scholarly journals In Situ Atomic/Molecular Layer-by-Layer Deposition of Inorganic–Organic Coordination Network Thin Films from Gaseous Precursors

2016 ◽  
Vol 28 (17) ◽  
pp. 6260-6265 ◽  
Author(s):  
Esko Ahvenniemi ◽  
Maarit Karppinen
Keyword(s):  
Thin Films ◽  
Molecular Layer ◽  
Layer By Layer ◽  
Coordination Network ◽  
Layer Deposition

scholarly journals Composition-tuned metal–organic thin-film structures based on photoswitchable azobenzene by ALD/MLD

2020 ◽  
Vol 49 (32) ◽  
pp. 11310-11316
Author(s):  
Aida Khayyami ◽  
Anish Philip ◽  
Jenna Multia ◽  
Maarit Karppinen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Molecular Layer ◽  
Organic Thin Film ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Metal Organic

We demonstrate the fabrication of in-situ crystalline thin films of various azobenzene (AZO) based photoresponsive metal–organic structures using the atomic/molecular layer deposition (ALD/MLD) technique.

In-situ analysis of growth rate evolution during molecular layer deposition of ultra-thin polyurea films using aliphatic and aromatic precursors

2022 ◽  
Author(s):  
Rachel A. Nye ◽  
Siyao Wang ◽  
Stefan Uhlenbrock ◽  
John A. Smythe III ◽  
Gregory N. Parsons
Keyword(s):  
Thin Films ◽  
Growth Rate ◽  
Energy Storage ◽  
Molecular Layer ◽  
Organic Thin Films ◽  
In Situ Analysis ◽  
Next Generation ◽  
Molecular Layer Deposition ◽  
Layer Deposition

Organic thin films formed by molecular layer deposition (MLD) are important for next-generation electronics, energy storage, photoresists, protective barriers and other applications. This study uses in situ ellipsometry and quartz...

Radical-triggered cross-linking for molecular layer deposition of SiAlCOH hybrid thin films

2021 ◽  
Author(s):  
Kristina Ashurbekova ◽  
Karina Ashurbekova ◽  
Iva Saric ◽  
Evgeny Modin ◽  
Mladen Petravic ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Molecular Layer ◽  
Thin Film Growth ◽  
Cross Linking ◽  
Layer By Layer ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Hybrid Thin Films ◽  
Enhanced Stability

We developed a thin film growth with a radical-initiated cross-linking of vinyl groups in a layer-by-layer manner via molecular layer deposition (MLD). The cross-linked film exhibited improved properties like 12% higher density and enhanced stability compared to the non-cross-linked film.

Fabrication of Polycrystalline Silicon on Glass from Fluorinated Precursors with the Aid of Atomic Hydrogen

1995 ◽  
Vol 403 ◽  
Author(s):  
T. Akasaka ◽  
D. He ◽  
I. Shimizu
Keyword(s):  
Thin Films ◽  
Atomic Hydrogen ◽  
Polycrystalline Silicon ◽  
In Situ Observation ◽  
Layer By Layer ◽  
High Quality ◽  
Deposition Parameters ◽  
Columnar Grains ◽  
Step Growth

AbstractHigh quality polycrystalline silicon was made on glass from fluorinated precursors by two step growth, i.e., (1) formation of seed crystals on glass by layer-by-layer(LL) technique and (2) grain-growth on the seeds. In LL technique, deposition of ultra-thin films and treatment with atomic hydrogen was repeated alternately. Columnar grains with 200 nm dia were grown epitaxy-like on the seeds by optimizing the deposition parameters under in situ observation with spectroscopic ellipsometry.

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