Temperature-Controlled Depth Profiling of Poly(methyl methacrylate) Using Cluster Secondary Ion Mass Spectrometry. 1. Investigation of Depth Profile Characteristics

Christine M. Mahoney; Albert J. Fahey; Greg Gillen

doi:10.1021/ac061356h

Temperature-Controlled Depth Profiling of Poly(methyl methacrylate) Using Cluster Secondary Ion Mass Spectrometry. 1. Investigation of Depth Profile Characteristics

Analytical Chemistry ◽

10.1021/ac061356h ◽

2007 ◽

Vol 79 (3) ◽

pp. 828-836 ◽

Cited By ~ 56

Author(s):

Christine M. Mahoney ◽

Albert J. Fahey ◽

Greg Gillen

Keyword(s):

Mass Spectrometry ◽

Methyl Methacrylate ◽

Depth Profile ◽

Secondary Ion Mass Spectrometry ◽

Depth Profiling ◽

Poly Methyl Methacrylate ◽

Ion Mass Spectrometry ◽

Temperature Controlled ◽

Profile Characteristics ◽

Secondary Ion

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Temperature-Controlled Depth Profiling of Poly(methyl methacrylate) Using Cluster Secondary Ion Mass Spectrometry. 2. Investigation of Sputter-Induced Topography, Chemical Damage, and Depolymerization Effects

Analytical Chemistry ◽

10.1021/ac061357+ ◽

2007 ◽

Vol 79 (3) ◽

pp. 837-845 ◽

Cited By ~ 38

Author(s):

Christine M. Mahoney ◽

Albert J. Fahey ◽

Greg Gillen ◽

Chang Xu ◽

James D. Batteas

Keyword(s):

Mass Spectrometry ◽

Methyl Methacrylate ◽

Secondary Ion Mass Spectrometry ◽

Depth Profiling ◽

Poly Methyl Methacrylate ◽

Chemical Damage ◽

Ion Mass Spectrometry ◽

Temperature Controlled ◽

Secondary Ion

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Depth profiling cross-linked poly(methyl methacrylate) films: a time-of-flight secondary ion mass spectrometry approach

Rapid Communications in Mass Spectrometry ◽

10.1002/rcm.7801 ◽

2017 ◽

Vol 31 (4) ◽

pp. 381-388 ◽

Cited By ~ 6

Author(s):

Soheila Naderi-Gohar ◽

Kevin M.H. Huang ◽

Yiliang Wu ◽

Woon Ming Lau ◽

Heng-Yong Nie

Keyword(s):

Mass Spectrometry ◽

Methyl Methacrylate ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Poly Methyl Methacrylate ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Interchain Ion Formation in Secondary Ion Mass Spectrometry Resulting from the Double-Helical Structure of Isotactic Poly(methyl methacrylate) in Adsorbed Monolayers

Analytical Chemistry ◽

10.1021/ac991447x ◽

2000 ◽

Vol 72 (19) ◽

pp. 4585-4590 ◽

Cited By ~ 9

Author(s):

R. W. Nowak ◽

Gardella, ◽

T. D. Wood ◽

P. A. Zimmerman ◽

D. M. Hercules

Keyword(s):

Mass Spectrometry ◽

Methyl Methacrylate ◽

Secondary Ion Mass Spectrometry ◽

Helical Structure ◽

Poly Methyl Methacrylate ◽

Double Helical Structure ◽

Ion Formation ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Temperature-controlled depth profiling in polymeric materials using cluster secondary ion mass spectrometry (SIMS)

Applied Surface Science ◽

10.1016/j.apsusc.2006.02.078 ◽

2006 ◽

Vol 252 (19) ◽

pp. 6502-6505 ◽

Cited By ~ 43

Author(s):

Christine M. Mahoney ◽

Albert J. Fahey ◽

Greg Gillen ◽

Chang Xu ◽

James D. Batteas

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Depth Profiling ◽

Polymeric Materials ◽

Ion Mass Spectrometry ◽

Temperature Controlled ◽

Secondary Ion

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Impact Energy Dependence of SF5+-Induced Damage in Poly(methyl methacrylate) Studied Using Time-of-Flight Secondary Ion Mass Spectrometry

Analytical Chemistry ◽

10.1021/ac035330r ◽

2004 ◽

Vol 76 (5) ◽

pp. 1264-1272 ◽

Cited By ~ 39

Author(s):

M. S. Wagner

Keyword(s):

Mass Spectrometry ◽

Methyl Methacrylate ◽

Energy Dependence ◽

Impact Energy ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Poly Methyl Methacrylate ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Characterization and ion-induced degradation of cross-linked poly(methyl methacrylate) studied using time of flight secondary ion mass spectrometry

Applied Surface Science ◽

10.1016/j.apsusc.2006.05.022 ◽

2006 ◽

Vol 253 (5) ◽

pp. 2603-2610 ◽

Cited By ~ 14

Author(s):

M.S. Wagner ◽

K. Lenghaus ◽

G. Gillen ◽

M.J. Tarlov

Keyword(s):

Mass Spectrometry ◽

Methyl Methacrylate ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Poly Methyl Methacrylate ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of arsenic in silicon

10.3403/30199170u ◽

2015 ◽

Keyword(s):

Mass Spectrometry ◽

Chemical Analysis ◽

Secondary Ion Mass Spectrometry ◽

Depth Profiling ◽

Surface Chemical ◽

Spectrometry Method ◽

Mass Spectrometry Method ◽

Ion Mass Spectrometry ◽

Secondary Ion ◽

Surface Chemical Analysis

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Are cluster ion analysis beams good choices for hydrogen depth profiling using time-of-flight secondary ion mass spectrometry?

Surface and Interface Analysis ◽

10.1002/sia.3776 ◽

2011 ◽

Vol 44 (1) ◽

pp. 89-93 ◽

Cited By ~ 10

Author(s):

Zihua Zhu ◽

Vaithiyalingam Shutthanandan

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

Cluster Ion ◽

Secondary Ion ◽

Ion Analysis

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Secondary ion mass spectrometry depth profiling of ultrashallow phosphorous in silicon

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.591222 ◽

2000 ◽

Vol 18 (1) ◽

pp. 509 ◽

Cited By ~ 17

Author(s):

R. Loesing ◽

G. M. Guryanov ◽

J. L. Hunter ◽

D. P. Griffis

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Secondary ion mass spectrometry depth profiling of 59Co implanted into nickel

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/s0168-583x(03)00837-1 ◽

2003 ◽

Vol 207 (3) ◽

pp. 339-344

Author(s):

L VINCENT ◽

T SAUVAGE ◽

S HOUDAYER ◽

C TESSIER ◽

S GAUTROT ◽

...

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

Secondary Ion

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