Improved thermoelectric properties of nanocrystalline hydrogenated silicon thin films by post-deposition thermal annealing

2017 ◽  
Vol 642 ◽  
pp. 276-280 ◽  
Author(s):  
Joana Loureiro ◽  
Tiago Mateus ◽  
Sergej Filonovich ◽  
Marisa Ferreira ◽  
Joana Figueira ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Annealing ◽  
Thermoelectric Properties ◽  
Hydrogenated Silicon ◽  
Silicon Thin Films ◽  
Post Deposition

INVESTIGATION OF THE Si:H FILMS DEPOSITED NEAR THE TRANSITION REGION FOR APPLICATION IN SOLAR CELLS

2006 ◽  
Vol 20 (27) ◽  
pp. 1739-1747 ◽  
Author(s):  
QINGSONG LEI ◽  
ZHIMENG WU ◽  
XINHUA GENG ◽  
YING ZHAO ◽  
JIANPING XI
Keyword(s):  
Thin Films ◽  
Solar Cells ◽  
Transition Region ◽  
Chemical Vapor ◽  
Transition Process ◽  
Very High Frequency ◽  
Working Pressure ◽  
Hydrogenated Silicon ◽  
Silicon Thin Films ◽  
Narrow Region

Hydrogenated silicon thin films (Si:H) have been deposited by using very high-frequency plasma-enhanced chemical vapor deposition (VHF PECVD). The structural, electrical and optical properties of the films were characterized. The transition process and the effect of pressure were studied. Results suggest that a narrow region, in which the transition from microcrystalline to amorphous growth takes place, exists in the regime of silane concentration (SC). This region is influenced by the working pressure (P). At lower pressure, the transition region is shifted to higher SC. Microcrystalline silicon (μ c-Si:H ) thin films deposited near transition region was applied as i-layer to the p-i-n solar cells. An efficiency of about 5.30% was obtained.

Internal structure of mixed phase hydrogenated silicon thin films made at 39°C

2006 ◽  
Vol 89 (5) ◽  
pp. 051922 ◽  
Author(s):  
P. C. P. Bronsveld ◽  
J. K. Rath ◽  
R. E. I. Schropp ◽  
T. Mates ◽  
A. Fejfar ◽  
...  
Keyword(s):  
Thin Films ◽  
Internal Structure ◽  
Mixed Phase ◽  
Hydrogenated Silicon ◽  
Silicon Thin Films

Producing oxygen-rich WO3 thin films by post-deposition thermal annealing

2019 ◽  
Vol 6 (9) ◽  
pp. 095905
Author(s):  
S E Nunes ◽  
L C Matte ◽  
C R da Cunha
Keyword(s):  
Thin Films ◽  
Thermal Annealing ◽  
Wo3 Thin Films ◽  
Post Deposition

Solid-Phase Amorphization in Layered Metal/Silicon thin Films

1987 ◽  
Vol 103 ◽  
Author(s):  
Menachem Nathan
Keyword(s):  
Thin Films ◽  
Free Energy ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Glassy Phase ◽  
Solid Phase ◽  
General Scheme ◽  
Crystalline Compound ◽  
Nucleation Kinetics ◽  
Silicon Thin Films

ABSTRACTA general scheme for determining which metal-Si systems undergo solidphase amorphization (SPA) upon rapid thermal annealing is presented and used to investigate Ni-Si, Ti-Si, V-Si, Co-Si and Cr-Si reactions. SPA occurs only in the first three systems. With the glaring exception of Co-Si, the results agree with the thermodynamic predictions of SPA in systems in which the free energy of a glassy phase is significantly lower than the free energy of the separate components. The amorphization may also be influenced by the diffusing species and contamination. Following SPA, the first crystalline compound is determined by nucleation kinetics.

scholarly journals The effect of post-deposition annealing conditions on structural and thermoelectric properties of sputtered copper oxide films

RSC Advances ◽  
2020 ◽  
Vol 10 (49) ◽  
pp. 29394-29401
Author(s):  
Chandrasekaran Abinaya ◽  
Kevin Bethke ◽  
Virgil Andrei ◽  
Jonas Baumann ◽  
Beatrix Pollakowski-Herrmann ◽  
...  
Keyword(s):  
Thin Films ◽  
Copper Oxide ◽  
Thermoelectric Properties ◽  
Oxide Films ◽  
Thermoelectric Performance ◽  
Annealing Atmosphere ◽  
Oxide Thin Films ◽  
Post Deposition Annealing ◽  
Annealing Conditions ◽  
Post Deposition

This study reveals the interplay between the composition and thermoelectric performance of mixed copper oxide thin films, which can be finely adjusted by varying the annealing atmosphere.

Rapid thermal annealing induced the c-axis (00 l) preferred orientation and the p-type thermoelectric properties of Bi-Sb-Te thin films

2020 ◽  
Vol 706 ◽  
pp. 138094 ◽  
Author(s):  
Athorn Vora–ud ◽  
Somporn Thaowonkaew ◽  
Jessada Khajonrit ◽  
Kunchit Singsoog ◽  
Pennapa Muthitamongkol ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Annealing ◽  
Thermoelectric Properties ◽  
Rapid Thermal Annealing ◽  
Preferred Orientation ◽  
P Type
Sign in / Sign up

Export Citation Format

Share Document