Precipitation of hydrogen in crystalline silicon
The behavior of hydrogen in semiconductors has been a topic of increasing interest in recent years. The interest is in part stimulated by the ability of hydrogen to remove the electrical activity (passivate) of both dopant impurities and deep-level defects at moderate temperatures (<300C). Hydrogen is known to readily diffuse in silicon resulting in the neutralization of shallow-acceptor and shallow-donor dopants, Controlled studies of the role of hydrogen in silicon has been recently reported. This was achieved by exposing silicon single crystals to monoatomic hydrogen or deuterium from a microwave gas discharge. To prevent the radiation damage that results from direct exposure to the plasma, the specimens were mounted on a hot stage that was located down stream from the plasma. Optical isolation was achieved with the use of baffles. The specimen temperature was held constant in the range of 100-400°C for time intervals between 10-120 minutes.