Low power density multihole cathode very-high-frequency plasma for mixed phase Si:H thin films

C. Jariwala; A. Chainani; R. Eguchi; M. Matsunami; S. Shin; S. Bhatt; V. Dalal; P. I. John

doi:10.1063/1.3023066

Low power density multihole cathode very-high-frequency plasma for mixed phase Si:H thin films

Applied Physics Letters ◽

10.1063/1.3023066 ◽

2008 ◽

Vol 93 (19) ◽

pp. 191502 ◽

Cited By ~ 1

Author(s):

C. Jariwala ◽

A. Chainani ◽

R. Eguchi ◽

M. Matsunami ◽

S. Shin ◽

...

Keyword(s):

Thin Films ◽

Low Power ◽

Power Density ◽

High Frequency ◽

Mixed Phase ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Very High

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Ultra-sharp pointed tip Si nanowires produced by very high frequency plasma enhanced chemical vapor deposition via VLS mechanism

Journal of Materials Science ◽

10.1007/s10853-011-5435-6 ◽

2011 ◽

Vol 46 (15) ◽

pp. 5085-5089 ◽

Cited By ~ 11

Author(s):

Habib Hamidinezhad ◽

Yussof Wahab ◽

Zulkafli Othaman

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Si Nanowires ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Very High

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Characterization of High-Rate Deposited Microcrystalline Si Films Prepared Using Atmospheric-Pressure Very High Frequency Plasma

ECS Meeting Abstracts ◽

10.1149/ma2009-02/34/2510 ◽

2009 ◽

Keyword(s):

Atmospheric Pressure ◽

High Frequency ◽

High Rate ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Si Films ◽

Very High

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Characteristics of Very High Frequency Plasma Produced Using a Ladder-Shaped Electrode

Japanese Journal of Applied Physics ◽

10.1143/jjap.38.4305 ◽

1999 ◽

Vol 38 (Part 1, No. 7B) ◽

pp. 4305-4308 ◽

Cited By ~ 11

Author(s):

Hiroshi Mashima ◽

Masayoshi Murata ◽

Yoshiaki Takeuchi ◽

Hideo Yamakoshi ◽

Tatsuji Horioka ◽

...

Keyword(s):

High Frequency ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Very High

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ERRATA: MICROCRYSTALLINE SILICON FILMS PREPARED BY VERY HIGH FREQUENCY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AT LOW TEMPERATURE

International Journal of Modern Physics B ◽

10.1142/s0217979205032310 ◽

2005 ◽

Vol 19 (21) ◽

pp. 3413-3413

Author(s):

ZHIMENG WU ◽

QINGSONG LEI ◽

JIANPING XI ◽

ZHAO YING ◽

XINHUA GENG

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Very High

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Pulsed very high-frequency plasma-enhanced chemical vapor deposition of silicon films for low-temperature (120 °C) thin film transistors

Journal of Physics D Applied Physics ◽

10.1088/1361-6463/ab9919 ◽

2020 ◽

Vol 53 (41) ◽

pp. 415201

Author(s):

Hiroaki Kakiuchi ◽

Hiromasa Ohmi ◽

Kiyoshi Yasutake

Keyword(s):

Thin Film ◽

Low Temperature ◽

Vapor Deposition ◽

High Frequency ◽

Thin Film Transistors ◽

Chemical Vapor ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Very High

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Using optical emission spectroscopy (OES) to monitor In-line very high-frequency plasma enhanced chemical vapor deposition (VHF-PECVD) technique optoelectrical properties

2019 Compound Semiconductor Week (CSW) ◽

10.1109/iciprm.2019.8819292 ◽

2019 ◽

Author(s):

Jia-Yan Lin ◽

Cheng-Yuan Hung ◽

Wei-Chen Tien ◽

Hung-Wei Wu ◽

Yung-Der Juang ◽

...

Keyword(s):

Vapor Deposition ◽

High Frequency ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Chemical Vapor ◽

Optical Emission ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Very High

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Acceleration of ordering transformation of a new Fe2(Mn,Cr)Si Heusler-alloy film by very high frequency plasma irradiation process during radio frequency sputter deposition

Journal of Applied Physics ◽

10.1063/1.3562198 ◽

2011 ◽

Vol 109 (7) ◽

pp. 07B751 ◽

Cited By ~ 1

Author(s):

S. Yoshimura ◽

H. Kobayashi ◽

G. Egawa ◽

H. Saito ◽

S. Ishida

Keyword(s):

High Frequency ◽

Heusler Alloy ◽

Alloy Film ◽

Sputter Deposition ◽

Very High Frequency ◽

Plasma Irradiation ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Irradiation Process ◽

Very High

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Photoluminescence of Nanocrystalline Silicon Quantum Dots with Various Sizes and Various Phosphorus Doping Concentrations Prepared by Very High Frequency Plasma

Japanese Journal of Applied Physics ◽

10.7567/jjap.51.115202 ◽

2012 ◽

Vol 51 (11R) ◽

pp. 115202 ◽

Cited By ~ 9

Author(s):

Ken Someno ◽

Kouichi Usami ◽

Tetsuo Kodera ◽

Yukio Kawano ◽

Mutsuko Hatano ◽

...

Keyword(s):

Quantum Dots ◽

High Frequency ◽

Nanocrystalline Silicon ◽

Very High Frequency ◽

Phosphorus Doping ◽

Silicon Quantum Dots ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Very High

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High rate deposition of diamond like carbon films by very high frequency plasma enhanced chemical vapor deposition at 100 MHz

Journal of Applied Physics ◽

10.1063/1.1561997 ◽

2003 ◽

Vol 93 (10) ◽

pp. 6361-6369 ◽

Cited By ~ 14

Author(s):

Sushil Kumar ◽

P. N. Dixit ◽

D. Sarangi ◽

R. Bhattacharyya

Keyword(s):

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Carbon Films ◽

High Rate ◽

Diamond Like Carbon ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Very High

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Recent advances in very high frequency plasma enhanced CVD process for the fabrication of thin film silicon solar cells

Thin Solid Films ◽

10.1016/j.tsf.2009.03.088 ◽

2009 ◽

Vol 517 (17) ◽

pp. 4758-4761 ◽

Cited By ~ 4

Author(s):

Jatindra K. Rath ◽

Yanchao Liu ◽

Monica Brinza ◽

Arjan Verkerk ◽

Caspar van Bommel ◽

...

Keyword(s):

Thin Film ◽

Solar Cells ◽

High Frequency ◽

Silicon Solar Cells ◽

Very High Frequency ◽

Plasma Enhanced Cvd ◽

Recent Advances ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Very High

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