by four point probe technique is calculated as 121.8 × 102 Ω-m, 95.69 × 102 Ω-m, 86.65 × 102 Ω-m and 76.3 × 102Ω-m respectively. Solar simulator results showed that the current density (Jsc) of mixed phase is higher than single phase, causing higher efficiency. The maximum Jsc 5.12 mAcm–2 is achieved at 650 °C (mixed phase), resulting in higher efficiency of 2.35% which is more than 100 times the efficiency of anatase phase which has 1.18%. This work will provide a way to enhance the efficiency of DSSCs by using mixed phases of TiO2. In future, if 1-D structure of these mixed phases is used in DSSCs then efficiency of DSSCs will improve definitely (or positively).

Low power density multihole cathode very-high-frequency plasma for mixed phase Si:H thin films

2008 ◽  
Vol 93 (19) ◽  
pp. 191502 ◽  
Author(s):  
C. Jariwala ◽  
A. Chainani ◽  
R. Eguchi ◽  
M. Matsunami ◽  
S. Shin ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Power ◽  
Power Density ◽  
High Frequency ◽  
Mixed Phase ◽  
Very High Frequency ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Very High

Characterization of mixed-phase BN thin films deposited by plasma CVD

1993 ◽  
Vol 60 (1-3) ◽  
pp. 502-505 ◽  
Author(s):  
M.Z. Karim ◽  
D.C. Cameron ◽  
M.S.J. Hashmi
Keyword(s):  
Thin Films ◽  
Mixed Phase ◽  
Plasma Cvd
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