Film Thickness Determination with a Scintillation Counter.

1962 ◽  
Vol 34 (11) ◽  
pp. 1396-1397
Author(s):  
H. R. Lukens
Keyword(s):  
Film Thickness ◽  
Scintillation Counter ◽  
Thickness Determination

Film thickness determination with PIXE

1992 ◽  
Vol 68 (1-4) ◽  
pp. 277-280 ◽  
Author(s):  
C. Klatt ◽  
W. Ensinger ◽  
H. Martin ◽  
G.K. Wolf ◽  
P. Oberschachtsiek ◽  
...  
Keyword(s):  
Film Thickness ◽  
Thickness Determination

RESOLUTION IN PIXE THIN FILM THICKNESS DETERMINATION

1991 ◽  
Vol 01 (03) ◽  
pp. 259-270 ◽  
Author(s):  
J. MIRANDA ◽  
A. OLIVER ◽  
F.J. RUIZ ◽  
J.M. SANTANA
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Thickness Measurement ◽  
Copper Films ◽  
Thin Film Thickness ◽  
Thickness Determination ◽  
Beam Incident ◽  
Sputtering Yields ◽  
Film Thickness Measurement ◽  
Titanium Substrates

The resolution of several methods for thin film thickness measurement using PIXE, based on the variation of the proton beam incident energy, is discussed. In order to evaluate the resolution, sputtering of copper films, deposited on aluminum and titanium substrates by argon ions is used. Sputtering yields are obtained through thickness changes, and then compared to other experimental and theoretical values. Good agreement is found, thus confirming the accuracy of PIXE as a method for film thickness determination.

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