Growth Study of New Complex Oxide PbOxSe1–x Thin Films by Oxygen Plasma-Assisted Molecular Beam Epitaxy

2019 ◽  
Vol 19 (4) ◽  
pp. 2253-2258 ◽  
Author(s):  
Lance L. McDowell ◽  
Jijun Qiu ◽  
Binbin Weng ◽  
Zhisheng Shi
1997 ◽  
Vol 12 (7) ◽  
pp. 1844-1849 ◽  
Author(s):  
Y. Gao ◽  
G. Bai ◽  
Y. Liang ◽  
G. C. Dunham ◽  
S. A. Chambers

Metallic RuO2(110) thin films were grown by oxygen-plasma-assisted molecular beam epitaxy (MBE) on MgO(100) and (110) at 425 °C. RuO2 films on MgO(100) are epitaxial with two variants, while RuO2 films on MgO(110) are highly oriented with the (110) face parallel to the substrate surface. The two variants in the RuO2(110) epitaxial films resulted in a twofold mosaic microstructure. The RuO2(110) epitaxial films are very smooth and exhibit a low resistivity of ∼ 36 μΩ-cm. In contrast, the RuO2(110) textured films are very rough, and consist of small grains with a poor in-plane alignment. A slight higher resistivity (49 μΩ-cm) was found for the RuO2 (110) textured films grown on MgO(110).


2008 ◽  
Vol 11 (5) ◽  
pp. B76 ◽  
Author(s):  
Z. Q. Yu ◽  
Satyanarayana V. N. T. Kuchibhatla ◽  
L. V. Saraf ◽  
O. A. Marina ◽  
C. M. Wang ◽  
...  

2007 ◽  
Vol 301-302 ◽  
pp. 54-57 ◽  
Author(s):  
J.F. Xu ◽  
P.M. Thibado ◽  
C. Awo-Affouda ◽  
R. Moore ◽  
V.P. LaBella

AIP Advances ◽  
2017 ◽  
Vol 7 (10) ◽  
pp. 105020 ◽  
Author(s):  
Z. P. Zhang ◽  
Y. X. Song ◽  
Y. Y. Li ◽  
X. Y. Wu ◽  
Z. Y. S. Zhu ◽  
...  

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