Growth of very large grains in polycrystalline silicon thin films by the sequential combination of vapor induced crystallization using AlCl3 and pulsed rapid thermal annealing
2012 ◽
Vol 12
(6)
◽
pp. 1454-1458
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2002 ◽
Vol 41
(Part 1, No. 2A)
◽
pp. 501-506
◽
1999 ◽
Vol 46
(10)
◽
pp. 2062-2068
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Keyword(s):
Keyword(s):
2011 ◽
Vol 50
(4S)
◽
pp. 04DP02
◽
2012 ◽
Vol 12
(6)
◽
pp. 1470-1475
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