Atomic Vapor Depositions of Ti–Ta–O thin films for Metal–Insulator–Metal applications

2011 ◽  
Vol 519 (11) ◽  
pp. 3831-3834 ◽  
Author(s):  
M. Lukosius ◽  
C. Baristiran Kaynak ◽  
Ch. Wenger ◽  
G. Ruhl ◽  
S. Rushworth ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Vapor ◽  
Metal Insulator ◽  
Metal Insulator Metal

Enhancement on crystallinity property of low annealed PbTiO3 thin films for metal-insulator-metal capacitor

2018 ◽  
Author(s):  
Z. Nurbaya ◽  
M. H. Wahid ◽  
M. D. Rozana ◽  
S. A. H. Alrokayan ◽  
H. A. Khan ◽  
...  
Keyword(s):  
Thin Films ◽  
Metal Insulator ◽  
Metal Insulator Metal

High performance metal–insulator–metal capacitors with atomic vapor deposited HfO2 dielectrics

2010 ◽  
Vol 518 (15) ◽  
pp. 4380-4384 ◽  
Author(s):  
M. Lukosius ◽  
Ch. Walczyk ◽  
M. Fraschke ◽  
D. Wolansky ◽  
H. Richter ◽  
...  
Keyword(s):  
High Performance ◽  
Atomic Vapor ◽  
Metal Insulator ◽  
Metal Insulator Metal

Properties of atomic-vapor and atomic-layer deposited Sr, Ti, and Nb doped Ta2O5 Metal–Insulator–Metal capacitors

2012 ◽  
Vol 520 (14) ◽  
pp. 4576-4579 ◽  
Author(s):  
M. Lukosius ◽  
C. Baristiran Kaynak ◽  
S. Kubotsch ◽  
T. Blomberg ◽  
G. Ruhl ◽  
...  
Keyword(s):  
Atomic Layer ◽  
Atomic Vapor ◽  
Metal Insulator ◽  
Metal Insulator Metal

Comparison of Multilayer Dielectric Thin Films for Future Metal–Insulator–Metal Capacitors: Al2O3/HfO2/Al2O3versus SiO2/HfO2/SiO2

2011 ◽  
Vol 50 (10S) ◽  
pp. 10PB06 ◽  
Author(s):  
Sang-Uk Park ◽  
Hyuk-Min Kwon ◽  
In-Shik Han ◽  
Yi-Jung Jung ◽  
Ho-Young Kwak ◽  
...  
Keyword(s):  
Thin Films ◽  
Metal Insulator ◽  
Dielectric Thin Films ◽  
Metal Insulator Metal ◽  
Multilayer Dielectric
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