The effect of the deposition rate on the crystallographic texture, microstructure evolution and magnetic properties in sputter deposited Ni-Mn-Ga thin films

2016 ◽  
Vol 616 ◽  
pp. 530-542 ◽  
Author(s):  
Amit Sharma ◽  
S. Mohan ◽  
Satyam Suwas
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Deposition Rate ◽  
Microstructure Evolution ◽  
Crystallographic Texture ◽  
Sputter Deposited

Development of Crystallographic Texture in RF Sputter Deposited CoCrTa/Cr Thin Films

1993 ◽  
Vol 313 ◽  
Author(s):  
Y. C. Feng ◽  
D. E. Laughlin ◽  
D. N. Lambeth
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Elevated Temperature ◽  
Substrate Temperature ◽  
Crystallographic Texture ◽  
Film Morphology ◽  
Substrate Bias ◽  
Sputter Deposited

ABSTRACTIt is well known that Cr sputtered on glass or NiP/Al substrates has either the (002) or (110) crystallographic texture (depending on the substrate temperature) and that the Co-alloy layers which are deposited on the Cr underlayers have either the (1120) or (1011) textures respectively. However, the dependence of the crystallographic textures on other sputtering parameters is not clear. We report here on the study of the dependence of crystallographic textures of CoCrTa/Cr films on substrate bias. It is found that both Cr (110) and Cr (002) textures can form at elevated temperature, depending on the substrate bias. The development of the crystallographic texture is discussed with a Model. It is also found that the epitaxy of CoCrTa layer depends on the sputtering conditions of both the Cr and the CoCrTa layers. The extrinsic magnetic properties (such as He, S and S*) of thin films with various textures are also presented. By controlling the sputtering procedure, the effects of crystallographic textures on magnetic properties were separated from the effects of film Morphology.

Impact of Deposition Rate on the Structural and Magnetic Properties of Sputtered Ni/Cu Multilayer Thin Films

2017 ◽  
Vol 73 (1) ◽  
pp. 85-90 ◽  
Author(s):  
Ali Karpuz ◽  
Salih Colmekci ◽  
Hakan Kockar ◽  
Hilal Kuru ◽  
Mehmet Uckun
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Deposition Rate ◽  
High Rate ◽  
Cubic Phase ◽  
High Deposition Rate ◽  
Multilayer Thin Films ◽  
Face Centered Cubic ◽  
Deposition Rates ◽  
Cu Films

AbstractThe structural and corresponding magnetic properties of Ni/Cu films sputtered at low and high deposition rates were investigated as there is a limited number of related studies in this field. 5[Ni(10 nm)/Cu(30 nm)] multilayer thin films were deposited using two DC sputtering sources at low (0.02 nm/s) and high (0.10 nm/s) deposition rates of Ni layers. A face centered cubic phase was detected for both films. The surface of the film sputtered at the low deposition rate has a lot of micro-grains distributed uniformly and with sizes from 0.1 to 0.4 μm. Also, it has a vertical acicular morphology. At high deposition rate, the number of micro-grains considerably decreased, and some of their sizes increased up to 1 μm. The surface of the Ni/Cu multilayer deposited at the low rate has a relatively more grainy and rugged structure, whereas the surface of the film deposited at the high rate has a relatively larger lateral size of surface grains with a relatively fine morphology. Saturation magnetisation, Ms, values were 90 and 138 emu/cm3 for deposition rates of 0.02 and 0.10 nm/s, respectively. Remanence, Mr, values were also found to be 48 and 71 emu/cm3 for the low and high deposition rates, respectively. The coercivity, Hc, values were 46 and 65 Oe for the low and high Ni deposition rates, respectively. The changes in the film surfaces provoked the changes in the Hc values. The Ms, Mr, and Hc values of the 5[Ni(10 nm)/Cu(30 nm)] films can be adjusted considering the surface morphologies and film contents caused by the different Ni deposition rates.

scholarly journals Structural and Magnetic Properties of Sputter-Deposited Mn–Fe–Ga Thin Films

2016 ◽  
Vol 52 (7) ◽  
pp. 1-4 ◽  
Author(s):  
Alessia Niesen ◽  
Christian Sterwerf ◽  
Manuel Glas ◽  
Jan-Michael Schmalhorst ◽  
Gunter Reiss
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Structural And Magnetic Properties ◽  
Sputter Deposited

Annealing induced structural change in sputter deposited copper ferrite thin films and its impact on magnetic properties

2002 ◽  
Vol 91 (4) ◽  
pp. 2220-2227 ◽  
Author(s):  
Mrugesh Desai ◽  
Shiva Prasad ◽  
N. Venkataramani ◽  
Indradev Samajdar ◽  
A. K. Nigam ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Structural Change ◽  
Copper Ferrite ◽  
Ferrite Thin Films ◽  
Sputter Deposited

Magnetic properties of sputter-deposited amorphous rare earth-transition metal thin films

Vacuum ◽  
1988 ◽  
Vol 38 (8-10) ◽  
pp. 797-800 ◽  
Author(s):  
C.E. Davies ◽  
R.E. Somekh ◽  
J.E. Evetts
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Rare Earth ◽  
Transition Metal ◽  
Metal Thin Films ◽  
Sputter Deposited

In-Situ Magnetic Field Induced Structure and Properties of Epitaxial Spinel Ferrite Thin Films Prepared by Pulsed Laser Deposition (PLD) (Dynamic Aurora PLD Method)

2004 ◽  
Vol 853 ◽  
Author(s):  
Naoki Wakiya ◽  
Toyokazu Nagamune ◽  
Kazuo Shinozaki ◽  
Nobuyasu Mizutani
Keyword(s):  
Magnetic Field ◽  
Thin Films ◽  
Magnetic Properties ◽  
Pulsed Laser Deposition ◽  
Deposition Rate ◽  
Spinel Ferrite ◽  
Pulsed Laser ◽  
Lattice Parameter ◽  
Laser Deposition

ABSTRACTThe influence of an in-situ magnetic field on the plume during pulsed laser deposition (PLD) to prepare epitaxial nickel zinc ferrite (NZF) thin films were investigated. An air core coil (solenoid coil) was installed between a target and a substrate, and up to 43 mT of magnetic field was generated by direct current (DC)(Dynamic Aurora PLD method). Application of magnetic field brought about following structural and property changes;(1) deposition rate was almost doubled, (2) the concentration of Ni and Zn in the film was decreased, (3) lattice parameter was unchanged, and (4) magnetization and coercivity was increased. Since deposition rate was increased by application of magnetic field, films with same thickness was also prepared without magnetic field, however, magnetic properties were unchanged. This indicates that application of in-situ magnetic field improved magnetic properties.

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