scholarly journals Complexing agent effect on the stoichiometric ratio of the electrochemically prepared CuInSe2 thin films

2007 ◽  
Vol 91 (20) ◽  
pp. 1922-1926 ◽  
Author(s):  
S. Beyhan ◽  
S. Suzer ◽  
F. Kadırgan
2021 ◽  
pp. 1-13
Author(s):  
I. J. González-Chan ◽  
A. Pat-Herrera ◽  
A. I. Trejo-Ramos ◽  
A. I. Oliva
Keyword(s):  

2014 ◽  
Vol 288 ◽  
pp. 76-82 ◽  
Author(s):  
K. Manikandan ◽  
P. Mani ◽  
C. Surendra Dilip ◽  
S. Valli ◽  
P. Fermi Hilbert Inbaraj ◽  
...  

2022 ◽  
Vol 1048 ◽  
pp. 189-197
Author(s):  
Tippasani Srinivasa Reddy ◽  
M.C. Santhosh Kumar

In this study report the structural and optical properties of Copper Tin Sulfide (Cu2SnS3) thin films on indium tin oxide (ITO) substrate using co-evaporation technique. High purity of copper, tin and sulfur were taken as source materials to deposit Cu2SnS3 (CTS) thin films at different substrate temperatures (200-350 °C). Further, the effect of different substrate temperature on the crystallographic, morphological and optical properties of CTS thin films was investigated. The deposited CTS thin films shows tetragonal phase with preferential orientation along (112) plane confirmed by X-ray diffraction. Micro-Raman studies reveled the formation of CTS thin films. The surface morphology, average grain size and rms values of the deposited films are examined by Scanning electron spectroscopy (SEM) and Atomic Force Microscopy (AFM). The Energy dispersive spectroscopy (EDS) shows the presence of copper, tin and sulfur with a nearly stoichiometric ratio. The optical band gap (1.76-1.63 eV) and absorption coefficient (~105 cm-1) of the films was calculated by using UV-Vis-NIR spectroscopy. The values of refractive index, extinction coefficient and permittivity of the deposited films were calculated from the optical transmittance data.


Author(s):  
P.O. Offor ◽  
S.N. Ude ◽  
G.M. Whyte ◽  
F.U. Otung ◽  
I.G. Madiba ◽  
...  

2013 ◽  
Vol 2013 ◽  
pp. 1-4
Author(s):  
H. B. Patil ◽  
S. V. Borse

Semiconducting thin films of ternary () have been deposited on glass substrate by the simple and economical chemical bath deposition method. We report the deposition and optimization of the solution growth parameters such as temperature, complexing agent, thiourea, and deposition time that maximizes the thickness of the deposited thin film. The X-ray diffraction deposited thin films having cubic structure. The thin films were uniform and adherent to substrate. The composition was found homogeneous and stoichiometric by EDAX analysis.


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