scholarly journals Nanoimprint Lithography with UV-Curable Hyperbranched Polymer Nanocomposites

2010 ◽  
Vol 296 (1) ◽  
pp. 144-153 ◽  
Author(s):  
Valérie Geiser ◽  
Young-Hyun Jin ◽  
Yves Leterrier ◽  
Jan-Anders E. Månson
Keyword(s):  
Polymer Nanocomposites ◽  
Nanoimprint Lithography ◽  
Hyperbranched Polymer ◽  
Uv Curable

scholarly journals UV-nanoimprint lithography and large area roll-to-roll texturization with hyperbranched polymer nanocomposites for light-trapping applications

2012 ◽  
Vol 103 ◽  
pp. 147-156 ◽  
Author(s):  
Marina A. González Lazo ◽  
Rémy Teuscher ◽  
Yves Leterrier ◽  
Jan-Anders E. Månson ◽  
Caroline Calderone ◽  
...  
Keyword(s):  
Polymer Nanocomposites ◽  
Nanoimprint Lithography ◽  
Hyperbranched Polymer ◽  
Light Trapping ◽  
Large Area ◽  
Roll To Roll

Nanoimprint Lithography with UV-Curable Hyperbranched Polymer Nanocomposites for Optical Biosensing Applications

2010 ◽  
Vol 1253 ◽  
Author(s):  
Valérie Geiser ◽  
Yves Leterrier ◽  
Jan-Anders Månson ◽  
Rosendo Sanjines ◽  
Guy Voirin ◽  
...  
Keyword(s):  
Optical Sensors ◽  
Nanoimprint Lithography ◽  
Hyperbranched Polymer ◽  
Polymer Nanocomposite ◽  
High Refractive Index ◽  
Gel Point ◽  
Optical Biosensing ◽  
Uv Curable ◽  
Polymer Sensors ◽  
The Stability

AbstractPolymer nanocomposite gratings with a 363 nm period and a 12 nm step height were replicated using a glass master in a rapid, low-pressure imprint process. The composite materials were based on a UV-curable acrylated hyperbranched polymer and nanosized SiO2 particles. The influence of particle fraction up to 25 vol%, process pressure and UV intensity on the grating geometry was analyzed using atomic force microscopy. The period of the grating was found to be identical to that of the glass master for all investigated conditions. It was shown that the gel point of the nanocomposite was an important factor that determined the stability as well as the dimensions of the imprinted structure. However, a distortion of the grating was observed with increasing fraction of SiO2, which was correlated to the increased internal stress of the composite. Wavelength interrogated optical sensors were produced by depositing a high refractive index TiO2 layer on the composite gratings. The laser signal strength of the polymer sensors was equal to that of the reference high precision glass sensor with 10-12 g/mm2 sensitivity. The strength was lower for the nanocomposites due to propagation losses argued to result from residual porosity.

Fluorescent UV-Curable Resists for UV Nanoimprint Lithography

2010 ◽  
Vol 49 (6) ◽  
pp. 06GL07 ◽  
Author(s):  
Kei Kobayashi ◽  
Nobuji Sakai ◽  
Shinji Matsui ◽  
Masaru Nakagawa
Keyword(s):  
Nanoimprint Lithography ◽  
Uv Curable

UV nanoimprint lithography of sub-100nm nanostructures using a novel UV curable epoxy siloxane polymer

2010 ◽  
Vol 87 (11) ◽  
pp. 2411-2415 ◽  
Author(s):  
Dexian Ye ◽  
Pei-I Wang ◽  
Zhuqiu Ye ◽  
Ya Ou ◽  
Rajat Ghoshal ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Uv Curable ◽  
Siloxane Polymer

Improvement of Transfer Durability of a Pillar-Shaped Release-Agent-Free Replica Mold in Ultraviolet Nanoimprint Lithography

2018 ◽  
Vol 12 (5) ◽  
pp. 723-729
Author(s):  
Junpei Tsuchiya ◽  
Gen Nakagawa ◽  
Shin Hiwasa ◽  
Jun Taniguchi ◽  
◽  
...  
Keyword(s):  
Contact Angle ◽  
Error Rate ◽  
Nanoimprint Lithography ◽  
Low Cost ◽  
Master Mold ◽  
Release Agent ◽  
Uv Curable ◽  
Low Viscosity ◽  
Large Numbers ◽  
Uv Curable Resin

Ultraviolet nanoimprint lithography (UV-NIL) can be used to fabricate nanoscale patterns with high throughput. It is expected to serve as a low-cost technique for the production of items in large numbers. However, master molds for UV-NIL are expensive and laborious to produce, and there are problems associated with the deterioration of the master mold and damage to its nanopattern due to adhesion of the UV-curable resin. Consequently, the UV-curable resin has to combine low-viscosity characteristics for coatability with an antisticking property. Coating a master mold with a release layer is important in preventing damage to the master mold or adhesion between the mold and the UV-curable resin. However, the released layer deteriorates as the master mold is repeatedly used to fabricate nanopatterns. By contrast, the use of a replica mold is a valuable technique for preventing the deterioration of the master mold, and there have been several studies on the fabrication of replicas of master molds with the use of UV-curable resins. In many cases, the fabrication of nanopatterns with replica molds requires the use of a release agent. In a previous study, we developed a material for replica molds that does not require a release agent. This material consisted of a UV-curable resin with an antifouling effect that was prepared from cationically polymerizable UV-curable and epoxy-modified fluorinated resins. With the use of this material, replica molds with patterns of pillars or holes were fabricated with UV-NIL. The lifetime of the mold with the nanopattern of pillars was shorter than that with holes. In addition, the replica mold with the pillar-shaped nanopattern had numerous defects and allowed adhesion of the transfer resin after repeated efforts. Herein, we describe an improved release-agent-free hard replica mold. We transferred large numbers of nanopatterns of pillars from the replica mold, and evaluated the error rate and contact angle of our improved release-agent-free hard replica mold. The resulting release-agent-free replica mold with a nanopattern of pillars was capable of transferring up to 1000 sequential imprints. In addition, to improve the release properties of the transfer resin, we included an additive to the transfer resin that contained a reactive fluorinated material. This material improved the release properties of the transfer resin and mitigated the deterioration of the contact angle and increase in the error rate.

A Novel Nanoimprint Lithography Thiol-ene Resist for Sub-70 nm Nanostructures

2020 ◽  
Vol 12 (6) ◽  
pp. 779-783
Author(s):  
Man Zhang ◽  
Liang-Ping Xia ◽  
Sui-Hu Dang ◽  
A-Xiu Cao ◽  
Qi-Ling Deng ◽  
...  
Keyword(s):  
Surface Energy ◽  
Nanoimprint Lithography ◽  
Surface Oxygen ◽  
High Chemical ◽  
Uv Curable ◽  
Oxygen Inhibition ◽  
Click Polymerization ◽  
Low Viscosity ◽  
Low Surface Energy ◽  
Chemical Etch

In this paper, we propose a novel kind of UV click-polymerization thiol-ene copolymers as nanoimprint lithography resists for sub-70 nm resolution patterns. High-precision mold imprint and release are two of the most critical steps of nanoimprint lithography, which requires the resists with properties of excellent conformal replication and low surface energy. Conventional UV-curable resists used in nanoimprint lithography, such as acrylate, epoxy resin, and vinyl ether, cannot satisfy all these properties requirements because they exhibit surface oxygen inhibition during polymerization, or materials fracture and delamination during mold releasing. A novel kind of thiol-ene copolymers have been investigated in this study, which have many properties favorable for use as nanoimprint lithography resists to imprint sub-70 nm and high-aspect-ratio nanostructures. These properties include sufficiently low viscosity and high Young's modulus, low surface energy for easy demolding, polymerization in benign ambient, and in particular, high chemical-etch resistance. These excellent properties give improve nanoimprinting results.

scholarly journals Interfacial Interactions during Demolding in Nanoimprint Lithography

Micromachines ◽  
2021 ◽  
Vol 12 (4) ◽  
pp. 349
Author(s):  
Mingjie Li ◽  
Yulong Chen ◽  
Wenxin Luo ◽  
Xing Cheng
Keyword(s):  
Nanoimprint Lithography ◽  
Process Conditions ◽  
Mold Surface ◽  
Interfacial Interactions ◽  
Friction Forces ◽  
Uv Curable ◽  
Structured Materials ◽  
Thermal Expansion Coefficients ◽  
Defect Control ◽  
Commercial Applications

Nanoimprint lithography (NIL) is a useful technique for the fabrication of nano/micro-structured materials. This article reviews NIL in the field of demolding processes and is divided into four parts. The first part introduces the NIL technologies for pattern replication with polymer resists (e.g., thermal and UV-NIL). The second part reviews the process simulation during resist filling and demolding. The third and fourth parts discuss in detail the difficulties in demolding, particularly interfacial forces between mold (template) and resist, during NIL which limit its capability for practical commercial applications. The origins of large demolding forces (adhesion and friction forces), such as differences in the thermal expansion coefficients (CTEs) between the template and the imprinted resist, or volumetric shrinkage of the UV-curable polymer during curing, are also illustrated accordingly. The plausible solutions for easing interfacial interactions and optimizing demolding procedures, including exploring new resist materials, employing imprint mold surface modifications (e.g., ALD-assisted conformal layer covering imprint mold), and finetuning NIL process conditions, are presented. These approaches effectively reduce the interfacial demolding forces and thus lead to a lower defect rate of pattern transfer. The objective of this review is to provide insights to alleviate difficulties in demolding and to meet the stringent requirements regarding defect control for industrial manufacturing while at the same time maximizing the throughput of the nanoimprint technique.

UV-Curable Polymer Nanocomposites Based on Poly(dimethylsiloxane) and Zirconia Nanoparticles: Reactive versus Passive Nanofillers

2019 ◽  
Vol 2 (2) ◽  
pp. 394-403 ◽  
Author(s):  
Ria D. Corder ◽  
Joseph C. Tilly ◽  
Wade F. Ingram ◽  
Sangchul Roh ◽  
Richard J. Spontak ◽  
...  
Keyword(s):  
Polymer Nanocomposites ◽  
Uv Curable ◽  
Zirconia Nanoparticles
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