scholarly journals UV-nanoimprint lithography and large area roll-to-roll texturization with hyperbranched polymer nanocomposites for light-trapping applications

2012 ◽  
Vol 103 ◽  
pp. 147-156 ◽  
Author(s):  
Marina A. González Lazo ◽  
Rémy Teuscher ◽  
Yves Leterrier ◽  
Jan-Anders E. Månson ◽  
Caroline Calderone ◽  
...  
Keyword(s):  
Polymer Nanocomposites ◽  
Nanoimprint Lithography ◽  
Hyperbranched Polymer ◽  
Light Trapping ◽  
Large Area ◽  
Roll To Roll

scholarly journals Uniform Pressing Mechanism in Large-Area Roll-to-Roll Nanoimprint Lithography Process

2021 ◽  
Vol 11 (20) ◽  
pp. 9571
Author(s):  
Ga Eul Kim ◽  
Hyuntae Kim ◽  
Kyoohee Woo ◽  
Yousung Kang ◽  
Seung-Hyun Lee ◽  
...  
Keyword(s):  
Contact Pressure ◽  
Nanoimprint Lithography ◽  
Applied Pressure ◽  
Machine Learning Techniques ◽  
Conventional System ◽  
Large Area ◽  
High Productivity ◽  
Roll To Roll ◽  
Learning Techniques ◽  
Roller Machine

We aimed to increase the processing area of the roll-to-roll (R2R) nanoimprint lithography (NIL) process for high productivity, using a long roller. It is common for a long roller to have bending deformation, geometric errors and misalignment. This causes the non-uniformity of contact pressure between the rollers, which leads to defects such as non-uniform patterning. The non-uniformity of the contact pressure of the conventional R2R NIL system was investigated through finite element (FE) analysis and experiments in the conventional system. To solve the problem, a new large-area R2R NIL uniform pressing system with five multi-backup rollers was proposed and manufactured instead of the conventional system. As a preliminary experiment, the possibility of uniform contact pressure was confirmed by using only the pressure at both ends and one backup roller in the center. A more even contact pressure was achieved by using all five backup rollers and applying an appropriate pushing force to each backup roller. Machine learning techniques were applied to find the optimal combination of the pushing forces. In the conventional pressing process, it was confirmed that pressure deviation of the contact area occurred at a level of 44%; when the improved system was applied, pressure deviation dropped to 5%.

scholarly journals Nanoimprint Lithography with UV-Curable Hyperbranched Polymer Nanocomposites

2010 ◽  
Vol 296 (1) ◽  
pp. 144-153 ◽  
Author(s):  
Valérie Geiser ◽  
Young-Hyun Jin ◽  
Yves Leterrier ◽  
Jan-Anders E. Månson
Keyword(s):  
Polymer Nanocomposites ◽  
Nanoimprint Lithography ◽  
Hyperbranched Polymer ◽  
Uv Curable

Inkjetable and photo-curable resists for large-area and high-throughput roll-to-roll nanoimprint lithography

2014 ◽  
Vol 13 (4) ◽  
pp. 043003 ◽  
Author(s):  
Manuel W. Thesen ◽  
Dieter Nees ◽  
Stephan Ruttloff ◽  
Maximilian Rumler ◽  
Mathias Rommel ◽  
...  
Keyword(s):  
High Throughput ◽  
Nanoimprint Lithography ◽  
Large Area ◽  
Roll To Roll

Roll-to-roll nanoimprint lithography for patterning on a large-area substrate roll

2014 ◽  
Vol 123 ◽  
pp. 18-22 ◽  
Author(s):  
Hyungjun Lim ◽  
Kee-bong Choi ◽  
Geehong Kim ◽  
Sunghwi Lee ◽  
Hyunha Park ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Large Area ◽  
Roll To Roll

scholarly journals Mastering of NIL Stamps with Undercut T-Shaped Features from Single Layer to Multilayer Stamps

Nanomaterials ◽  
2021 ◽  
Vol 11 (4) ◽  
pp. 956
Author(s):  
Philipp Taus ◽  
Adrian Prinz ◽  
Heinz D. Wanzenboeck ◽  
Patrick Schuller ◽  
Anton Tsenov ◽  
...  
Keyword(s):  
Electron Beam Lithography ◽  
Nanoimprint Lithography ◽  
Silicon Oxide ◽  
Three Dimensional ◽  
Single Layer ◽  
Fabrication Technology ◽  
Large Area ◽  
Structural Colors ◽  
Biomimetic Structures ◽  
Morpho Butterfly

Biomimetic structures such as structural colors demand a fabrication technology of complex three-dimensional nanostructures on large areas. Nanoimprint lithography (NIL) is capable of large area replication of three-dimensional structures, but the master stamp fabrication is often a bottleneck. We have demonstrated different approaches allowing for the generation of sophisticated undercut T-shaped masters for NIL replication. With a layer-stack of phase transition material (PTM) on poly-Si, we have demonstrated the successful fabrication of a single layer undercut T-shaped structure. With a multilayer-stack of silicon oxide on silicon, we have shown the successful fabrication of a multilayer undercut T-shaped structures. For patterning optical lithography, electron beam lithography and nanoimprint lithography have been compared and have yielded structures from 10 µm down to 300 nm. The multilayer undercut T-shaped structures closely resemble the geometry of the surface of a Morpho butterfly, and may be used in future to replicate structural colors on artificial surfaces.

An Investigation onto Polydimethylsiloxane (PDMS) Printing Plate of Multiple Functional Solid Line by Flexographic

2013 ◽  
Vol 844 ◽  
pp. 158-161 ◽  
Author(s):  
M.I. Maksud ◽  
Mohd Sallehuddin Yusof ◽  
M. Mahadi Abdul Jamil
Keyword(s):  
Laser Ablation ◽  
Line Width ◽  
High Speed ◽  
Printed Electronics ◽  
Low Cost ◽  
Flexible Substrates ◽  
Large Area ◽  
Printing Plate ◽  
Roll To Roll ◽  
Printing Processes

Recently low cost production is vital to produce printed electronics by roll to roll manufacturing printing process like a flexographic. Flexographic has a high speed technique which commonly used for printing onto large area flexible substrates. However, the minimum feature sizes achieved with roll to roll printing processes, such as flexographic is in the range of fifty microns. The main contribution of this limitation is photopolymer flexographic plate unable to be produced finer micron range due to film that made by Laser Ablation Mask (LAMs) technology not sufficiently robust and consequently at micron ranges line will not be formed on the printing plate. Hence, polydimethylsiloxane (PDMS) is used instead of photopolymer. Printing trial had been conducted and multiple solid lines successfully printed for below fifty microns line width with no interference between two adjacent lines of the printed images.

scholarly journals Toward High‐Throughput Texturing of Polymer Foils for Enhanced Light Trapping in Flexible Perovskite Solar Cells Using Roll‐to‐Roll Hot Embossing

2020 ◽  
Vol 22 (4) ◽  
pp. 1901217 ◽  
Author(s):  
Marcos Soldera ◽  
Qiong Wang ◽  
Flavio Soldera ◽  
Valentin Lang ◽  
Antonio Abate ◽  
...  
Keyword(s):  
Solar Cells ◽  
High Throughput ◽  
Light Trapping ◽  
Perovskite Solar Cells ◽  
Hot Embossing ◽  
Roll To Roll ◽  
Polymer Foils
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