Solid phase epitaxy of silicon thin films by diode laser irradiation for photovoltaic applications

2012 ◽  
Vol 520 (24) ◽  
pp. 7087-7092 ◽  
Author(s):  
T. Schmidt ◽  
I. Höger ◽  
A. Gawlik ◽  
G. Andrä ◽  
F. Falk
2013 ◽  
Vol 210 (12) ◽  
pp. 2729-2735 ◽  
Author(s):  
Ingmar Höger ◽  
Thomas Schmidt ◽  
Anja Landgraf ◽  
Martin Schade ◽  
Annett Gawlik ◽  
...  

1994 ◽  
Vol 75 (1) ◽  
pp. 223-226 ◽  
Author(s):  
J.‐Y. Veuillen ◽  
C. d’Anterroches ◽  
T. A. Nguyen Tan

2010 ◽  
Vol 5 ◽  
pp. 109-117 ◽  
Author(s):  
N. Lichtenstein ◽  
R. Baettig ◽  
R. Brunner ◽  
J. Müller ◽  
B. Valk ◽  
...  

1987 ◽  
Vol 103 ◽  
Author(s):  
Menachem Nathan

ABSTRACTA general scheme for determining which metal-Si systems undergo solidphase amorphization (SPA) upon rapid thermal annealing is presented and used to investigate Ni-Si, Ti-Si, V-Si, Co-Si and Cr-Si reactions. SPA occurs only in the first three systems. With the glaring exception of Co-Si, the results agree with the thermodynamic predictions of SPA in systems in which the free energy of a glassy phase is significantly lower than the free energy of the separate components. The amorphization may also be influenced by the diffusing species and contamination. Following SPA, the first crystalline compound is determined by nucleation kinetics.


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