Silane versus silicon tetrafluoride in the growth of microcrystalline silicon films by standard radio frequency glow discharge

2007 ◽  
Vol 515 (19) ◽  
pp. 7451-7454 ◽  
Author(s):  
Y. Djeridane ◽  
A. Abramov ◽  
P. Roca i Cabarrocas
1995 ◽  
Vol 142 (5) ◽  
pp. 1663-1666 ◽  
Author(s):  
Ahalapitiya Hewage Jayatissa ◽  
Yoichiro Nakanishi ◽  
Yosinori Hatanaka

1995 ◽  
Vol 49 (7) ◽  
pp. 917-926 ◽  
Author(s):  
Paula R. Cable ◽  
R. Kenneth Marcus

Radio-frequency glow discharge (rf-GD) sources produce an abundance of both atoms and ions. For the mass spectrometric application of the glow discharge technique, knowledge of the ion kinetic energies is required to optimize extraction and focusing of ions from the source region into the analyzer. This paper details kinetic energies experimentally determined with the use of the “retarding potential” method. For this study, the analyzer quadrupole of a double-quadrupole mass spectrometer was positively biased to act as a repeller. Ion kinetic energies (IKEs) determined for a variety of discharge and analyzer operating conditions ranged from 12.5 eV to 25.0 eV for 63Cu+. Kinetic energy measurements were confirmed from ion trajectory simulations and follow closely the experimental values for identical analyzer conditions and initial IKEs. Results of this study indicate that the conditions under which ions are formed (plasma conditions) affect IKEs and energy spreads to a greater extent than analyzer parameter variations. Different from atmospheric plasma sources, IKEs for rf-GD species do not vary as a function of ion mass/identity. Evidence is also given in support of a slight mass biasing owing to the transmission properties of double-quadrupole analyzers. The findings detailed herein demonstrate the effects of rf modulation on both ion kinetic energy values and distributions.


2017 ◽  
Vol 10 (1) ◽  
pp. 381-388 ◽  
Author(s):  
K. M. Mathew ◽  
Saji. P ◽  
Raza Mohamed ◽  
P. Sesha. Reddy ◽  
Ashish R. Jain ◽  
...  

1992 ◽  
Vol 242 ◽  
Author(s):  
M. Faraji ◽  
Sunil Gokhale ◽  
S. M. Chaudhari ◽  
M. G. Takwale ◽  
S. V. Ghaisas

ABSTRACTHydrogenated microcrystalline silicon with oxygen(mc-Si:O:H) is grown using radio frequency glow discharge method. Oxygen is introduced during growth by varying it's partial pressure in the growth chamber. The crystalline volume fraction ‘f’ and the crystallite size ‘δ’ are found to vary with the oxygen content. Results indicate that oxygen can etch the silicon surface when present in low amount while it forms a-SiO2-x with increasing contents. Optical absorption studies in the range of 2 to 3 eV suggest that the absorption coefficient ‘α’ lies in between the values of c-Si and a-Si:H.being closer to a-Si:H. The Hall mobility measurements for these samples indicate that for optimum oxygen contents the mobility as high as 35 cm2 V-1 sec-1 can be obtained. Results on I-V characteristics for p-i-n structure are presented.


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