High-Speed Direct Writing of MoSe2 by Maskless and Gas-Free Laser-Assisted Selenization Process

2020 ◽  
Vol 124 (35) ◽  
pp. 19333-19339
Author(s):  
Yoonsoo Rho ◽  
Healin Im ◽  
Letian Wang ◽  
Matthew Eliceiri ◽  
Brian Blankenship ◽  
...  
Keyword(s):  
High Speed ◽  
Direct Writing ◽  
Selenization Process

Charged Molten Metal Droplet Deposition as a Direct Write Technology

2000 ◽  
Vol 624 ◽  
Author(s):  
M. Orme ◽  
J. Courter ◽  
Q. Liu ◽  
J. Zhu ◽  
R. Smith
Keyword(s):  
Molten Metal ◽  
High Speed ◽  
Droplet Diameter ◽  
Metal Droplet ◽  
Circuit Board ◽  
Charged Droplet ◽  
Direct Write ◽  
Direct Writing ◽  
Drop On Demand ◽  
Metal Droplets

ABSTRACTThe formation of highly uniform charged molten metal droplets from capillary stream breakup has recently attracted significant industrial and academic interest for applications requiring high-speed and high-precision deposition of molten metal droplets such as direct write technologies. Exploitation of the high droplet production rates intrinsic to the phenomenon of capillary stream break-up and the unparalleled uniformity of droplet sizes and speeds attained with proper applied forcing to the capillary stream make many new applications related to the manufacture of electronic packages, circuit board printing and rapid prototyping of structural components feasible. Recent research results have increased the stream stability with novel acoustic excitation methods and enable ultra-precise charged droplet deflection. Unlike other modes of droplet generation such as Drop-on-Demand, droplets can be generated at rates typically on the order of 10,000 to 20,000 droplets per second (depending on droplet diameter and stream speed) and can be electrostatically charged and deflected onto a substrate with a measured accuracy of ±12.5 µm. Droplets are charged on a drop-to-drop basis, enabling the direct writing of fine details at high speed. New results are presented in which fine detailed patterns are “printed” with individual molten metal solder balls, and issues relevant to the attainment of high quality printed artifacts are investigated.

Surface Microfabrication of Conventional Glass Using Femtosecond Laser for Microfluidic Applications

2017 ◽  
Vol 11 (6) ◽  
pp. 878-882 ◽  
Author(s):  
Takuma Niioka ◽  
◽  
Yasutaka Hanada
Keyword(s):  
High Resolution ◽  
Microfluidic Chip ◽  
High Speed ◽  
Single Cell Analysis ◽  
Glass Slide ◽  
Cell Analysis ◽  
Microfluidic Chips ◽  
Direct Writing ◽  
Laser Direct Writing ◽  
Fs Laser

Recently, a lot of attention has been paid to a single-cell analysis using microfluidic chips, since each cell is known to have several different characteristics. The microfluidic chip manipulates cells and performs high-speed and high-resolution analysis. In the meanwhile, femtosecond (fs) laser has become a versatile tool for the fabrication of microfluidic chips because the laser can modify internal volume solely at the focal area, resulting in three-dimensional (3D) microfabrication of glass materials. However, little research on surface microfabrication of materials using an fs laser has been conducted. Therefore, in this study, we demonstrate the surface microfabrication of a conventional glass slide using fs laser direct-writing for microfluidic applications. The fs laser modification, with successive wet etching using a diluted hydrofluoric (HF) acid solution, followed by annealing, results in rapid prototyping of microfluidics on a conventional glass slide for fluorescent microscopic cell analysis. Fundamental characteristics of the laser-irradiated regions in each experimental procedure were investigated. In addition, we developed a novel technique combining the fs laser direct-writing and the HF etching for high-speed and high-resolution microfabrication of the glass. After establishing the fs laser surface microfabrication technique, a 3D microfluidic chip was made by bonding the fabricated glass microfluidic chip with a polydimethylsiloxane (PDMS) polymer substrate for clear fluorescent microscopic observation in the microfluidics.

Photo-Polymerized Acrylic Waveguides for Optical Interconnects

1991 ◽  
Vol 228 ◽  
Author(s):  
Robert R. Krchnavek ◽  
Gail R. Lalk ◽  
Robert Denton
Keyword(s):  
High Speed ◽  
Optical Channel ◽  
Direct Write ◽  
Material System ◽  
Direct Writing ◽  
Laser Technique ◽  
Electronic Board ◽  
Channel Waveguides ◽  
Optical Applications ◽  
Urethane Dimethacrylate

ABSTRACTWe have fabricated acrylic based optical channel waveguides using proximity photolithography as well as laser direct writing. The cladding layer is a photosensitive aliphatic urethane dimethacrylate and the guiding layer is a photosensitive aromatic acrylated epoxy. This material system provides good adhesion to a variety of substrate materials. Since both the guiding and cladding layers are applied, these materials can be employed in several electrical/optical applications including multi-chip modules using Si, SiO2, and polyimide as well as high speed electronic board technologies using teflon based substrates.Loss measurements show a guide loss of less than 0.08 dB/cm for multi-mode waveguides fabricated using the direct write laser technique. Lithographically defined guides have a loss of 0.3 dB/cm for similar size waveguides.

High-speed and crack-free direct-writing of microchannels on glass by an IR femtosecond laser

2016 ◽  
Vol 79 ◽  
pp. 39-47 ◽  
Author(s):  
Evgeny Bulushev ◽  
Victor Bessmeltsev ◽  
Alexandr Dostovalov ◽  
Nikolay Goloshevsky ◽  
Alexey Wolf
Keyword(s):  
Femtosecond Laser ◽  
High Speed ◽  
Direct Writing

scholarly journals Sculpting Desired Topographies Using Abrasive Jet Micro-Machining

2021 ◽  
Author(s):  
Mohammadreza Sookhaklari
Keyword(s):  
Process Parameters ◽  
High Speed ◽  
Target Material ◽  
Mathematical Framework ◽  
Direct Writing ◽  
Constant Depth ◽  
Cross Sectional ◽  
Surface Evolution ◽  
Micro Channels ◽  
A New Technique

Abrasive jet micromachining (AJM) uses a jet of high-speed particles to erode a wide variety of materials. Given a set of process parameters, surface evolution models capable of predicting the shape of straight, constant-depth channels in a wide variety of materials are well-established. This dissertation presents novel methods for solving the unaddressed more challenging and industrially relevant inverse problem of determining the process parameters required to machine a particular user-specified feature topography. Since the air driven jet used in AJM is divergent, the edges of the desired features are usually defined using a mask which is attached to the surface of the target material. This dissertation presents alternate techniques using stationary or moving shadow masks that can be moved over the surface and maskless techniques, in order to allow direct writing of desired features on the surface. A mathematical framework is then introduced to determine the direct writing source velocity function and path required to create a desired shallow topography. It is also shown how the methodology can be used with existing surface evolution models to predict the feature shape at any depth. The methodologies are demonstrated to work well for the AJM of constant depth micro-channels with user-specified cross-sectional shape, gradient etched micro-channels with specified texture along their length, and pockets with texture in two perpendicular directions. Finally, a new technique is introduced that utilizes a rotating patterned mask in order to control the AJM erosive footprint size and shape. Models for predicting the rotating mask pattern required to create virtually any desired footprint are presented, and experimentally verified for symmetric and asymmetric W-shaped, trapezoidal and wedge shaped footprints.

High‐speed laser direct writing of tungsten conductors from W(CO)6

1990 ◽  
Vol 56 (25) ◽  
pp. 2581-2583 ◽  
Author(s):  
Y. Nambu ◽  
Y. Morishige ◽  
S. Kishida
Keyword(s):  
High Speed ◽  
Direct Writing ◽  
Laser Direct Writing

Magnetic Random Access Memory (MRAM)

2007 ◽  
Vol 7 (1) ◽  
pp. 117-137
Author(s):  
Yuankai Zheng ◽  
Yihong Wu ◽  
Kebin Li ◽  
Jinjun Qiu ◽  
Guchang Han ◽  
...  
Keyword(s):  
High Speed ◽  
Low Cost ◽  
Random Access ◽  
High Density ◽  
Direct Writing ◽  
Cell Array ◽  
Cross Point ◽  
Reading And Writing ◽  
Cell Efficiency ◽  
Array Structures

The high density and high speed nonvolatile MTJ MRAMs are reviewed from perspective of the reading and writing operation. The reading operation of the MRAM with different sensing schemes and cell array structures is discussed, in particular the reference resistance generating schemes which are introduced to maximize the cell efficiency and reading reliability. The high density, low cost cross-point cell layout structures are analyzed systematically. The writing operation modes ranging from the half-select, toggle mode, guided SAF direct writing, thermally assisted writing, to the spin transfer switching are investigated both theoretically and experimentally. The thermal factor always plays an important role in determine not only the thermal stability but also the reading and writing reliability.

Sign in / Sign up

Export Citation Format

Share Document